Pulsed laser induced plasma light source

Patent metadata

Field	Value
Publication number	US-9506871-B1
Application number	US-201414578949-A
Country	US
Kind code	B1
Filing date	Dec 22, 2014
Priority date	May 25, 2014
Publication date	Nov 29, 2016
Grant date	Nov 29, 2016

Abstract

Methods and systems are described herein for producing high radiance illumination light suitable for semiconductor metrology. A cold gas is repeatedly ignited by a pulsed laser to periodically generate accessible, high brightness illumination light generated during each break-down event. The pulse duration and repetition period are set to ignite, but not sustain fully formed plasma. The central plasma core emits high color temperature light before a cooler plasma region forms around the central core. Thus, after ignition, the plasma is extinguished before the arrival of the next laser pulse. The repeated plasma ignition/extinction cycle generates illumination light at high color temperature that is accessible for illumination purposes in a metrology application. In one embodiment, a bulb filled with Xenon gas at 10 atmospheres is repeatedly ignited with a pulsed laser having pulse duration of 10 nanoseconds to generate illumination light with a color temperature of approximately 60,000 Kelvin.

First claim

What is claimed is:

1. An illumination source comprising:
a pulsed laser operable to generate a beam of pulsed laser light having a pulse duration that is less than a pulse repetition period of the pulsed laser;
a working medium;
one or more beam shaping optics configured to focus the beam of pulsed laser light to a location within the working medium; and
a computing system configured to communicate a command signal to the pulsed laser that causes the pulsed laser to adjust the pulse duration, the pulse repetition period, or both, such that a plasma emission is repeatedly ignited in the working medium by the focused beam of pulsed laser light during an on time of the beam of pulsed laser light, and wherein the plasma is repeatedly extinguished during an off time of the beam of pulsed laser light, and wherein a modulation depth of accessible light output from the plasma emission is greater than ninety percent.

2. The illumination source of claim 1 , wherein the one or more beam shaping optics are configured to focus the beam of pulsed laser light to the location within the working medium with a numerical aperture greater than 0.6.

3. The illumination source of claim 1 , wherein the working medium is maintained at a pressure greater than 0.5 atmospheres.

4. The illumination source of claim 1 , wherein an amount of accessible light generated by the plasma has a color temperature greater than 30,000 degrees Kelvin.

5. The illumination source of claim 1 , wherein a spectrum of accessible light generated by the plasma includes wavelengths from less than 200 nanometers to greater than 1,500 nanometers.

6. The illumination source of claim 1 , further comprising:
a pair of electrodes configured to preionize the working medium before an arrival of the amount of pulsed illumination light.

7. The illumination source of claim 1 , further comprising:
a second laser illumination source configured to preionize the working medium before an arrival of the amount of pulsed illumination light.

8. The illumination source of claim 1 , wherein the one or more beam shaping optics include a beam expanding optic configured to expand the pulsed beam of laser light, and a condensing optic configured to focus the expanded, pulsed beam of laser light to the location within the volume of working medium.

9. The illumination source of claim 1 , further comprising:
a container configured to maintain the working medium within a volume, wherein the container includes a transmissive wall that transmits the pulsed beam of laser light into the volume.

10. A metrology system comprising:
an illumination source configured to generate an amount of broadband radiation directed to a specimen, the illumination source comprising,
a pulsed laser operable to generate a pulsed beam of laser light having a pulsed duration that is less than a pulse repetition period of the pulsed laser;
a working medium, and
one or more beam shaping optics configured to focus the pulsed beam of laser light to a location within the working medium;
a computing system configured to communicate a command signal to the pulsed laser that causes the pulsed laser to adjust the pulse duration, the pulse repetition period, or both, such that a plasma emission is repeatedly ignited in the working medium by the focused, pulsed beam of laser light during an on time of the pulsed beam of laser light, and wherein the ignited plasma is repeatedly extinguished during an off time of the pulsed laser light, wherein a modulation depth of accessible light output from the plasma emission is greater than ninety percent; and
a detector configured to receive an amount of radiation collected from the specimen in response to the incident radiation and generate signals indicative of a property of the specimen.

