Inductor and method for manufacturing the same

US9520223B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9520223-B2
Application numberUS-201414223567-A
CountryUS
Kind codeB2
Filing dateMar 24, 2014
Priority dateMar 25, 2013
Publication dateDec 13, 2016
Grant dateDec 13, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention relates to an inductor. An inductor in accordance with an embodiment of the present invention includes: an insulating layer having a hole; a conductive pattern disposed on both surfaces of the insulating layer and having a structure in which portions disposed on the both surfaces are electrically connected to each other through the hole; and a magnetic layer disposed on the insulating layer to cover the conductive pattern, wherein the conductive pattern has a plating pattern formed by performing a plating process.

First claim

Opening claim text (preview).

What is claimed is: 1. An inductor comprising: an insulating layer having a hole; a conductive pattern disposed on both surfaces of the insulating layer and having a structure in which portions disposed on the both surfaces are electrically connected to each other through the hole; and a magnetic layer disposed on the insulating layer to cover the conductive pattern, wherein the conductive pattern comprises a first conductive pattern having a conducting portion formed in the hole and disposed on one surface of the insulating layer; and a second conductive pattern disposed on the other surface of the insulating layer and electrically connected to the first conductive pattern through the hole, and wherein a seed layer is only disposed between one surface of the insulating layer and an upper side of the first conductive pattern, wherein the second conductive pattern is a metal plate having an opening pattern, and wherein the metal plate is in direct contact with the surface of the insulating layer without any seed layer. 2. The inductor according to claim 1 , wherein the first conductive pattern is a plating pattern. 3. The inductor according to claim 1 , wherein the conductive pattern has a metal pattern formed by etching a metal plate. 4. The inductor according to claim 1 , wherein the second conductive pattern is a metal pattern formed by etching a metal plate. 5. The inductor according to claim 1 , wherein the insulating layer has a thickness of less than 40 μm. 6. The inductor according to claim 1 , wherein the conductive pattern comprises a first conductive pattern having a conducting portion formed in the hole and disposed on one surface of the insulating layer, wherein the thickness of the first conductive pattern is more than 2.5 times the thickness of the insulating layer. 7. The inductor according to claim 1 , wherein the conductive patterns disposed on both sides of the insulating layer based on the insulating layer have the same thickness. 8. The inductor according to claim 1 , wherein the magnetic layer is made of a metal-resin composite comprising an iron (Fe)-containing metal and a thermosetting resin. 9. The inductor according to claim 1 , wherein the conductive pattern has a multilayer coil structure disposed on both sides of the insulating layer with the insulating layer interposed therebetween.

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What does patent US9520223B2 cover?
The present invention relates to an inductor. An inductor in accordance with an embodiment of the present invention includes: an insulating layer having a hole; a conductive pattern disposed on both surfaces of the insulating layer and having a structure in which portions disposed on the both surfaces are electrically connected to each other through the hole; and a magnetic layer disposed on th…
Who is the assignee on this patent?
Samsung Electro Mech
What technology area does this patent fall under?
Primary CPC classification H01F27/2804. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 13 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).