Antistatic antireflection film, method for manufacturing antistatic antireflection film, polarizing plate and image display device

Patent metadata

Field	Value
Publication number	US-9523795-B2
Application number	US-201213682164-A
Country	US
Kind code	B2
Filing date	Nov 20, 2012
Priority date	Nov 25, 2011
Publication date	Dec 20, 2016
Grant date	Dec 20, 2016

Abstract

An antistatic antireflection film, including; a support; a hardcoat layer formed from a composition for a hardcoat layer containing at least a compound having a quaternary ammonium salt group; and a low refractive index layer formed from a composition for a low refractive index layer containing at least the following (a), (b), (c) and (d), in this order, wherein, (a) is an ethylenically unsaturated group-containing fluoropolymer, (b) is a fluorine-containing polyfunctional monomer having a surface free energy of 23 mN/m or more when a film is formed alone, four or less —CF 3 groups in a molecule, a fluorine content of 30% or more, and at least three reactive functional groups in one molecule, (c) is hollow silica fine particles having an average particle size of 10 nm to 100 nm, and (d) is a compound having a dimethylsiloxane structure.

First claim

What is claimed is:

1. An antistatic antireflection film, comprising,
a support;
a hardcoat layer formed from a composition for a hardcoat layer containing at least a compound having a quaternary ammonium salt group; and
a low refractive index layer formed from a composition for a low refractive index layer containing at least the following (a), (b), (c) and (d), in this order,
wherein,
(a) is an ethylenically unsaturated group-containing fluoropolymer,
(b) is a fluorine-containing polyfunctional monomer having a surface free energy of 23 mN/m or more when a film is formed alone, four or less —CF 3 groups in a molecule, a fluorine content of 30% or more, and at least three reactive functional groups in one molecule,
(c) is hollow silica fine particles having an average particle size of 10 nm to 100 nm, and
(d) is a compound having a dimethylsiloxane structure,

wherein the refractive index of the low refractive index layer is 1.30 to 1.51,
wherein the compound having a quaternary ammonium salt group is a polymer having a quaternary ammonium having, as a polymerization unit, a compound having an alkylene oxide chain, and an alkyl (meth)acrylate,
wherein the compound (d) having a dimethylsiloxane structure is at least two of a silicone compound (d-1) having a number average molecular weight of 4,000 or more and a silicone compound (d-2) having a number average molecular weight of 1,000 or more and less than 4,000,
wherein the silicone compound (d-1) is a compound having a (meth)acryloyl group at a terminal thereof, a compound having (meth)acryloyl groups at both terminals thereof or a compound having a (meth)acryloyl group at a side chain of the siloxane structure, and
wherein the silicone compound (d-2) has a siloxane structure and two or more (meth)acryloyl groups.

2. The antistatic antireflection film according to claim 1 ,
wherein the composition for a low refractive index layer further comprises (e) solid silica particles having an average particle size of 40 nm to 100 nm in an amount of 0.1% by mass to 10% by mass, based on a total solid of the composition for a low refractive index layer.

3. The antistatic antireflection film according to claim 1 ,
wherein the fluorine-containing polyfunctional monomer (b) is a compound represented by the following Formula (1):

wherein, Rf 1 represents a (p+q) valent perfluoro saturated hydrocarbon group which may have an ether linkage,
Rf 2 represents a monovalent chained or cyclic fluorinated hydrocarbon group which contains at least a carbon atom and a fluorine atom and may contain an oxygen atom or a hydrogen atom,
p represents an integer of 3 to 10, q represents an integer of 0 to 7, and (p+q) represents an integer of 3 to 10,
r represents an integer of 0 to 100, and each of s and t independently represents 0 or 1, and
R represents a hydrogen atom, a methyl group or a fluorine atom,
when (p+q) is 5 or more, t is 0, and
an order of (OCF 2 CF 2 ), (OCF 2 ) and (OCFRf 2 ) is not particularly limited.

4. The antistatic antireflection film according to claim 3 ,
wherein in the Formula (1), r represents 1 to 5, s represents 0 or 1, t represents 0 or 1, p represents 3 to 6, and q represents 0.

