Rapid fabrication of hierarchically structured supramolecular nanocomposite thin films in one minute

Patent metadata

Field	Value
Publication number	US-9488908-B2
Application number	US-201514725617-A
Country	US
Kind code	B2
Filing date	May 29, 2015
Priority date	May 29, 2014
Publication date	Nov 8, 2016
Grant date	Nov 8, 2016

Abstract

Functional nanocomposites containing nanoparticles of different chemical compositions may exhibit new properties to meet demands for advanced technology. It is imperative to simultaneously achieve hierarchical structural control and to develop rapid, scalable fabrication to minimize degradation of nanoparticle properties and for compatibility with nanomanufacturing. The assembly kinetics of supramolecular nanocomposite in thin films is governed by the energetic cost arising from defects, the chain mobility, and the activation energy for inter-domain diffusion. By optimizing only one parameter, the solvent fraction in the film, the assembly kinetics can be precisely tailored to produce hierarchically structured thin films of supramolecular nanocomposites in approximately one minute. Moreover, the strong wavelength dependent optical anisotropy in the nanocomposite highlights their potential applications for light manipulation and information transmission. The present invention opens a new avenue in designing manufacture-friendly continuous processing for the fabrication of functional nanocomposite thin films.

First claim

What is claimed is:

1. A method of forming a supramolecular nanocomposite thin film comprising:
mixing a block copolymer polystyrene-b-poly-4-vinylpyridine (PS-b-P4VP) with 3-pentadecylphenol (PDP) and nanoparticles in a solution;
spin-coating the mixed solution onto a substrate; and
solvent annealing the thin film by injecting chloroform (CHCl 3 ) solvent, wherein the amount of solvent infected is varied from approximately 0.01 to 5 mL to control a swelling rate of the thin film.

2. The method of claim 1 , wherein the chloroform (CHCl 3 ) is injected inside a Teflon chamber at room temperature.

3. The method of claim 1 , wherein a thickness of the thin film is monitored as a function of an annealing time.

4. The method of claim 1 ,
wherein a solvent fraction f s during solvent annealing is determined by monitoring a film thickness.

5. The method of claim 1 , wherein when the nanoparticles are gold (Au).

6. The method of claim 1 , wherein when the nanoparticles are a semiconductor, a magnetic material, a metal chalcogenide, or a metal oxide.

7. The method of claim 1 , wherein the nanoparticles are capped by 1-dodecanethiol.

8. A method of forming a supramolecular nanocomposite thin film comprising:
mixing a block copolymer polystyrene-b-poly-4-vinylpyridine (PS-b-P4VP) with 3-pentadecylphenol (PDP) and nanoparticles in a solution;
spin-coating the mixed solution onto a substrate; and
solvent annealing the thin film by injecting chloroform (CHCl 3 ) solvent, wherein a supramolecule comprises PS(19 kDa)-b-P4VP(5.6 kDa)(PDP) 1.7 .

9. The method of claim 8 , wherein the supramolecule, PS(19 kDa)-b-P4VP(5.6 kDa)(PDP) 1.7 is prepared by hydrogen-bonding 3-pentadecylphenol (PDP) to the 4VP units of a block copolymer (BCP) polystyrene-b-poly-4-vinylpyridine (PS-b-P4VP) at a PDP:4VP ratio of 1.7.

10. The method of claim 1 , wherein spin-coating comprises spinning speeds ranging from approximately 1000 to 3000 rpm.

11. A method of forming a supramolecular nanocomposite thin film comprising:
mixing a block copolymer polystyrene-b-poly-4-vinylpyridine (PS-b-P4VP) with 3-pentadecylphenol (PDP) and nanoparticles in a solution;
spin-coating the mixed solution onto a substrate; and
solvent annealing the thin film by injecting chloroform (CHCl 3 ) solvent, wherein a solvent fraction f s in the thin film during solvent annealing is in a range of approximately between 0.01 to 0.5.

Assignees

• Xu Ting
• Kao Joseph
• Univ California

Inventors

• Xu Ting
• Kao Joseph

Classifications

• C09D153/00

  Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers · CPC title

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title