System architecture for vacuum processing

Patent metadata

Field	Value
Publication number	US-9502276-B2
Application number	US-201313871871-A
Country	US
Kind code	B2
Filing date	Apr 26, 2013
Priority date	Apr 26, 2012
Publication date	Nov 22, 2016
Grant date	Nov 22, 2016

Abstract

A system for processing substrates in plasma chambers, such that all substrates transport and loading/unloading operations are performed in atmospheric environment, but processing is performed in vacuum environment. The substrates are transported throughout the system on carriers. The system's chambers are arranged linearly, such that carriers move from one chamber directly to the next. A conveyor, placed above or below the system's chambers, returns the carriers to the system's entry area after processing is completed. Loading and unloading of substrates may be performed at one side of the system, or loading can be done at the entry side and unloading at the exit side.

First claim

The invention claimed is:

1. A system for processing substrates in vacuum chamber, comprising:
a plurality of carriers, each carrier configured for supporting and transporting substrates throughout the system;
a loading station for loading substrates onto the carriers;
a carrier transport system for transporting the carriers throughout the system and returning the carriers to the loading station;
a loadlock chamber arrangement for introducing carries into vacuum environment;
at least one vacuum processing chamber receiving a plurality of carriers from the loadlock arrangement, the vacuum processing chamber sized and configured for simultaneously housing the plurality of carriers and simultaneously processing substrates positioned on the plurality of carriers; and,
a buffer station positioned between the loading station and the loadlock arrangement, wherein the buffer station comprises carrier rotating arrangement for rotating the carriers from a horizontal orientation to a vertical orientation;
wherein the carrier transport system comprises a conveyor for returning carriers to the loading station after completion of processing; and,
wherein the conveyor passes above the processing chamber in atmospheric environment.

2. The system of claim 1 , wherein each of the carries is configured for supporting a linear array of l×n substrates, wherein n is an integer larger than 1, such that the vacuum processing chamber simultaneously houses and processes an array of m×n substrates, wherein m is the number of carriers housed within the vacuum processing chamber and wherein m is an integer larger than 1.

3. The system of claim 1 , wherein the buffer station is configured to simultaneously house at least the same number of carriers as are simultaneously housed in the processing chamber.

4. A system for processing substrates in vacuum chamber, comprising:
a plurality of carriers, each carrier configured for supporting and transporting substrates throughout the system;
a loading station for loading substrates onto the carriers;
a carrier transport system for transporting the carriers throughout the system and returning the carriers to the loading station;
a loadlock chamber arrangement for introducing carries into vacuum environment;
at least one vacuum processing chamber receiving a plurality of carriers from the loadlock arrangement, the vacuum processing chamber sized and configured for simultaneously housing the plurality of carriers and simultaneously processing substrates positioned on the plurality of carriers;
a buffer station positioned between the loading station and the loadlock arrangement, wherein the buffer station comprises carrier rotating arrangement for rotating the carriers from a horizontal orientation to a vertical orientation; and,
wherein the carrier transport system further comprises a plurality of magnetic wheels arrangement and each of the carriers comprises magnetic bars that ride on the magnetic wheels.

5. The system of claim 4 , wherein the plurality of magnetic wheels arrangement comprises a plurality of rotating shaft, each of the rotating shafts having a plurality of magnetic wheels attached thereto in alternating magnetic polarity.

6. A system for processing substrates in vacuum chamber, comprising:
a plurality of carriers, each carrier configured for supporting and transporting substrates throughout the system;
a loading station for loading substrates onto the carriers;
a carrier transport system for transporting the carriers throughout the system and returning the carriers to the loading station;
a loadlock chamber arrangement for introducing carries into vacuum environment;
at least one vacuum processing chamber receiving a plurality of carriers from the loadlock arrangement, the vacuum processing chamber sized and configured for simultaneously housing the plurality of carriers and simultaneously processing substrates positioned on the plurality of carriers;
wherein the carrier transport system comprises a plurality of magnetic wheels arrangement and each of the carriers comprises magnetic bars that ride on the magnetic wheels, the plurality of magnetic wheels arrangement comprises a plurality of rotating shaft, each of the rotating shafts having a plurality of magnetic wheels attached thereto in alternating magnetic polarity; and,

wherein each of the shafts it rotated by a flexible belt.

7. The system of claim 6 , wherein the flexible belt comprises an o-ring.

8. A system for processing substrates in vacuum chamber, comprising:
a plurality of carriers, each carrier configured for supporting and transporting substrates throughout the system;
a loading station for loading substrates onto the carriers;
a carrier transport system for transporting the carriers throughout the system and returning the carriers to the loading station;
a loadlock chamber arrangement for introducing carries into vacuum environment;
at least one vacuum processing chamber receiving a plurality of carriers from the loadlock arrangement, the vacuum processing chamber sized and configured for simultaneously housing the plurality of carriers and simultaneously processing substrates positioned on the plurality of carriers;
wherein the carrier transport system comprises a plurality of magnetic wheels arrangement and each of the carriers comprises magnetic bars that ride on the magnetic wheels,

wherein the vacuum processing chamber has an inlet opening and an outlet opening, and wherein some of the magnetic wheels are positioned within the inlet and outlet openings.

9. A system for processing substrates in vacuum chamber, comprising:
a plurality of carriers, each carrier configured for supporting and transporting substrates throughout the system;
a loading station for loading substrates onto the carriers;
a carrier transport system for transporting the carriers throughout the system and returning the carriers to the loading station;
a loadlock chamber arrangement for introducing carries into vacuum environment;
at least one vacuum processing chamber receiving a plurality of carriers from the loadlock arrangement, the vacuum processing chamber sized and configured for simultaneously housing the plurality of carriers and simultaneously processing substrates positioned on the plurality of carriers;
a buffer station positioned between the loading station and the loadlock arrangement, wherein the buffer station comprises carrier rotating arrangement for rotating the carriers from a horizontal orientation to a vertical orientation; and,
wherein the carrier transport system comprises a first carrier elevator coupled to the loading station and a second carrier elevator coupled to end of the system opposite the loading station.

10. A system for processing substrates in vacuum chamber, comprising:
a plurality of carriers, each carrier configured for supporting and transporting substrates throughout the system;
a loading station for loading substrates onto the carriers;
a carrier transport system for transporting the carriers throughout the system and returning the carriers to the loading station;
a loadlock chamber arrangement for introducing carries into vacuum environment;
at least one vacuum processing chamber receiving a plurality of carriers from the loadlock arrangement, the vacuum processing chamber sized and configured for simultaneously housing the plurality of carriers and simultaneously processing substrates positioned on the plurality of carriers;
a buffer station positioned between the loading station and the loadlock arrangement, wherein the buffer station comprises carrier rotating arrangement for rotating the carriers from a horizontal orientation to a vertical or

Assignees

• Intevac Inc

Inventors

• Bluck Terry
• Shah Vinay
• Riposan Alex

Classifications

• H10P72/7624

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H10P72/7612

  characterised by lifting arrangements, e.g. lift pins · CPC title

• H10P72/3412

  Batch transfer of wafers · CPC title

• H10P72/3411

  involving loading and unloading of wafers · CPC title

• H10P72/3408

  Docking arrangements · CPC title