Film structure for electric field guided photoresist patterning process
US-11880137-B2 · Jan 23, 2024 · US
Methods for making differentially pattern cured microstructured articles
US9523919B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9523919-B2 |
| Application number | US-201214117230-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 23, 2012 |
| Priority date | May 31, 2011 |
| Publication date | Dec 20, 2016 |
| Grant date | Dec 20, 2016 |
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Abstract
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Methods for making differentially pattern cured microstructured articles are disclosed, using a molding tool having a microstructured surface, a patterned irradiation to generate irradiate and non-irradiated regions in a radiation curable resin. Different combinations of molding tools and patterned irradiation provide numerous variants of differentially pattern cured microstructured articles without requiring costly modification of the molding tools.
First claim
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What is claimed is: 1. A method of making a composite, the method comprising: providing a molding tool having a microstructured surface including a plurality of cavities; at least partially filling the plurality of cavities with a first radiation curable resin; exposing the first radiation curable resin to a first, patterned irradiation to provide a correspondingly patterned partially cured resin comprising at least one first region and at least one second region, wherein the…
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Operations & Transport · mapped topic
Operations & Transport · mapped topic
Physics · mapped topic
Operations & Transport · mapped topic
Operations & Transport · mapped topic
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- What does patent US9523919B2 cover?
- Methods for making differentially pattern cured microstructured articles are disclosed, using a molding tool having a microstructured surface, a patterned irradiation to generate irradiate and non-irradiated regions in a radiation curable resin. Different combinations of molding tools and patterned irradiation provide numerous variants of differentially pattern cured microstructured articles wi…
- Who is the assignee on this patent?
- Benson Jr Olester, Spurgeon Kathryn M, Vanhoose Steven R, and 2 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/2022. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Dec 20 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).