System, method and apparatus for RF power compensation in a plasma processing system

Patent metadata

Field	Value
Publication number	US-9508529-B2
Application number	US-201414521776-A
Country	US
Kind code	B2
Filing date	Oct 23, 2014
Priority date	Oct 23, 2014
Publication date	Nov 29, 2016
Grant date	Nov 29, 2016

Abstract

Plasma processing systems and methods including a plasma processing chamber and an RF transmission path. The plasma processing chamber including an electrostatic chuck. The RF transmission path including one or more RF generators, a match circuit coupled the RF generator and an RF feed coupling the match circuit to the electrostatic chuck. The system also includes an RF return path coupled between the plasma processing chamber and the RF generator. A plasma processing system controller is coupled to the plasma processing chamber and the RF transmission path. The controller includes recipe logic for at least one plasma processing recipe including multiple plasma processing settings and an RF power compensation logic for adjusting at least one of the plasma processing settings.

First claim

The invention claimed is:

1. A plasma processing system comprising:
a plasma processing chamber including an electrostatic chuck;
an RF transmission path including:
at least one RF generator;
a match circuit having an input coupled to an output of the at least one RF generator; and
an RF feed coupling a match circuit output to an RF input to the electrostatic chuck;
an RF return path coupled between the plasma processing chamber and the at least one RF generator; and
a…

Assignees

• Lam Res Corp

Inventors

• Valcore Jr John C
• Povolny Henry

Classifications

• H01J37/32082 Primary

  Electricity · mapped topic

• H01J37/32926

  Electricity · mapped topic

• H01J37/32165

  Electricity · mapped topic

• H01J37/32183

  Electricity · mapped topic

• H01J37/32174

  Electricity · mapped topic