Method for manufacturing a color filter, color filter and solid-state imaging device

US9507257B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9507257-B2
Application numberUS-201414188955-A
CountryUS
Kind codeB2
Filing dateFeb 25, 2014
Priority dateAug 31, 2011
Publication dateNov 29, 2016
Grant dateNov 29, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

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The present disclosure relates to a method for manufacturing a color filter being capable of suppressing residue from being generated on a colored layer planarized by a planarization treatment, a color filter, and a solid-state imaging device.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for manufacturing a color filter, comprising: (a) forming a first colored layer including a first coloring composition to form a plurality of first colored pixels; (b) patterning the first colored layer by a dry etching to form a plurality of first through-holes in the first colored layer; (c) stacking a second colored layer including a second coloring composition on the first colored layer so that the second coloring composition is embedded inside each of the first through-holes so as to form a plurality of second colored pixels; (d) patterning the second colored layer by dry etching so that a plurality of second through-holes apart from the first through-holes are formed on the first colored layer to form the plurality of first colored pixels; (d′) performing a planarization treatment on the second colored layer until at least the first colored layer is exposed; (e) stacking a third colored radiation sensitive layer including the third coloring radiation sensitive composition on the first colored layer so that the third coloring radiation sensitive composition is embedded inside each of the second through-holes so as to form a plurality of third colored pixels; and (f) removing the third colored radiation sensitive layer by exposing and developing a position of the third colored radiation sensitive layer which corresponds to the second through-holes formed in the first colored layer, wherein the process (d′) is performed after the process (c) and before the process (d), or after the process (d) and before the process (e), the first coloring composition contains a colorant and a resin, a content of the colorant is 60% by mass or more based on total solids of the first coloring composition, and an solid acid number of a resin having the highest solid acid number is 80 mg KOH/g or less, and the third colored radiation sensitive layer contains a photopolymerization initiator and a polymerizable compound. 2. The method according to claim 1 , wherein a colorant contained in the first coloring composition is C.I. Pigment Green 36 and C.I. Pigment Yellow 185. 3. The method according to claim 1 , wherein the process (d′) is performed after the process (c) and before the process (d). 4. The method according to claim 3 , further comprising: forming a photoresist layer on the first colored layer in the process (b) and (d); patterning the photoresist layer by exposing and developing to obtain a resist pattern; and dry etching the first colored layer by using the resist pattern as an etching mask. 5. The method according to claim 1 , wherein the process (d′) is performed after the process (d) and before the process (e). 6. The method according to claim 5 , further comprising: forming a photoresist layer on the first colored layer in the process (b) and the second colored layer in the process (d); patterning the photoresist layer by exposing and developing to obtain a resist pattern; and dry etching the colored layer by using the resist pattern as an etching mask. 7. The method according to claim 1 , wherein the process (d′) is performed by an etch back treatment or a chemical mechanical polishing treatment. 8. The method according to claim 1 , wherein the first colored layer is a green transmitting layer. 9. The method according to claim 1 , wherein one of the second colored pixel and the third colored pixel is a red transmitting portion and the other is a blue transmitting portion. 10. The method according to claim 1 , wherein the photopolymerization initiator contained in the third colored radiation sensitive layer contains an oxime compound. 11. The method according to claim 1 , wherein the first colored pixels are green pixels, the first coloring composition contains a green pigment, and a content of the green pigment in the first coloring composition is 60 to 80 mass %.

Assignees

Inventors

Classifications

  • containing organic substances, e.g. dyes, inks or pigments · CPC title

  • Arrays (G02B3/02, G02B5/188 take precedence) · CPC title

  • in the form of arrays · CPC title

  • Filters (polarising elements G02B5/30) · CPC title

  • G03F7/0007Primary

    Filters, e.g. additive colour filters; Components for display devices · CPC title

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Frequently asked questions

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What does patent US9507257B2 cover?
The present disclosure relates to a method for manufacturing a color filter being capable of suppressing residue from being generated on a colored layer planarized by a planarization treatment, a color filter, and a solid-state imaging device.
Who is the assignee on this patent?
Fujifilm Corp
What technology area does this patent fall under?
Primary CPC classification G03F7/0007. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Nov 29 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).