Method of extracting properties of a layer on a wafer
US-2024234216-A9 · Jul 11, 2024 · US
Inspection apparatus
US9506872B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9506872-B2 |
| Application number | US-201414204207-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 11, 2014 |
| Priority date | Sep 10, 2008 |
| Publication date | Nov 29, 2016 |
| Grant date | Nov 29, 2016 |
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Abstract
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An inspection method and apparatus for detecting defects or haze of a sample, includes illuminating light to the sample from an oblique direction relative to a surface of the sample with an illuminator, detecting first scattered light at a forward position relative to an illuminating direction from the sample with a first detector, detecting second scattered light at a sideward or backward position relative to the illuminating direction from the sample with a second detection, and processing a first signal of the first scattered light and a second signal of the second scattered light with different weighting for the first signal and for the second signal with a processor.
First claim
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What is claimed is: 1. An inspection method for detecting defects or haze of a sample, comprising the steps of: illuminating light to the sample from an oblique direction relative to a surface of the sample; detecting first forward scattered light scattering toward a forward direction relative to an illuminating direction from the sample to generate a first signal; detecting second sideward or backward scattered light scattering toward a sideward or backward direction relative…
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Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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- What does patent US9506872B2 cover?
- An inspection method and apparatus for detecting defects or haze of a sample, includes illuminating light to the sample from an oblique direction relative to a surface of the sample with an illuminator, detecting first scattered light at a forward position relative to an illuminating direction from the sample with a first detector, detecting second scattered light at a sideward or backward posi…
- Who is the assignee on this patent?
- Hitachi High Tech Corp
- What technology area does this patent fall under?
- Primary CPC classification G01N21/9501. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Nov 29 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).