Substrate processing method and substrate processing system
US-2024173742-A1 · May 30, 2024 · US
Substrate processing apparatus and substrate processing method for performing cleaning treatment on substrate
US9508568B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9508568-B2 |
| Application number | US-201414449210-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 1, 2014 |
| Priority date | Aug 8, 2013 |
| Publication date | Nov 29, 2016 |
| Grant date | Nov 29, 2016 |
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Abstract
Official abstract text for this publication.
A special mode has a second rinsing process which supplies a rinsing liquid to a substrate while holding and rotating the substrate with a spin chuck under operating conditions different from those in a first rinsing process in a normal mode. In the second rinsing process, a processing cup is cleaned with the rinsing liquid flown off from the rotating substrate. In the second rinsing process in which the substrate is held by the spin chuck, the rinsing liquid flown off from the substrate is less prone to collide with chuck members. The provision of a mechanism designed specifically for the cleaning of the cup is not required in the special mode. The special mode is a mode executable when a substrate is present inside a chamber, and can be executed in the middle of lot processing.
First claim
Opening claim text (preview).
What is claimed is: 1. A method of processing a plurality of substrates belonging to the same lot in succession by using a processing apparatus body and a controller for controlling said processing apparatus body, said processing apparatus body including a substrate holding part for holding a substrate, a rotary drive part for rotating said substrate holding part, a liquid chemical supply part for supplying a liquid chemical to said substrate held by said substrate holding part, a…
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Classifications
Electricity · mapped topic
- H10P72/0414Primary
Electricity · mapped topic
Operations & Transport · mapped topic
Operations & Transport · mapped topic
- H01L21/67051Primary
Electricity · mapped topic
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Frequently asked questions
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- What does patent US9508568B2 cover?
- A special mode has a second rinsing process which supplies a rinsing liquid to a substrate while holding and rotating the substrate with a spin chuck under operating conditions different from those in a first rinsing process in a normal mode. In the second rinsing process, a processing cup is cleaned with the rinsing liquid flown off from the rotating substrate. In the second rinsing process in…
- Who is the assignee on this patent?
- Dainippon Screen Mfg, Screen Holdings Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification H10P72/0414. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Nov 29 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).