Method for producing gas barrier film

US9481010B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9481010-B2
Application numberUS-201314398580-A
CountryUS
Kind codeB2
Filing dateApr 30, 2013
Priority dateMay 10, 2012
Publication dateNov 1, 2016
Grant dateNov 1, 2016

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Abstract

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Provided is a method for producing a gas barrier film having a base and a gas barrier layer being arranged on the base, containing a step (1) for preparing a base having a moisture content of 0.01 to 1% by mass, a step (2) for obtaining a coating film by coating a coating liquid containing polysilazane onto the base, and a step (3) for forming a gas barrier layer by irradiating the coating film with vacuum ultraviolet rays.

First claim

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What is claimed is: 1. A method for producing a gas barrier film having a base and a gas barrier layer being arranged on the base, comprising: a step (1) for carrying out at least one process for controlling a moisture content of the base, wherein the process is selected from the group consisting of a process of drying the base, a process of immersing the base in water, and a process of keeping the base in an environment with a pre-determined humidity so that the moisture content of the base becomes 0.01 to 0.8% by mass, wherein the base is a resin film of polycarbonate (PC), polypropylene (PP), polyacrylamide (PA), polyethylene terephthalate (PET), polybutylene terephthalate (PBT), or polyethylene naphthalate (PEN); a step (2) for obtaining a coating film by coating a coating liquid containing polysilazane onto the base; and a step (3) for forming a gas barrier layer by irradiating the coating film with vacuum ultraviolet rays, wherein a film thickness of the gas barrier layer is 50 to 800 nm, and an accumulated light amount of the vacuum ultraviolet rays is 1000 to 10000 mJ/cm 2 . 2. The method according to claim 1 , wherein the base has a linear expansion coefficient of 50 ppm/° C. or less. 3. The method according to claim 1 , wherein the base has a linear expansion coefficient of 1 to 50 ppm/° C. 4. The method according to claim 1 , wherein the base has 10-point average surface roughness Rz of 1 to 1500 nm. 5. The method according to claim 1 , wherein the base has a moisture content of 0.01 to 0.5% by mass. 6. The method according to claim 1 , wherein the base has a moisture content of 0.01 to 0.3% by mass. 7. The method according to claim 1 , wherein the gas barrier film comprises an anchor coat layer between the base and the gas barrier layer. 8. The method according to claim 7 , wherein the anchor coat layer comprises at least one anchor coat agent selected from polyester resins, isocyanate resins, urethane resins, acrylic resins, ethylene vinyl alcohol resins, modified vinyl resins, epoxy resins, modified styrene resins, modified silicone resins, and alkyl titanate. 9. The method according to claim 1 , wherein the gas harrier film comprises a smooth layer between the base and the gas harrier layer. 10. The method according to claim 1 , wherein in the step (3) for forming the gas barrier layer, the irradiation of the coating film with the vacuum ultraviolet rays is performed in an atmosphere containing oxygen. 11. The method according to claim 1 , wherein in the step (3) for forming the gas barrier layer, the irradiation of the coating film with the vacuum ultraviolet rays is performed in an atmosphere having an oxygen concentration of 300 to 10000 ppm. 12. The method according to claim 1 , further comprising a step (4) for forming a protective layer on the gas barrier layer. 13. The method according to claim 12 , wherein the step (4) is a step for obtaining the protective layer by coating a coating liquid containing polysiloxane on the as barrier film obtained in the step (3). 14. The method according to claim 1 , wherein the gas barrier film has a plurality of the gas barrier layers. 15. The method according to claim 1 , wherein the moisture content of the base becomes 0.03 to 0.8% by mass in the step (1). 16. The method according to claim 1 , wherein the process in the step (1) is the process of immersing the base in water or the process of keeping the base in the environment with the pre-determined humidity.

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What does patent US9481010B2 cover?
Provided is a method for producing a gas barrier film having a base and a gas barrier layer being arranged on the base, containing a step (1) for preparing a base having a moisture content of 0.01 to 1% by mass, a step (2) for obtaining a coating film by coating a coating liquid containing polysilazane onto the base, and a step (3) for forming a gas barrier layer by irradiating the coating film…
Who is the assignee on this patent?
Konica Minolta Inc
What technology area does this patent fall under?
Primary CPC classification B05D3/002. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Nov 01 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).