Laminated coating having excellent abrasion resistance
US-2015361562-A1 · Dec 17, 2015 · US
US9506139B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9506139-B2 |
| Application number | US-201314426458-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 4, 2013 |
| Priority date | Sep 8, 2012 |
| Publication date | Nov 29, 2016 |
| Grant date | Nov 29, 2016 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A wear resistant coating system including a tantalum-containing multilayered film having n A layers and m B layers, where n and m are integral numbers larger than I, deposited alternating one on each other. The multilayered film exhibits crystalline cubic structure, and is characterized in that the B layers include tantalum and the A layers exhibit a higher defect density than the B layers.
Opening claim text (preview).
What is claimed is: 1. Wear resistant coating system ( 20 ) comprising a tantalum containing multilayered film ( 10 ) consisting of n A layers ( 4 ) and m B layers ( 8 ), where n and m are integral numbers larger than 1, deposited alternate one on each other, said multilayered film ( 10 ) exhibiting crystalline cubic structure, characterized in that the B layers comprises tantalum and the A layers exhibit a higher defect density than the B layers. 2. Coating system according to claim 1 , characterized in that the chemical composition of the A and B layers is given by the formulas with the coefficients in atomic percentage: Me 1 1-x Al x N z X 1-z for the A layers and Me 2 1-x-y Al x Ta y N z X 1-z , for the B layers, where: Me 1 is one or more elements from: Ti, Cr, V, Ta, Nb, Zr, Hf, Mo, Si and W, and Me 2 is one or more elements from: Ti, Cr, V, Nb, Zr, Hf, Mo, Si and W, and X is one or more elements from: 0, C and B, and 0.2≦X≦0.7, 0.7≦Z≦1, 0.02≦y≦0.80. 3. Coating system according to claim 2 , characterized in that the thickness of the B layers is smaller than the thickness of the A layers: A 1 >B 1 , A 2 >B 2 , A 3 >B 3 . . . An>Bm. 4. Coating system according to claim 3 , characterized in that the thickness of the A layers is at least 15% larger than the thickness of the B layers: A 1 ≧1.15 B 1 , A 2 ≧1.15 B 2 , A 3 ≧1.15 B 3 . . . An≧1.15 Bm. 5. Coated body comprising a body ( 1 ) and a coating system ( 20 ) according to claim 1 deposited on at least a portion of the surface of the body ( 1 ). 6. Coated body according to claim 4 , characterized in that the multilayered film ( 10 ) of the coating system ( 20 ) is deposited by means of PVD techniques. 7. Coated body according to claim 6 , characterized in that the B layers of the multilayered film ( 10 ) are deposited by means of magnetron sputtering ion plating techniques or high ionization magnetron sputtering techniques. 8. Coated body according to claim 6 , characterized in that the A layers are deposited by means of arc ion plating techniques. 9. Method of manufacturing a coated body according to claim 5 , characterized in that the A layers and/or the B layers are deposited on the substrate by means of PVD techniques. 10. Method according to claim 9 , characterized in that by depositing the A layers and/or the B layers reactive physical vapor deposition techniques are used. 11. Method according to claim 10 , characterized in that the nitrogen fraction and/or at least one of the elements comprised in the X component of the coating system are incorporated from a reactive gas or from a reactive gas mixture in the A and/or B layers, respectively. 12. Method according to claim 9 , characterized in that the multilayered film ( 10 ), i.e. both the A- and B-layers are deposited by means of arc ion plating techniques. 13. Method according to claim 12 , characterized in that for adjusting the desired defect density in the layers A and B the coil current is adjusted correspondingly. 14. Method according to claim 9 , characterized in that at least one target used as source material for depositing the A- and/or B-layers is made by powder metallurgy techniques.
coatings specially adapted for cutting tools or wear applications · CPC title
characterized by the composition of the alternating layers · CPC title
including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides · CPC title
AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi · CPC title
Electric arc evaporation · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.