Simultaneous pattern-scan placement during sample processing
US-2024207969-A1 · Jun 27, 2024 · US
US9506868B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9506868-B2 |
| Application number | US-201314431727-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 27, 2013 |
| Priority date | Sep 27, 2012 |
| Publication date | Nov 29, 2016 |
| Grant date | Nov 29, 2016 |
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The invention relates to a method of analyzing particles, in particular particles of diameter less than 1 μm, the method comprising the following steps: firing laser shots into a cold plasma ( 45 ) at low pressure; using an optical spectrometer device ( 60 ) to acquire emission spectra of the light emitted by the plasma as a result of the laser shots, in such a manner that for each acquired spectrum, an acquisition period begins no later than 100 ns after firing the laser shot; and analyzing the particles present in the plasma on the basis of the emission spectra. A system for detecting and/or analyzing particles by performing the method.
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The invention claimed is: 1. An analysis method for analyzing particles, in particular particles of diameter less than 1 μm, the method comprising the following steps: a) providing a cold plasma at a pressure less than 10 mbar; b) firing laser shots into the cold plasma; c) using an optical spectrometer device to acquire emission spectra of the light emitted by the plasma as a result of the laser shots, in such a manner that for each acquired spectrum, an acquisition period be…
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