Chemically amplified positive resist composition and resist pattern forming process
US-12164231-B2 · Dec 10, 2024 · US
Alicyclic ester compound, and (meth)acrylic copolymer and photosensitive resin composition containing same
US9477151B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9477151-B2 |
| Application number | US-201414786114-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 22, 2014 |
| Priority date | Apr 23, 2013 |
| Publication date | Oct 25, 2016 |
| Grant date | Oct 25, 2016 |
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Abstract
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The present invention provides, as a chemically amplified resist, a well-balanced resist or compound which results in improved sensitivity, resolution and line edge roughness (LER) without impairing the fundamental physical properties required as a resist (e.g., pattern shape, dry etching resistance, heat resistance). A mixture of cycloaliphatic ester compounds represented by general formulae (1) to (3), and a process for preparation thereof, as well as a (meth)acrylic copolymer comprising the cycloaliphatic ester compounds of general formulae (1) to (3) and a photosensitive resin composition thereof are provided.
First claim
Opening claim text (preview).
The invention claimed is: 1. A mixture, which comprises: a cycloaliphatic ester compound represented by general formula (1); a cycloaliphatic ester compound represented by general formula (2); and a cycloaliphatic ester compound represented by general formula (3): (wherein R 1 represents a hydrogen atom or a methyl group, and R 2 and R 3 , which may be the same o…
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Chemistry & Metallurgy · mapped topic
Physics · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
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Frequently asked questions
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- What does patent US9477151B2 cover?
- The present invention provides, as a chemically amplified resist, a well-balanced resist or compound which results in improved sensitivity, resolution and line edge roughness (LER) without impairing the fundamental physical properties required as a resist (e.g., pattern shape, dry etching resistance, heat resistance). A mixture of cycloaliphatic ester compounds represented by general formulae (…
- Who is the assignee on this patent?
- Mitsubishi Gas Chemical Co
- What technology area does this patent fall under?
- Primary CPC classification G03F7/039. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Oct 25 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).