11. The metrology system of claim 10 , further comprising:
a beam steering mechanism configured to steer the focused beam of the pulsed laser light to different locations within the working medium.

12. The metrology system of claim 11 , wherein the beam steering mechanism is configured to steer the focused beam of the pulsed laser light to different locations within the working medium such that an illumination aperture of the metrology system is sequentially filled with illumination light from a plurality of sequentially ignited plasmas.

13. The metrology system of claim 11 , wherein the beam steering mechanism is configured to steer the focused beam of the pulsed laser light to different locations along a direction of propagation of the focused beam.

14. The metrology system of claim 11 , wherein the amount of radiation collected from the specimen by the detector is averaged over the plurality of sequentially ignited plasmas.

15. The metrology system of claim 11 , wherein the beams steering mechanism includes a scanning mirror located in an optical beam path between the pulsed laser and the ignited plasma.

16. The metrology system of claim 10 , further comprising:
a computing system configured to synchronize a pulse of the pulsed laser with a data acquisition period of the detector.

17. The metrology system of claim 10 , wherein the working medium is maintained at a pressure greater than 0.5 atmospheres.

18. The metrology system of claim 10 , wherein an amount of accessible light generated by the plasma emission has a color temperature greater than 30,000 degrees Kelvin.

19. The metrology system of claim 10 , wherein a spectrum of accessible light generated by the plasma emission includes wavelengths from less than 200 nanometers to greater than 1,500 nanometers.

20. The metrology system of claim 10 , further comprising:
a pair of electrodes configured to preionize the working medium before an arrival of the amount of pulsed illumination light.

21. The metrology system of claim 10 , further comprising:
a laser illumination source configured to preionize the working medium before an arrival of the amount of pulsed illumination light.

22. A method comprising:
generating a beam of pulsed laser light having a peak output with a pulse duration that is less than a pulse repetition period of the beam of pulsed laser light; and
focusing the pulsed beam of laser light to a location within a volume of a working medium with a numerical aperture greater than 0.6, wherein the focused, pulsed beam of laser light repeatedly ignites a plasma emission while the beam of pulsed laser light is at the peak output, and wherein each plasma emission is extinguished following each period of the peak output such that a modulation depth of accessible light output from the plasma emission is greater than ninety percent.

23. The method of claim 22 , further comprising:
preionizing the working medium before an arrival of the beam of pulsed laser light at peak output.

24. The method of claim 22 , wherein the working medium is maintained at a pressure greater than 0.5 atmospheres.

25. The method of claim 22 , further comprising: steering the focused beam of the pulsed laser light to different locations within the working medium.

26. The method of claim 25 , wherein the steering the focused beam of the pulsed laser light to different locations within the working medium involves steering the focused beam such that an illumination aperture of a metrology system is sequentially filled with illumination light from a plurality of sequentially ignited plasmas.

27. The method of

Assignees

• Kla Tencor Corp

Inventors

• Flock Klaus

Classifications

• H05H1/46

  using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/26 takes precedence) · CPC title

• G01N21/956

  Inspecting patterns on the surface of objects {(contactless testing of electronic circuits G01R31/308; testing currency G07D; manufacturing processes per se of semiconductor devices implementing a measuring step H10P74/20)} · CPC title

• G01N2201/0697

  Pulsed lasers · CPC title

• G02B27/09

  Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for {(adapting the beam shape of a laser diode G02B19/0052; adapting the beam shape of an LED G02B19/0061; coupling into light guides using intermediate optical elements G02B6/4204; beam shaping specially adapted for lasers H01S3/005)} · CPC title

• G01N21/9501

  Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step H10P74/20) · CPC title