Display device manufacture using a sacrificial layer interposed between a carrier and a display device substrate

Patent metadata

Field	Value
Publication number	US-9515272-B2
Application number	US-201514882992-A
Country	US
Kind code	B2
Filing date	Oct 14, 2015
Priority date	Nov 12, 2014
Publication date	Dec 6, 2016
Grant date	Dec 6, 2016

Abstract

A method of manufacturing a display device is provided which uses a sacrificial layer interposed between a carrier and a display device substrate.

First claim

What is claimed is:

1. A method of manufacturing a display device comprising: (a) providing a carrier substrate; (b) disposing a layer of an organic coating on a front surface of the carrier substrate; (c) disposing a layer of one or more oxymetal precursor materials on the organic coating layer, wherein the oxymetal precursor material comprises one or more metal atoms and one or more ligands; (d) curing the layer of oxymetal precursor material to form an oxymetal layer; (e) forming a flexible substrate layer on the oxymetal layer; (f) forming one or more devices on the flexible substrate layer; (g) irradiating a back surface of the carrier substrate with a laser to heat the oxymetal layer, and then (h) mechanically separating the flexible substrate layer from the carrier substrate.

2. The method of claim 1 wherein at least one metal atom is chosen from silicon, titanium, zirconium, hafnium, tungsten, tantalum, molybdenum, and aluminum.

3. The method of claim 1 wherein the organic coating layer is formed by disposing a coating composition comprising an organic oligomer and a solvent on the carrier substrate surface; removing the solvent; and curing the organic oligomer to form the organic coating.

4. The method of claim 1 wherein the organic coating layer is directly on the carrier substrate surface.

5. The method of claim 1 wherein the organic coating and layer of oxymetal precursor are formed by disposing a layer of a coating composition on the carrier substrate surface, wherein the coating composition comprises a matrix precursor material, an oxymetal precursor material having a surface energy of 20 to 40 erg/cm 2 , and an organic solvent; subjecting the coating composition layer to conditions such that a layer of the oxymetal precursor material forms on a layer of the matrix precursor material; and curing the matrix precursor material to form the organic coating layer.

6. The method of claim 1 wherein the organic coating layer comprises a polymeric material chosen from arylene polymers, arylene ether polymers, imide polymers, siloxane polymers, styrene polymers, (meth)acrylate polymers, isobenzoxazole polymers, and mixtures thereof.

7. The method of claim 1 wherein the oxymetal precursor material is chosen from:
(i) compounds of formula (1)
ML x   (1)

wherein M is a Group 3 to Group 14 metal; each L is a ligand independently chosen from light attenuating moieties, diketonates, ketiminates, C 2-20 polyols, C 1-20 alkoxides, C 1-20 alkylthiols, C 1-20 alkylcarboxylates, and C 7-20 arylcarboxylates; x refers to the number of ligands and is the valence of M;
(ii) oligomers of the compounds of formula (1);
(iii) oligomers having pendant groups comprising a Group 3 to Group 14 metal;
(iv) compounds of formula (2)

wherein R 1 =H or CH 3 ; M=a Group 3 to Group 14 metal; L 1 is a ligand independently chosen from light attenuating moieties, diketonates, ketiminates, C 2-20 polyols, C 1-20 alkoxides, C 1-20 alkylthiols, C 1-20 alkylcarboxylates, and C 7-20 arylcarboxylates; and n refers to the number of ligands and is the valence of M; and
(v) mixtures thereof.

8. The method of claim 1 wherein the oxymetal layer is formed from two or more oxymetal precursor materials that are different from each other.

9. The method of claim 1 wherein the oxymetal layer has a thickness of from 10 to 20 nm.

10. The method of claim 1 further comprising thermally heating the carrier substrate following laser irradiation.

11. The method of claim 1 further comprising the step of treating the surface of the carrier substrate with an adhesion promoting composition prior to disposing the layer of the organic coating on the surface of the carrier substrate.

12. A method of manufacturing a display device comprising: (a) providing a carrier substrate; (b) disposing a layer of a coating composition on a front surface of the carrier substrate, wherein the coating composition comprises a matrix precursor material, an oxymetal precursor material, and an organic solvent, the oxymetal precursor material comprising one or more metal atoms and one or more ligands and having a surface energy of 20 to 40 erg/cm 2 ; (c) subjecting the coating composition layer to conditions such that a layer of the oxymetal precursor material forms on a layer of the matrix precursor material; (d) curing the matrix precursor material to form the organic coating layer; (e) curing the layer of oxymetal precursor material to form an oxymetal layer; (f) forming a flexible substrate layer on the oxymetal layer; (g) forming one or more devices on the flexible substrate layer; and (h) separating the flexible substrate layer from the carrier substrate.

13. The method of claim 12 wherein the step of separating the flexible substrate layer from the carrier substrate is achieved by irradiating the back side of the carrier substrate with a laser to heat the oxymetal layer, and then mechanically separating the flexible substrate layer.

Assignees

• Rohm & Haas Elect Mat
• Rohm & Haas Elect Materials Korea Ltd
• Rohm Adn Haas Electronic Mat Korea Ltd

Inventors

• Kim Young Seok
• Kang Yerang
• Gilmore Christopher D
• Wang Deyan
• O'Connell Kathleen M
• Lee Moo-Young
• Chuang Peng-Wei

Classifications

• H10K59/12 Primary

  Active-matrix OLED [AMOLED] displays · CPC title

• H10K77/111

  Flexible substrates · CPC title

• C23C18/122 Primary

  Inorganic polymers, e.g. silanes, polysilazanes, polysiloxanes · CPC title

• H01L2251/5338

  Electricity · mapped topic

• H01L2227/326

  Electricity · mapped topic