Semiconductor device including image sensor and method of forming the same
US-2024379711-A1 · Nov 14, 2024 · US
US9484386B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9484386-B2 |
| Application number | US-201314092592-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 27, 2013 |
| Priority date | Nov 27, 2013 |
| Publication date | Nov 1, 2016 |
| Grant date | Nov 1, 2016 |
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An integrated circuit includes a substrate, a plurality of photo detectors formed in the substrate, and a diffraction grating having multiple sections disposed over the plurality of photo detectors. Each section of the diffraction grating has a respective periodic width for a respective target wavelength. The diffraction grating has at least two different target wavelengths. The diffraction grating is interlaced with filters. The filters in each section of the diffraction grating are configured to pass a respective electromagnetic wave with the respective target wavelength.
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What is claimed is: 1. An integrated circuit, comprising: a substrate; a plurality of photo detectors formed in the substrate; a protection layer formed over the substrate; and a diffraction grating having multiple sections disposed over the plurality of photo detectors and physically contacting a first top surface of the protection layer, wherein a second top surface of the protection layer is farther from the substrate than a top surface of the diffraction grating, wherein each section of the diffraction grating has a respective periodic width for a respective target wavelength, the diffraction grating has at least two different target wavelengths, the diffraction grating is interlaced with filters, and the filters in each section of the diffraction grating are configured to pass a respective electromagnetic wave with the respective target wavelength. 2. The integrated circuit of claim 1 , wherein the plurality of photo detectors are located at a Talbot length away from the diffraction grating. 3. The integrated circuit of claim 2 , wherein the periodic width, the target wavelength, and the Talbot length are related as expressed in the equation Z T = 2 a 2 λ , or Z T = λ 1 - 1 - λ 2 a 2 , wherein α is the periodic width, λ is the target wavelength, and Z T is the Talbot length. 4. The integrated circuit of claim 1 , further comprising at least one dielectric layer between the plurality of photo detectors and the diffractive grating. 5. The integrated circuit of claim 4 , wherein the at least one dielectric layer comprises SiO 2 , SiN, or any combination thereof. 6. The integrated circuit of claim 1 , wherein the plurality of photo detectors and the diffraction grating have the same periodic widths. 7. The integrated circuit of claim 6 , wherein the plurality of photo detectors are aligned with the diffraction grating with a phase difference by 0 degrees, 90 degrees, 180 degrees, 270 degrees, or any combination thereof. 8. The integrated circuit of claim 1 , wherein the diffraction grating comprises Cu, AlCu, SiN, or SiO 2 . 9. The integrated circuit of claim 1 , wherein the filters comprise photoresist or polymer. 10. The integrated circuit of claim 1 , wherein the photo detectors are PN junction diodes. 11. An integrated circuit, comprising: a substrate; a plurality of divisions of the substrate, wherein each division includes: a plurality of photo detectors formed in the substrate; and a diffraction grating having multiple sections disposed over the plurality of photo detectors, wherein each section of the diffraction grating has a respective periodic width for a respective target wavelength, the diffraction grating has at least two different target wavelengths, the diffraction grating is interlaced with filters, the filters in each section of the diffraction grating are configured to pass a respective electromagnetic wave with the respective target wavelength, and all of the respective plurality of photo detectors in each division are aligned with the respective diffraction grating with a first phase difference, the first phase difference being a different phase difference from a second phase difference of another division. 12. The integrated circuit of claim 11 , wherein the diffraction grating comprises Cu, AlCu, SiN, or SiO 2 . 13. The integrated circuit of claim 11 , wherein the plurality of photo detectors and the diffraction grating have the same respective periodic widths. 14. The integrated circuit of claim 11 , wherein the plurality of photo detectors are aligned with the diffraction grating with a first phase difference of 0 degrees, 90 degrees, 180 degrees, or 270 degrees. 15. The integrated circuit of claim 11 , wherein the plurality of photo detectors are located at a Talbot length away from the diffraction grating. 16. The integrated circuit of claim 15 , wherein the periodic width, the target wavelength, and the Talbot length are related as expressed in the equation Z T = 2 a 2 λ , or Z T = λ 1 - 1 - λ 2 a 2 , wherein α is the periodic width, λ is the target wavelength, and Z T is the Talbot length. 17. An integrated circuit, comprising: a substrate; a first dielectric layer and a first metal layer formed on a first major surface of the substrate; a plurality of photo detectors formed in the substrate; and a diffraction grating formed over a second major surface of the substrate, opposite the first major surface of the substrate, and over the plurality of photo detectors, the diffraction grating including: a first section comprising metal lines spaced apart by a first pitch, with a first filter material configured to pass a first wavelength interjacent respective metal lines of the first section, wherein the metal lines of the first section have an exposed top surface; a second section comprising metal lines spaced apart by a second pitch, the second pitch being different than the first pitch, wit
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