Scanning ion beam deposition and etch
US-12176178-B2 · Dec 24, 2024 · US
US9502208B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9502208-B2 |
| Application number | US-201514747364-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 23, 2015 |
| Priority date | Jul 7, 2014 |
| Publication date | Nov 22, 2016 |
| Grant date | Nov 22, 2016 |
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A stage system includes a stage that holds an object, a linear motor mechanism that moves the stage by a thrust force generated by a current flowing through the coil, and a control section that controls the current flowing through the coil. The current flowing through the coil in a state where the stage is maintained in the static state be greater than a minimum current amount required for generating the thrust force greater than a maximum static friction force of the stage with respect to the guide rails.
Opening claim text (preview).
We claim: 1. A charged particle beam apparatus for obtaining an image by applying a charged particle beam to an object, the charged particle beam apparatus comprising: a stage that moves the object along guide rails; a linear motor mechanism that is made of a coil and a magnet, and moves the stage by a thrust force generated by a current flowing through the coil; a control section that controls the current flowing through the coil; and a brake that fixes the stage, wherein…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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