Capacitive sensor sheet and production method thereof

Patent metadata

Field	Value
Publication number	US-9482693-B2
Application number	US-201213876098-A
Country	US
Kind code	B2
Filing date	Feb 3, 2012
Priority date	Feb 4, 2011
Publication date	Nov 1, 2016
Grant date	Nov 1, 2016

Abstract

A production method of a capacitive sensor sheet, comprising: a film forming step forming of a optically-transparent electroconductive film 11 on the surface of a substrate 2 having optical transparency; a supplemental electrode forming step of setting an electrode region 3 a which functions as the transparent electrode 3 at least in part of the film 11 , and laminating a supplemental electrode 4 a which has a lower electrical resistance than the electrical resistance of the film 11 to cover at least part of a periphery of the electrode region 3 a ; a wire forming step of laminating a wire 4 b in which one end thereof is connected to the supplemental electrode 4 a on the film 11 ; a resist laminating step of laminating a resist 12 to cover all of the electrode region 3 a and at least part of the supplemental electrode 4 a ; and a conductive film removing step of removing a part of the film 11 formed on the substrate 2 having optical transparency placed at a position not overlapping with the resist 12 , the supplemental electrode 4 a , or the wire 4 b.

First claim

The invention claimed is:

1. A production method of a capacitive sensor sheet, the production method comprising:
a film forming step of forming an optically-transparent electroconductive film on at least one surface of a substrate having optical transparency;
a supplemental electrode and a wire forming step of setting an electrode region which functions as a transparent electrode at least in part of the optically-transparent electroconductive film, by laminating a layer which is part of a supplemental electrode to cover at least part of a periphery of the electrode region, the supplemental electrode having a lower electrical resistance than the electrical resistance of the optically-transparent electroconductive film on top of the optically-transparent electroconductive film, and laminating the layer which is part of a wire in which one end thereof is connected to the supplemental electrode on the optically-transparent electroconductive film;
a resist laminating step of laminating a resist to cover all of the electrode region and at least part of the supplemental electrode; and
an electroconductive film removing step of removing, by plasma etching, a part of the optically-transparent electroconductive film formed on the substrate at a position of the electroconductive film not overlapped by the resist, the supplemental electrode and the layer,
wherein the optically-transparent electroconductive film overlapped by the layer has the same pattern as the layer after the plasma etching of the electroconductive film removing step.

2. The production method of a capacitive sensor sheet according to claim 1 , further comprising:
a resist removing step of removing the resist after the electroconductive film removing step.

3. The production method of a capacitive sensor sheet according to claim 1 , wherein the resist laminating step comprises laminating an optically-transparent resist as the resist.

4. The production method of a capacitive sensor sheet according to claim 3 , wherein the transparent electrode is thinner than either of the optically-transparent resist and the supplemental electrode.

5. The production method of a capacitive sensor sheet according to claim 1 , wherein the optically-transparent electroconductive film is made of a conductive polymer including at least one of polypyrrole, poly-N-methylpyrrole, poly-3-methylthiophene, poly-3-methoxythiophene, and poly-3,4-ethylenedioxythiophene.

6. The production method of a capacitive sensor sheet according to claim 1 , wherein the optically-transparent electroconductive film is formed to have a predetermined thickness of 0.05 μm to 5 μm in the film forming step.

7. The production method of a capacitive sensor sheet according to claim 1 , wherein the optically-transparent electroconductive film is formed to have a predetermined thickness of 0.1 μm to 1 μm in the film forming step.

8. The production method of a capacitive sensor sheet according to claim 1 , wherein the layer and the supplemental electrode are made from at least one of an ink, carbon, and graphite, the ink containing a metallic particle of at least one of silver, copper, and gold.

Assignees

• Nishizawa Koji
• Kobayashi Yusuke
• Komatsu Hiroto
• Shinetsu Polymer Co

Inventors

• Nishizawa Koji
• Kobayashi Yusuke
• Komatsu Hiroto

Classifications

• G06F2203/04103

  Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices · CPC title

• G06F3/044

  by capacitive means · CPC title

• G01R1/02 Primary

  General constructional details · CPC title

• G01R3/00

  Apparatus or processes specially adapted for the manufacture {or maintenance} of measuring instruments {, e.g. of probe tips} · CPC title

• G06F3/0445 Primary

  using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer · CPC title