Graphene base and method of preparing the same

US9475703B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9475703-B2
Application numberUS-201414288913-A
CountryUS
Kind codeB2
Filing dateMay 28, 2014
Priority dateAug 5, 2009
Publication dateOct 25, 2016
Grant dateOct 25, 2016

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A graphene base, including: graphene; and a substrate, wherein the graphene is formed directly on at least one surface of the substrate, and at least about 90 percent of an area of the surface of the substrate does not have a graphene wrinkle.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of preparing a graphene base, the method comprising: disposing a carbon-based material on at least one surface of a substrate; disposing a graphitization catalyst layer on the carbon-based material in a way such that the carbon-based material is disposed between the graphitization catalyst layer and the substance; and forming graphene by thermally treating the substrate, on which the carbon-based material and the graphitization catalyst layer are formed, under an inert atmosphere or a reducing atmosphere. 2. The method of claim 1 , wherein the carbon-based material is at least one selected from the group consisting of a carbon-containing polymer, a gaseous carbon-based material, amorphous carbon, and an organometallic compound. 3. The method of claim 1 , further comprising patterning the carbon-based material on the substrate. 4. The method of claim 1 , further comprising patterning the graphitization catalyst layer on the substrate. 5. The method of claim 1 , further comprising forming a ceramic layer on the graphitization catalyst layer; and patterning the ceramic layer. 6. The method of claim 5 , wherein the ceramic layer is an oxide layer. 7. The method of claim 1 , wherein the graphene has a patterned shape. 8. The method of claim 1 , wherein the carbon-based material has a patterned shape. 9. The method of claim 1 , wherein the graphitization catalyst layer has a patterned shape. 10. The method of claim 1 , wherein a length of at least one side of the graphene is equal to or greater than 1 millimeter. 11. The method of claim 1 , wherein the graphitization catalyst layer comprises at least one selected from the group consisting of nickel, cobalt, iron, platinum, gold, aluminum, chromium, copper, magnesium, manganese, molybdenum, rhodium, silicon, thallium, titanium, tungsten, uranium, vanadium, zirconium, ruthenium, and iridium. 12. The method of claim 1 , wherein a thickness of the graphitization catalyst layer is about nanometer to about 1 micrometer. 13. The method of claim 1 , further comprising removing the graphitization catalyst layer by acid-treatment after the forming of the graphene. 14. The method of claim 13 , further comprising forming a pattern on the graphitization catalyst layer by selectively removing a portion of the graphitization catalyst layer. 15. The method of claim 1 , wherein a pattern layer is disposed on one surface of the substrate before the disposing of the carbon-based material on the substrate. 16. The method of claim 15 , wherein the graphene has a shape which is the same as a shape of the pattern layer.

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Classifications

  • Intermediate layer is discontinuous or differential · CPC title

  • Of polyester [e.g., alkyd, etc.] · CPC title

  • Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] · CPC title

  • Of metal · CPC title

  • Graphite · CPC title

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What does patent US9475703B2 cover?
A graphene base, including: graphene; and a substrate, wherein the graphene is formed directly on at least one surface of the substrate, and at least about 90 percent of an area of the surface of the substrate does not have a graphene wrinkle.
Who is the assignee on this patent?
Samsung Electronics Co Ltd
What technology area does this patent fall under?
Primary CPC classification C01B31/0446. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 25 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).