Mechanical alignment of substrates to a mask

Patent metadata

Field	Value
Publication number	US-9490153-B2
Application number	US-201414323088-A
Country	US
Kind code	B2
Filing date	Jul 3, 2014
Priority date	Jul 26, 2013
Publication date	Nov 8, 2016
Grant date	Nov 8, 2016

Abstract

A plurality of masks is attached to the underside of a mask frame. This attachment is made such that each mask can independently move relative to the mask frame in three directions. This relative movement allows each mask to adjust its position to align with respective alignment pins disposed on a working surface. In one embodiment, each mask is attached to the mask frame using fasteners, where the fasteners have a shaft with a diameter smaller than the diameter of the mounting hole disposed on the mask. A bias element may be used to allow relative movement between the mask and the mask frame in the vertical direction. Each mask may also have kinematic features to mate with the respective alignment pins on the working surface.

First claim

What is claimed is:

1. A system for use during workpiece processing, comprising:
a mask frame, comprising:
an upper plate having apertures therein; and
two or more vertical sidewalls to support said mask frame on a working surface;

a plurality of masks, each of the masks comprising:
a central portion having a pattern; and
one or more protrusions extending from an edge of said central portion;

fasteners passing through mounting holes disposed in said one or more protrusions and connecting to an underside of said upper plate, such that each central portion of said plurality of masks are aligned with a respective aperture in said upper plate; and
biasing elements to create a separation force between said underside of said upper plate and each of said masks.

2. The system of claim 1 , wherein said mounting hole has a diameter, and each of said fasteners has a head and a shaft, where the head of each of said fasteners has a diameter greater than the diameter of the mounting hole and the shaft has a diameter smaller than the diameter of the mounting hole, allowing relative movement between the mask and the mask frame.

3. The system of claim 2 , wherein said biasing elements comprise springs disposed around said shafts and positioned between said underside of said upper plate and said masks.

4. The system of claim 1 , wherein each of said masks further comprises alignment holes disposed on one or more of said protrusions, adapted to mate with respective alignment pins disposed on said working surface.

5. The system of claim 4 , wherein said alignment holes and said mounting holes are disposed on the same protrusions.

6. The system of claim 4 , wherein said alignment holes and said mounting holes are disposed on different protrusions.

7. The system of claim 1 , further comprising a retention feature disposed on said vertical sidewalls to hold said mask frame on said working surface.

8. The system of claim 7 , wherein said retention feature comprises a magnetic material disposed in a distal end of said vertical sidewalls and an electrically switchable magnet disposed in said working surface.

9. The system of claim 1 , wherein said mask frame comprises supports disposed between said apertures, wherein said protrusions are disposed beneath said supports and said fasteners connect to said supports.

10. A system for use during workpiece processing, comprising:
a mask frame, comprising:
an upper plate having apertures therein; and
two or more vertical sidewalls extending from said upper plate to support said mask frame on a working surface;

a plurality of masks, each of the masks comprising:
a central portion having a pattern;
one or more protrusions extending from an edge of said central portion;
one or more mounting holes disposed in said one or more protrusions; and
one or more kinematic features disposed in said one or more protrusions, each kinematic feature adapted to engage with a respective alignment pin disposed on said working surface;

fasteners passing through said mounting holes and connecting to an underside of said upper plate, such that the central portion of each of said masks is aligned with a respective aperture in said upper plate, wherein each of said fasteners comprises a head having a diameter greater than a diameter of said mounting hole and a shaft having a diameter smaller than said diameter of said mounting hole, allowing each of said masks to move relative to said mask frame in two lateral directions.

11. The system of claim 10 , further comprising a plurality of biasing elements, each disposed on a respective shaft of said fasteners, located between an underside of said mask frame and one of said masks, to create a separation force between said upper plate and said mask and to allow relative movement between said mask and said mask frame in a vertical direction.

12. The system of claim 10 , wherein said kinematic features and said mounting holes are disposed on the same protrusions.

13. The system of claim 10 , wherein said kinematic features and said mounting holes are disposed on different protrusions.

14. The system of claim 10 , further comprising a retention feature disposed on said vertical sidewalls to hold said mask frame on said working surface.

15. The system of claim 14 , wherein said retention feature comprises a magnetic material disposed in a distal end of said vertical sidewalls and an electrically switchable magnet disposed in said working surface.

Assignees

• Varian Semiconductor Equipment Ass Inc

Inventors

• Webb Aaron P
• Carlson Charles T
• Honan Michael
• Amato Luigi G
• Grant Christopher Neil
• Strassner James D

Classifications

• H10P72/57 Primary

  Mask-wafer alignment · CPC title

• Y10T29/49895

  Associating parts by use of aligning means [e.g., use of a drift pin or a "fixture"] · CPC title

• C23C14/04

  Coating on selected surface areas, e.g. using masks · CPC title

• H01L21/682 Primary

  Electricity · mapped topic