Process for preparing graphene nanoribbons

US9527743B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9527743-B2
Application numberUS-201314428488-A
CountryUS
Kind codeB2
Filing dateSep 4, 2013
Priority dateSep 20, 2012
Publication dateDec 27, 2016
Grant dateDec 27, 2016

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  5. First independent claim

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Abstract

Official abstract text for this publication.

The present invention relates to a process for preparing a graphene nanoribbon, which comprises: (a) providing at least one aromatic monomer compound which is selected from at least one polycyclic aromatic monomer compound, at least one oligo phenylene aromatic monomer compound, or combinations thereof, on a solid substrate, (b) polymerization of the aromatic monomer compound so as to form at least one polymer on the surface of the solid substrate, (c) at least partially cyclodehydrogenating the one or more polymers of step (b), wherein at least step (b) is carried out at a total pressure p(total) of at least 1×10 −9 mbar; and a partial oxygen pressure p(O 2 ) and partial water pressure p(H 2 O) which satisfy the following relation: p(O 2 )×p(H20)<3×10 −14 mbar 2 .

First claim

Opening claim text (preview).

The invention claimed is: 1. A process for preparing graphene nanoribbons, which comprises: (a) providing at least one aromatic monomer compound which is selected from at least one polycyclic aromatic monomer compound, at least one oligo phenylene aromatic monomer compound, or combinations thereof, on a solid substrate, (b) polymerization of the aromatic monomer compound so as to form at least one polymer on the surface of the solid substrate, and (c) at least partially cyclodehydrogenating the at least one polymer of said (b) polymerization, wherein at least said (b) polymerization is carried out at a total pressure p(total) of at least 1×10 −9 mbar; and a partial oxygen pressure p(O 2 ) and partial water pressure p(H 2 O) which satisfy the following relation: 2.5×10 −19 mbar 2 ≦p (O 2 )× p (H 2 O)≦3×10 −14 mbar 2 . 2. The process according to claim 1 , further comprising treating a surface of a substrate prior to said polymerization to clean the substrate surface, wherein said treating is carried out at a total pressure p(total) of at least 1×10 −9 mbar. 3. The process according to claim 1 , wherein at least said (b) polymerization is carried out at a partial oxygen pressure p(O 2 ) and a partial water pressure p(H 2 O) which satisfy the following relation: 2.59×10 −19 mbar 2 ≦p (O 2 )× p (H 2 O)≦2.76×10 −14 mbar 2 . 4. The process according to claim 1 , wherein at least one of said (a) providing and said (c) at least partially cyclodehydrogenating is carried out at a total pressure p(total) of at least 1×10 −9 mbar; and optionally a partial oxygen pressure p(O 2 ) and partial water pressure p(H 2 O) which satisfy the following relation: 2.59×10 −19 mbar 2 ≦p (O 2 )× p (H 2 O)≦2.76×10 −14 mbar 2 . 5. The process according to claim 1 , wherein the total pressure p(total) in at least one of said (a) providing, said (b) polymerization, and said (c) at least partially cyclodehydrogenating is within the range of from 1×10 −9 mbar to 1×10 −3 mbar. 6. The process according to claim 1 , wherein the partial oxygen pressure p(O 2 ) and the partial water pressure p(H 2 O) in at least one of said (b) polymerization and said (c) at least partially cyclodehydrogenating satisfy the following relation: 2.5×10 −19 mbar 2 ≦p (O 2 )× p (H 2 O)≦3×10 −15 mbar 2 . 7. The process according to claim 2 , wherein the total pressure p(total) during said treating is within the range of from 1×10 −9 mbar to 1×10 −3 mbar. 8. The process according to claim 2 , wherein said treating is carried out by at least one of ion sputtering, plasma cleaning, thermal annealing, thin layer deposition of the substrate surface material, and cleavage of the substrate. 9. The process according to claim 2 , wherein said (a) providing is carried out immediately and directly after said treating). 10. The process according to claim 1 , wherein the process is carried out in a vacuum chamber. 11. The process according to claim 1 , wherein at least said (b) polymerization is carried out at a total pressure p(total) of at least 1×10 −8 mbar. 12. The process according to claim 1 , wherein at least said (b) polymerization is carried out at a total pressure p(total) of from 1×10 −8 mbar to 1×10 −5 mbar. 13. The process according to claim 1 , wherein said polymer obtained from said (b) polymerization is a linear polymer. 14. The process according to claim 1 , wherein said polymer obtained from said (b) polymerization is a linear graphene nanoribbon.

Assignees

Inventors

Classifications

  • Nanotechnology for materials or surface science, e.g. nanocomposites · CPC title

  • Graphene nanoribbons · CPC title

  • Chemistry & Metallurgy · mapped topic

  • Manufacture or treatment of nanostructures · CPC title

  • Chemistry & Metallurgy · mapped topic

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What does patent US9527743B2 cover?
The present invention relates to a process for preparing a graphene nanoribbon, which comprises: (a) providing at least one aromatic monomer compound which is selected from at least one polycyclic aromatic monomer compound, at least one oligo phenylene aromatic monomer compound, or combinations thereof, on a solid substrate, (b) polymerization of the aromatic monomer compound so as to form at l…
Who is the assignee on this patent?
Basf Se, EMPA—Eidgenossische Materialprufungs- und Forschungsanstalt, EMPA—Eidgenössische Materialprüfungs-und Forschungsanstalt
What technology area does this patent fall under?
Primary CPC classification C01B31/0446. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 27 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).