Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resin

US9522979B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9522979-B2
Application numberUS-201514981474-A
CountryUS
Kind codeB2
Filing dateDec 28, 2015
Priority dateFeb 6, 2015
Publication dateDec 20, 2016
Grant dateDec 20, 2016

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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The present invention provides a fluorine-containing silicon compound represented by the general formula (1), wherein each R 1 independently represents a hydrocarbon group having 1 to 6 carbon atoms; each R 2 independently represents a hydrogen atom or a hydrocarbon group having 1 to 6 carbon atoms; and n is an integer satisfying 0≦n≦2. There can be provided a fluorine-containing silicon compound having good storage stability and useful as a raw material of a composition for forming a silicon-containing intermediate film and a silicon-containing photoresist composition used for a fine processing in the manufacturing process of a semiconductor device.

First claim

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What is claimed is: 1. A fluorine-containing silicon compound represented by the general formula (1), wherein each R 1 independently represents a hydrocarbon group having 1 to 6 carbon atoms; each R 2 independently represents a hydrogen atom or a hydrocarbon group having 1 to 6 carbon atoms; and n is an integer satisfying 0≦n≦2. 2. The fluorine-containing silicon compound according to claim 1 , wherein the fluorine-containing silicon compound is used as a raw material of a resin contained in a composition for forming a silicon-containing intermediate film or a silicon-containing photoresist composition. 3. A method for producing a fluorine-containing silicon compound according to claim 1 , comprising subjecting a fluorine-containing silicon compound represented by the general formula (2) to intramolecular condensation, wherein each R 1 independently represents a hydrocarbon group having 1 to 6 carbon atoms; each R 2 independently represents a hydrogen atom or a hydrocarbon groups having 1 to 6 carbon atoms; and n is an integer satisfying 0≦n≦2. 4. A method for producing a fluorine-containing silicon compound according to claim 2 , comprising subjecting a fluorine-containing silicon compound represented by the general formula (2) to intramolecular condensation, wherein each R 1 independently represents a hydrocarbon group having 1 to 6 carbon atoms; each R 2 independently represents a hydrogen atom or a hydrocarbon groups having 1 to 6 carbon atoms; and n is an integer satisfying 0≦n≦2. 5. A method for producing a fluorine-containing silicon compound according to claim 1 , comprising reacting a fluorine-containing compound represented by the formula (3) with a silicon compound represented by the general formula (4), wherein each R 1 independently represents a hydrocarbon group having 1 to 6 carbon atoms; each R 2 independently represents a hydrogen atom or a hydrocarbon groups having 1 to 6 carbon atoms; and n is an integer satisfying 0≦n≦2. 6. A method for producing a fluorine-containing silicon compound according to claim 2 , comprising reacting a fluorine-containing compound represented by the formula (3) with a silicon compound represented by the general formula (4), wherein each R 1 independently represents a hydrocarbon group having 1 to 6 carbon atoms; each R 2 independently represents a hydrogen atom or a hydrocarbon groups having 1 to 6 carbon atoms; and n is an integer satisfying 0≦n≦2. 7. A method for producing a fluorine-containing silicon resin, comprising hydrolysis condensation of one or more compounds selected from the group consisting of a hydrolysable silicon compound represented by the general formula (5-1) and a reactive compound represented by the general formula (5-2) with one or more fluorine-containing silicon compounds according to claim 1 , R 3 m1 Si(OR 4 ) (4-m1)   (5-1) U(OR 5 ) m2 (OR 6 ) m3 (O) m4/2   (5-2) wherein each R 3 independently represents a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms; each R 4 independently represents a hydrocarbon group having 1 to 6 carbon atoms; m1 is an integer satisfying 0≦m1≦3; R 5 and R 6 independently represent a hydrogen atom or an organic group having 1 to 30 carbon atoms; U represents any element belonging to the group of III, IV, or V in the periodic table, except for carbon and silicon; m2+m3+m4 is a number of valency determined by U; and each of m2, m3, and m4 is an integer of 0 or more. 8. A method for producing a fluorine-containing silicon resin, comprising hydrolysis condensation of one or more compounds selected from the group consisting of a hydrolysable silicon compound represented by the general formula (5-1) and a reactive compound represented by the general formula (5-2) with one or more fluorine-containing silicon compounds according to claim 2 , R 3 m1 Si(OR 4 ) (4-m1)   (5-1) U(OR 5 ) m2 (OR 6 ) m3 (O) m4/2   (5-2) wherein each R 3 independently represents a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms; each R 4 independently represents a hydrocarbon group having 1 to 6 carbon atoms; m1 is an integer satisfying 0≦m1≦3; R 5 and R 6 independently represent a hydrogen atom or an organic group having 1 to 30 carbon atoms; U represents any element belonging to the group of III, IV, or V in the periodic table, except for carbon and silicon; m2+m3+m4 is a number of valency determined by U; and each of m2, m3, and m4 is an integer of 0 or more.

Assignees

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Classifications

  • a linkage containing boron · CPC title

  • Chemistry & Metallurgy · mapped topic

  • by reactions involving the formation of Si-O linkages · CPC title

  • Chemistry & Metallurgy · mapped topic

  • Siloxanes having aromatic substituents, e.g. phenyl side groups · CPC title

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What does patent US9522979B2 cover?
The present invention provides a fluorine-containing silicon compound represented by the general formula (1), wherein each R 1 independently represents a hydrocarbon group having 1 to 6 carbon atoms; each R 2 independently represents a hydrogen atom or a hydrocarbon group having 1 to 6 carbon atoms; and n is an integer satisfying 0≦n≦2. There can be provided a fluor…
Who is the assignee on this patent?
Shinetsu Chemical Co
What technology area does this patent fall under?
Primary CPC classification C08G77/24. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 20 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).