Label removal solution for low temperature and low alkaline conditions

US9487735B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9487735-B2
Application numberUS-201414459732-A
CountryUS
Kind codeB2
Filing dateAug 14, 2014
Priority dateMay 14, 2012
Publication dateNov 8, 2016
Grant dateNov 8, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

According to the invention, the compositions and methods provide for the complete removal of synthetic glues or adhesives from a plurality of surfaces through the use of amide solvents in combination with surfactants, chelants, acidulants and/or additional bottle wash additives. Beneficially, the compositions and methods are suitable for use at lower temperatures, including below 35° C., and lower pH conditions, including from 5 to 10, from 6 to 9, and from 6 to 8, in comparison to conventional caustic-based adhesive removal compositions.

First claim

Opening claim text (preview).

What is claimed is: 1. A composition for removing adhesive material from a surface comprising: from about 0.1-10 wt-% of an aqueous or non-aqueous amide solvent; from about 1-5 wt-% of an additional aqueous or non-aqueous organic solvent; water; and less than about 25 wt-% sodium hydroxide; wherein the composition effectively removes an adhesive material from a surface at a composition pH between about 5 to 10 within a period of time less than about 10 minutes at temperatures less than about 50° C., and the additional aqueous or non-aqueous organic solvent is one or more solvents selected from the group consisting of C18-monoamine, ethoxylated alkylamine, alkoxylated ethylenediamine, imidazole, and ethoxylated alkyl cocoamine. 2. The composition of claim 1 wherein the amide solvent is a saturated amide having at least 8 carbon atoms or combinations thereof. 3. The composition of claim 2 wherein the amide solvent is a saturated amide having a R n E(O)xNR′ 2 functional group, wherein R and/or R′ is H or an organic group, n is at least 1, E is C, S, or P, and x is at least 1. 4. The composition of claim 1 wherein the composition is substantially-free of sodium hydroxide or other caustic containing components and has a pH between about 6 and 8, and wherein the composition provides a total solvent concentration between about 1 wt-% and 5 wt-%. 5. The composition of claim 1 wherein the composition further comprises a chelant, a surfactant, an acidulant and/or at least one bottle washing additive selected from the group consisting of a defoaming agent, wetting agent, rinse aid, catalyst, corrosion inhibitor, and combinations thereof. 6. The composition of claim 1 comprising from about 0.1 wt-% to about 10 wt-% organic solvent and amide solvent. 7. The composition of claim 1 wherein the composition further comprises a substrate layer of one or more layers of adhesive, laminate and/or other synthetic or natural adhesive residue. 8. The composition of claim 7 wherein one of more of said layers is a polyacrylic acid, aminocarboxylate and/or casein adhesive.

Assignees

Inventors

Classifications

  • Amides; Substituted amides · CPC title

  • C11D1/521Primary

    Carboxylic amides (R1-CO-NR2R3), where R1, R2 and R3 are alkyl or alkenyl groups · CPC title

  • C11D3/43Primary

    Solvents · CPC title

  • Hydroxides or bases · CPC title

  • Chemistry & Metallurgy · mapped topic

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Frequently asked questions

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What does patent US9487735B2 cover?
According to the invention, the compositions and methods provide for the complete removal of synthetic glues or adhesives from a plurality of surfaces through the use of amide solvents in combination with surfactants, chelants, acidulants and/or additional bottle wash additives. Beneficially, the compositions and methods are suitable for use at lower temperatures, including below 35° C., and lo…
Who is the assignee on this patent?
Ecolab Usa Inc
What technology area does this patent fall under?
Primary CPC classification C11D1/521. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Nov 08 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).