5. The antistatic antireflection film according to claim 1 ,
wherein the composition for a low refractive index layer further contains (f) a fluorine-free polyfunctional monomer having at least three or more reactive functional groups in one molecule.

6. The antistatic antireflection film according to claim 1 ,
wherein the composition for a hardcoat layer contains a fluoroaliphatic group-containing copolymer having a repeating unit derived from a monomer containing a fluoroaliphatic group represented by the following Formula (F1) and a repeating unit derived from a monomer which does not contain a fluoroaliphatic group represented by the following Formula (F2):

wherein, R 0 represents a hydrogen atom, a halogen atom or a methyl group,
L represents a divalent linking group, and
n represents an integer of 1 to 18:

wherein, R 1 represents a hydrogen atom, a halogen atom or a methyl group,
L 1 represents a divalent linking group,
Y represents a straight-chained, branched or cyclic alkyl group having of 1 to 20 carbon atoms, which may be substituted, or an aromatic group which may be substituted.

7. A polarizing plate comprising the antistatic antireflection film according to claim 1 as a protective film for a polarizing plate.

8. An image display device comprising the polarizing plate according to claim 7 .

9. An image display device comprising the antistatic antireflection film according to claim 1 .

10. The antistatic antireflection film according to claim 1 , wherein a content of the polymer having a quaternary ammonium is 1% by mass to 30% by mass, based on a total solid amount in the composition for a hardcoat layer.

11. The antistatic antireflection film according to claim 1 , wherein the silicone compound (d-1) has a number average molecular weight of 9,000 or more.

12. A method for manufacturing an antistatic antireflection film comprising, a support, a hardcoat layer containing a compound having a quaternary ammonium salt group, and a low refractive index layer, in this order, the method comprising:
coating and curing a composition for a low refractive index layer containing at least the following (a), (b), (c) and (d), wherein,
(a) is an ethylenically unsaturated group-containing fluoropolymer,
(b) is a fluorine-containing polyfunctional monomer having a surface free energy of 23 mN/m or more when a film is formed alone, four or less —CF 3 groups in a molecule, a fluorine content of 30% or more, and at least three reactive functional groups in one molecule,
(c) is hollow silica fine particles having an average particle size of 10 nm to 100 nm, and
(d) is a compound having a dimethylsiloxane structure,

wherein the refractive index of the low refractive index layer is 1.30 to 1.51,
wherein the compound having a quaternary ammonium salt group is a polymer having a quaternary ammonium having, as a polymerization unit, a compound having an alkylene oxide chain, and an alkyl (meth)acrylate,
wherein the compound (d) having a dimethylsiloxane structure is at least two of a silicone compound (d-1) having a number average molecular weight of 4,000 or more and a silicone compound (d-2) having a number average molecular weight of 1,000 or more and less than 4,000,
wherein the silicone compound (d-1) is a compound having a (meth)acryloyl group at a terminal thereof, a compound having (meth)acryloyl groups at both terminals thereof or a compound having a (meth)acryloyl group at a side chain of the siloxane structure, and
wherein the silicone compound (d-2) has a siloxane structure and two or more (meth)acryloyl groups.

13. The method for manufacturing an antistatic antireflection film according to claim 12 ,
wherein the composition for a low refractive index layer further comprises (e) solid silica particles having an average particle size of 40 nm to 100 nm in an amount of 0.1% by mass to 10% by mass, based on a total solid of the composition for a low refractive index layer.

14. The method for manufacturing an antistatic antireflection film a

Assignees

• Fujifilm Corp

Inventors

• Wakizaka Daiki
• Fukuda Kenichi

Classifications

• Y10T428/259

  Silicic material · CPC title

• Y10T428/249974

  Metal- or silicon-containing element · CPC title

• G02B27/0006

  with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation (G02B1/18 takes precedence; cleaning in general B08B) · CPC title

• G02B1/111 Primary

  using layers comprising organic materials · CPC title

• G02B1/11 Primary

  Anti-reflection coatings · CPC title