Apparatus and method of controlling chuck, and exposure apparatus and control method thereof
US-9287155-B2 · Mar 15, 2016 · US
US9507272B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9507272-B2 |
| Application number | US-201615014746-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 3, 2016 |
| Priority date | Jun 28, 2011 |
| Publication date | Nov 29, 2016 |
| Grant date | Nov 29, 2016 |
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Exemplary embodiments of the invention disclose an exposure apparatus and a method of tuning parameters of a chuck, which may reduce a time taken to level the chuck by previously tuning parameters of the chuck. The method of tuning parameters of a chuck includes detecting a tilt component of the chuck, performing chuck tilt adjustment to minimize the tilt component of the chuck, and tuning the parameters of the chuck if a residual tilt component is present after performing the chuck tilt adjustment.
Opening claim text (preview).
What is claimed is: 1. An exposure apparatus, comprising: an optical head unit that irradiates light on an object; a chuck that supports the object; and a controller that detects a tilt component of the chuck, that adjusts a position of the chuck to remove, at least partially, the tilt component of the chuck, and that tunes at least one parameter of the chuck if a residual tilt component is present after adjusting the position of the chuck; wherein the at least one parameter compri…
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