Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devices

Patent metadata

Field	Value
Publication number	US-9494878-B2
Application number	US-201314435315-A
Country	US
Kind code	B2
Filing date	Sep 17, 2013
Priority date	Oct 15, 2012
Publication date	Nov 15, 2016
Grant date	Nov 15, 2016

Abstract

An EUV optical apparatus includes a number of adjustable mirrors ( 22 x ) on mirror bodies ( 120 ). Each mirror body is supported on an actuator ( 100 x ) comprising a moving part ( 132, 134, 136 ) and a fixed casing part ( 128, 130 ). The actuator provides a resilient support ( 140, 142 ) for the mirror body so that it is tiltable with two degrees relative to the casing. An electromagnetic motor ( 166, 170 - 178 ) applies first part, under the influence of an applied motive force, the resilient mounting being arranged to provide a biasing force that resists said motive force. A magnetic coupling ( 102, 104 a, 104 b ) is arranged between the moving and fixed parts so as to provide a counter-biasing force. The counter-biasing force partly opposes said biasing force and thereby reduces the motive force required to effect a given displacement. The actuator can thus be made with reduced size, weight and heat dissipation.

First claim

What is claimed is:

1. An optical apparatus comprising:
a series of optical components arranged to receive a radiation beam from a radiation source and configured to process and deliver the beam to a target location,
wherein said optical components include one or more movable optical components mounted on an actuator mechanism,
wherein the actuator mechanism comprises:
a first part and at least one second part, coupled to the first part, via a resilient support so as to be movable with at least one degree of freedom relative to the first part under the influence of an applied motive force, the resilient support being arranged to provide a biasing force increasing in response to relative displacement of the first and second parts and opposing said motive force, and
a magnetic coupling between said first and second parts, the magnetic coupling being arranged to provide a counter-biasing force, the counter-biasing force partly opposing said biasing force to reduce the motive force required to effect a given displacement.

2. The optical apparatus as claimed in claim 1 wherein said resilient support permits relative movement between the first and second parts with at least two degrees of freedom.

3. The mechanism optical apparatus as claimed in claim 1 wherein said actuation mechanism has a longitudinal axis, and wherein said resilient support permits tilting movement about first and second axes orthogonal to said longitudinal axis.

4. The optical apparatus as claimed in claim 1 wherein said magnetic coupling is provided by one or more permanent magnets mounted on each of said first and second parts.

5. The optical apparatus as claimed in claim 1 wherein said magnetic coupling is provided by one or more permanent magnets mounted on one of said parts only.

6. The optical apparatus as claimed in claim 1 wherein said magnetic coupling is adjustable to adjust a profile of said counter-biasing force against displacement.

7. The optical apparatus as claimed in claim 1 further comprising a motor arrangement for applying said motive force between said first and second parts.

8. The optical apparatus as claimed in claim 7 wherein said motor arrangement comprises one or more electromagnets mounted on one or both of said first and second parts.

9. The optical apparatus as claimed in claim 8 wherein said motor arrangement comprises a permanent magnet mounted to one of said parts and one or more electromagnets mounted to the other of said parts, said motor arrangement applying said motive force when said electromagnet or electromagnets is or are energized with electric current.

10. The optical apparatus as claimed in claim 1 wherein said movable optical components form part of an illumination system for conditioning said beam and delivering it to a target location on a patterning device, and wherein said movable component is movable to vary an incidence angle of the conditioned beam at the target location.

11. The optical apparatus as claimed in claim 10 wherein said movable optical components are provided as part of a fly's eye illuminator.

12. The optical apparatus as claimed in claim 11 wherein said optical components are reflective components and said illumination system is an EUV illumination system operable with radiation with a wavelength in the range 5 to 20 nm.

13. A lithographic apparatus, comprising:
an illumination system configured to condition a radiation beam;
a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
a substrate table constructed to hold a substrate;
a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and
an optical apparatus according to claim 1 configured to condition at least one of the radiation beam in the illumination system and the patterned radiation beam in the projection system.

14. A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate, wherein the lithographic projection apparatus includes an optical apparatus according to claim 1 to condition a radiation beam which is used to illuminate the patterning device.

15. A device manufacturing method comprising projecting a patterned beam of radiation onto a substrate, wherein the patterned beam is formed from a radiation beam which is conditioned by an optical apparatus according to claim 1 .

Assignees

• Asml Netherlands Bv

Inventors

• Buis Edwin Johan
• De Vries Gosse Charles
• Hol Sven Antoin Johan
• Rekkers Erik Maria

Classifications

• H02K16/00

  Machines with more than one rotor or stator {(machines for transmitting mechanical power from a driving shaft to a driven shaft and comprising structurally interrelated motor and generator parts H02K51/00; permanent magnet machines with multiple rotors or stators relatively rotated for vectorially combining the excitation fields or the armature voltages H02K21/029)} · CPC title

• G02B5/0891

  Ultraviolet [UV] mirrors (apparatus for microlithography exposure G03F7/70; X-ray multilayer structures G21K1/06) · CPC title

• H02K41/0352

  Unipolar motors · CPC title

• G02B19/0023

  at least one surface having optical power · CPC title

• H02K41/0356

  moving along a straight path · CPC title