Adjusting fabrication of integrated computational elements

US9495505B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9495505-B2
Application numberUS-201314390971-A
CountryUS
Kind codeB2
Filing dateDec 24, 2013
Priority dateDec 24, 2013
Publication dateNov 15, 2016
Grant dateNov 15, 2016

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Techniques include receiving a design of an integrated computational element (ICE) including (1) specification of a substrate and multiple layers, their respective target thicknesses and refractive indices, adjacent layer refractive indices being different from each other, and a notional ICE fabricated based on the ICE design being related to a characteristic of a sample, and (2) indication of target ICE performance; forming one or more of the layers of an ICE based on the ICE design; in response to determining that an ICE performance would not meet the target performance if the ICE having the formed layers were completed based on the received ICE design, updating the ICE design to a new total number of layers and new target layer thicknesses, such that performance of the ICE completed based on the updated ICE design meets the target performance; and forming some of subsequent layers based on the updated ICE design.

First claim

Opening claim text (preview).

What is claimed is: 1. A method performed by a fabrication system, the method comprising: receiving a design of an integrated computational element (ICE), the ICE design comprising: specification of a substrate and a plurality of layers, their respective target thicknesses and complex refractive indices, wherein complex refractive indices of adjacent layers are different from each other, and wherein a notional ICE fabricated in accordance with the ICE design is related to a characteristic of a sample, and indication of maximum allowed performance degradation of the notional ICE's performance relative to a target performance caused by fabrication errors; forming one or more of the layers of an ICE in accordance with the ICE design; determining that a minimum performance degradation of the ICE would exceed the maximum allowed degradation if the ICE having the formed one or more layers were to be completed based on the received ICE design; updating, in response to said determining, the ICE design by changing a previously specified total number of layers to a new total number of layers and obtaining new target layer thicknesses and complex refractive indices of layers remaining to be formed from the new total number of layers, such that a performance degradation of the ICE to be completed based on the updated ICE design is at most equal to the maximum allowed performance degradation; and forming one or more subsequent layers remaining to be formed from the new total number of layers in accordance with the updated ICE design. 2. The method of claim 1 , wherein said changing the specification of the total number of layers to the new total number of layers comprises increasing the previously specified total number of layers by one or more additional layers, and complex refractive indices of adjacent ones of the additional layers are different from each other and from the complex refractive indices of adjacent one or more of the layers remaining to be formed from the previously specified total number of layers. 3. The method of claim 2 , wherein said increasing the total number of layers by one or more additional layers comprises indicating that the one or more additional layers be formed after originally specified total number of layers are formed. 4. The method of claim 2 , wherein said increasing the total number of layers by one or more additional layers comprises increasing the total number of layers by two or more additional layers. 5. The method of claim 4 , wherein originally specified complex refractive indices are first and second complex refractive indices, and at least one of the two or more additional layers has a third complex refractive index different from the first or second complex refractive indices. 6. The method of claim 2 , wherein if said increasing the number of previously specified total number of layers by either a first number of additional layers or a second number of additional layers, different from the first number, causes the performance degradation of the ICE to not exceed the maximum performance degradation, then the previously specified total number of layers is increased by the smaller of the first or second number of additional layers. 7. The method of claim 1 , said changing the specification of the total number of layers to the new total number of layers comprises decreasing the previously specified total number of layers by one or more subtracted layers. 8. The method of claim 7 , wherein the one or more subtracted layers comprise two adjacent layers having different complex refractive indices. 9. The method of claim 7 , wherein if said decreasing the number of previously specified total number of layers by either a first number of subtracted layers or a second number of subtracted layers, different from the first number, causes the performance degradation of the ICE to not exceed the maximum performance degradation, then the previously specified total number of layers is decreased by the larger of the first or second number of subtracted layers. 10. The method of claim 1 , wherein at least a predetermined fraction of the total number of layers is formed prior to performing said determining and said updating. 11. The method of claim 10 , wherein the predetermined fraction is 20-80%. 12. The method of claim 1 , wherein said determining and said updating are performed repeatedly by skipping a predetermined number of formed layers. 13. The method of claim 12 , wherein the predetermined number of formed layers is two. 14. The method of claim 1 , wherein said determining and said updating are performed repeatedly by skipping a random number of formed layers. 15. The method of claim 1 , wherein said determining and said updating are performed after forming each of the layers of the ICE. 16. The method of claim 1 , wherein said determining that the minimum performance degradation would exceed the maximum allowed degradation comprises determining one or more of complex refractive index and thickness associated with each of the one or more formed layers. 17. The method of claim 16 , wherein said determining the complex refractive index and thickness associated with each of the one or more formed layers comprises performing ellipsometry of the formed layers. 18. The method of claim 16 , wherein said determining the complex refractive index and thickness associated with each of the one or more formed layers comprises optical monitoring of the formed layers. 19. The method of claim 16 , wherein said determining the complex refractive index and thickness associated with each of the one or more formed layers comprises performing spectroscopy of the formed layers. 20. The method of claim 16 , wherein said determining the thickness associated with each of the one or more formed layers comprises performing physical monitoring of the formed layers. 21. The method of claim 16 , further comprising updating a deposition rate or time used to form the layers remaining to be formed based on the complex refractive indices and thicknesses of the formed layers. 22. The method of claim 16 , further comprising modifying complex refractive indices corresponding to the layers remaining to be formed based on the complex refractive indices and thicknesses of the formed layers. 23. The method of claim 1 , wherein a metric of degradation of the notional ICE's performance is a standard error of calibration (SEC). 24. A system comprising: a deposition chamber; one or more deposition sources associated with the deposition chamber to provide materials from which layers of one or more integrated computational elements (ICEs) are formed; one or more supports disposed inside the deposition chamber, at least partially, within a field of view of the one or more deposition sources to support the layers of the ICEs while the layers are formed; a measurement system associated with the deposition chamber to measure one or more characteristics of the layers while the layers are formed; and a computer system in communication with at least some of the one or more deposition sources, the one or more supports and the measurement system, wherein the computer system comprises one or more hardware processors and non-transitory computer-readable medium encoding instructions that, when executed by the one or more hardware processors, cause the system to form the layers of the ICEs by performing operations comprising: receiving an ICE design o

Assignees

Inventors

Classifications

  • Circuit design · CPC title

  • G06F30/39Primary

    Circuit design at the physical level (physical level design for reconfigurable circuits G06F30/347) · CPC title

  • Application to online plant, process monitoring · CPC title

  • Optical design, e.g. procedures, algorithms, optimisation routines · CPC title

  • Ellipsometry (optical thickness measurement G01B11/06) · CPC title

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What does patent US9495505B2 cover?
Techniques include receiving a design of an integrated computational element (ICE) including (1) specification of a substrate and multiple layers, their respective target thicknesses and refractive indices, adjacent layer refractive indices being different from each other, and a notional ICE fabricated based on the ICE design being related to a characteristic of a sample, and (2) indication of …
Who is the assignee on this patent?
Halliburton Energy Services Inc
What technology area does this patent fall under?
Primary CPC classification G06F30/39. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Nov 15 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).