Microscopic roughness structure with protective film and method thereof

US9519082B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9519082-B2
Application numberUS-201214238053-A
CountryUS
Kind codeB2
Filing dateAug 16, 2012
Priority dateAug 16, 2011
Publication dateDec 13, 2016
Grant dateDec 13, 2016

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Abstract

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In a protective film affixed to a microscopic roughness structure having a microscopically rough structure on the surface, water contact angle of the surface of the microscopic roughness structure is 40° or less, compressive stress obtainable when the adhesive layer of the protective film is compressed to a compression ratio of 20% is 0.6 MPa to 3.0 MPa; in the infrared absorption spectrum of the surface on the microscopically rough structure side of the microscopic roughness structure, ratio (A1/A2) of peak area A1 having absorption maximum of 3700 cm −1 to 3100 cm −1 , and peak area A2 having absorption maximum of 1730±10 cm −1 , is 0.1 to 0.8; in the surface of adhesive layer of the protective film, ratio (B1/B2) of peak area B1 having absorption maximum of 3700 cm −1 to 3100 cm −1 , and peak area B2 having absorption maximum of 1730±10 cm −1 , is 0.6 to 1.3.

First claim

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The invention claimed is: 1. A protective film-attached microscopic roughness structure comprising: a microscopic roughness structure on the surface having a microscopically rough structure having a period less than or equal to the wavelength of visible light, and a protective film for protecting the surface of the microscopic roughness structure affixed thereto, wherein the water contact angle of the surface of the microscopic roughness structure is 40° or less, the protectiv…

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What does patent US9519082B2 cover?
In a protective film affixed to a microscopic roughness structure having a microscopically rough structure on the surface, water contact angle of the surface of the microscopic roughness structure is 40° or less, compressive stress obtainable when the adhesive layer of the protective film is compressed to a compression ratio of 20% is 0.6 MPa to 3.0 MPa; in the infrared absorption spectrum of t…
Who is the assignee on this patent?
Takihara Tsuyoshi, Mori Seiichiro, Okamoto Eiko, and 1 more
What technology area does this patent fall under?
Primary CPC classification G02B1/14. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Dec 13 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).