Silylated polyarylenes

US9481810B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9481810-B2
Application numberUS-201414569811-A
CountryUS
Kind codeB2
Filing dateDec 15, 2014
Priority dateDec 15, 2014
Publication dateNov 1, 2016
Grant dateNov 1, 2016

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Polyarylenes comprising as polymerized units a first monomer having two cyclopentadienone moieties and a second monomer having two or more alkyne moieties, wherein at least one alkyne moiety is directly bonded to a silicon atom are provided. Such polyarylenes are useful as dielectric materials in the manufacture of electronic devices.

First claim

Opening claim text (preview).

What is claimed is: 1. An arylene oligomer comprising as polymerized units a first monomer having two cyclopentadienone moieties and a second monomer having two or more alkyne moieties, wherein at least one alkyne moiety is directly bonded to a silicon atom, and wherein the second monomer is chosen from formula (5) and formula (6) wherein a is an integer from 0 to 4; b is 2 or 3; c is 2 or 3; each R 6 is independently chosen from H, Si(R 8 ) 3 , C 1-10 alkyl, C 1-10 alkoxy, C 7-15 aralkyl, C 6-10 aryl, and substituted C 6-10 aryl; each R 7 is independently chosen from H, C 1-10 alkyl, C 1-10 alkoxy, C 7-15 aralkyl, C 6-10 aryl, and substituted C 6-10 aryl, each R 8 is independently chosen from H, halogen, hydroxyl, C 1-10 alkyl, C 1-10 alkoxy, C 7-15 aralkyl, C 7-15 aralkoxy, C 6-10 aryl, C 6-20 aryloxy, and substituted C 6-10 aryl; and Ar 3 is C 6-10 carbocyclic aryl; provided that at least one R 6 is Si(R 8 ) 3 . 2. The arylene oligomer of claim 1 wherein the first monomer has the formula wherein each R 1 is independently chosen from H, phenyl, or substituted phenyl; and Ar 1 is an aromatic moiety. 3. The arylene oligomer of claim 2 wherein each R 1 is phenyl. 4. The arylene oligomer of claim 1 wherein each R 8 is independently chosen from H, hydroxyl, C 1-6 alkyl, C 1-6 alkoxy, C 7-12 aralkyl, C 7-15 aralkoxy, C 6-10 aryl, C 6-15 aryloxy, and substituted C 6-10 aryl. 5. The arylene oligomer of claim 4 wherein each R 8 is independently chosen from H, hydroxyl, methyl, ethyl, propyl, butyl, methoxy, ethoxy, propoxy, butoxy, phenyl, benzyl, phenethyl, and phenoxy. 6. A composition comprising the arylene oligomer of claim 1 and an organic solvent. 7. The composition of claim 6 wherein the organic solvent is chosen from benzyl esters of C 2-6 alkanecarboxylic acids, dibenzyl esters of C 2-6 alkanedicarboxylic acids, tetrahydrofurfuryl esters of C 2-6 alkanecarboxylic acids, ditetrahydrofurfuryl esters of C 2-6 alkanedicarboxylic acids, phenethyl esters of C 2-6 alkanecarboxylic acids, diphenethyl esters of (C 2 -C 6 )alkanedicarboxylic acids, cycloalkanones and aromatic solvents. 8. The composition of claim 7 further comprising a water-miscible solvent. 9. A method of preparing the arylene oligomer of claim 1 comprising reacting a first monomer having two cyclopentadienone moieties with a second monomer having two or more alkyne moieties, wherein at least one alkyne moiety is directly bonded to a silicon atom. 10. An electronic device comprising a polymeric layer formed from the arylene oligomer of claim 1 . 11. A method of manufacturing an electronic device comprising: providing an electronic device substrate; disposing a layer of the composition of claim 6 on the electronic device substrate; curing the composition to form a cured polyarylene film on the electronic device substrate; and subjecting the cured polyarylene film to one or more of lithography, etching, metallization, drilling, ablation, and dielectric film stack build-up. 12. The arylene oligomer of claim 1 wherein the second monomer is chosen from 1,3-bis[(trimethylsilyl)ethynyl]benzene, 1,4-bis[(trimethylsily)ethynyl]benzene, 1,3,5-tris(trimethylsilylethynyl)benzene, 1,3-bis[(trimethoxysilyl)ethynyl]benzene, 1,4-bis[(trimethoxysily)ethynyl]benzene, 1,3-bis[(dimethylmethoxysilyl)ethynyl]benzene, 1,4-bis[(dimethylmethoxysily)ethynyl]benzene, 1,3-phenylenebis(ethyne-2,1-diyl))bis(dimethylsilanol), 1,4-phenylenebis(ethyne-2,1-diyl))bis(dimethylsilanol), bis(phenylethynyl)dimethylsilane, and bis(phenylethynyl)dimethoxysilane. 13. The arylene oligomer of claim 1 wherein Ar 3 is phenyl or naphthyl. 14. The arylene oligomer of claim 2 wherein Ar 1 is an aromatic moiety having the structure shown of formula (2) Ar 2 x Z—Ar 2 y   (2) wherein x is an integer chosen from 1, 2 or 3; y is an integer chosen from 0, 1or 2; each Ar 2 is independently chosen from each R 2 is independently chosen from halogen, C 1-6 alkyl, C 1-6 haloalkyl, C 1-6 alkoxy, C 1-6 haloalkoxy, phenyl, and phenoxy; b is an integer from 0 to 4; each of c and d is an integer from 0 to 3; each Z is independently chosen from O, S, SO, SO 2 , NR 3 , PR 3 , P(═O)R 3 , C(═O), CR 4 R 5 , and SiR 4 R 5 ; R 3 , R 4 , and R 5 are independently chosen from H, (C 1 -C 4 )alkyl, halo(C 1 -C 4 )alkyl, and phenyl.

Assignees

Inventors

Classifications

  • C08G61/10Primary

    only aromatic carbon atoms, e.g. polyphenylenes · CPC title

  • Polyphenylenes · CPC title

  • Functional group cleavage, e.g. removal of side-chains or protective groups · CPC title

  • C09D183/16Primary

    in which all the silicon atoms are connected by linkages other than oxygen atoms · CPC title

  • Further polymerisation of the obtained polymers, e.g. living polymerisation to obtain block-copolymers · CPC title

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What does patent US9481810B2 cover?
Polyarylenes comprising as polymerized units a first monomer having two cyclopentadienone moieties and a second monomer having two or more alkyne moieties, wherein at least one alkyne moiety is directly bonded to a silicon atom are provided. Such polyarylenes are useful as dielectric materials in the manufacture of electronic devices.
Who is the assignee on this patent?
Rohm & Haas Elect Mat, Rohm & Haas Elect Materials Korea Ltd
What technology area does this patent fall under?
Primary CPC classification C08G61/10. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Nov 01 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).