Ion source assembly for static mass spectrometer

US9472389B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9472389-B2
Application numberUS-201314440767-A
CountryUS
Kind codeB2
Filing dateNov 15, 2013
Priority dateNov 16, 2012
Publication dateOct 18, 2016
Grant dateOct 18, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An ion source assembly for a static mass spectrometer, comprises: a mounting element for locating the assembly within the static mass spectrometer; an ion source for generating ions to be analyzed in the static mass spectrometer, the ion source being spaced from the mounting element and arranged to be held in use at a first relatively high potential V 1 with respect to the mounting element; and a spacer mounted between the mounting element and the ion source, the spacer arranged to be held in use at a second potential V 2 with respect to the mounting element, which is less than the first potential V 1 .

First claim

Opening claim text (preview).

The invention claimed is: 1. An ion source assembly for a static mass spectrometer, comprising: a mounting element held at ground potential for locating the assembly within the static mass spectrometer; an ion source for generating ions to be analyzed in the static mass spectrometer, the ion source being spaced from the mounting element and arranged to be held in use at a first relatively high potential V 1 with respect to the mounting element; and a spacer mounted between the mounting element and the ion source, the spacer arranged to be held in use at a second potential V 2 with respect to the mounting element, which is less than the first potential V 1 such that V2 lies between ground and V1. 2. The assembly of claim 1 , wherein the ion source is supported upon the spacer, the assembly further comprising one or more electrical feed throughs which pass through but are insulated from the spacer and the mounting element. 3. The assembly of claim 1 , wherein the spacer is formed of a conductive material. 4. The assembly of claim 3 , wherein the spacer is metallic. 5. The assembly of claim 1 , further comprising a spacer support structure that positions the spacer relative to the mounting element. 6. The assembly of claim 5 , wherein the mounting element comprises a flange and the spacer support structure is affixed to the flange. 7. The assembly of claim 5 , wherein the mounting element comprises a housing and the spacer comprises a flange affixed to the housing. 8. The assembly of claim 1 , further comprising: an ion source support structure that positions the ion source relative to the spacer. 9. The assembly of claim 8 , wherein the ion source support structure is affixed to the spacer. 10. The assembly of claim 1 , wherein the relatively high first potential V 1 is between 8 kV and 12 kV with respect to the mounting element. 11. The assembly of claim 1 , wherein the second potential V 2 is between 4 kV and 6 kV with respect to the mounting element. 12. The assembly of claim 1 , wherein the second potential V 2 is approximately half the first potential V 1 . 13. The assembly of claim 1 , further comprising an ion optical element arranged to be held in use at a potential suitable for acceleration of ions generated by the ion source and wherein the second potential V 2 is the same as the potential at which the ion optical element is arranged to be held. 14. The assembly of claim 1 , wherein the mounting element comprises a flange and the distance between the flange and spacer is less than half the distance between the flange and the ion source. 15. The assembly of claim 1 , wherein the distance between the mounting element and the spacer is no more than 1 mm per kilovolt of the second potential V 2 . 16. The assembly of claim 1 , wherein the distance between the spacer and the ion source is no less than 1mm per kilovolt of the difference between the first potential V 1 and the second potential V 2 . 17. A static mass spectrometer comprising: an evacuable housing; an ion source assembly in accordance with claim 1 , mounted upon the housing so that the ion source is located therewithin; and a mass analyzer for detecting and analyzing ions generated by the ion source. 18. The static mass spectrometer of claim 17 , wherein the mass analyzer is mounted upon the housing so that the mass analyzer is located therewithin. 19. An ion source assembly for a static mass spectrometer, comprising: a mounting element for locating the assembly within the static mass spectrometer; an ion source for generating ions to be analyzed in the static mass spectrometer, the ion source being spaced from the mounting element and arranged to be held in use at a first relatively high potential V1 with respect to the mounting element; a spacer mounted between the mounting element and the ion source, the spacer arranged to be held in use at a second potential V2 with respect to the mounting element, which is less than the first potential V1; and one or more electrical feed throughs which pass through but are insulated from the spacer and the mounting element. 20. An ion source assembly for a static mass spectrometer, comprising: a mounting element for locating the assembly within the static mass spectrometer; an ion source for generating ions to be analyzed in the static mass spectrometer, the ion source being spaced from the mounting element and arranged to be held in use at a first relatively high potential V1 with respect to the mounting element; and a spacer mounted between the mounting element and the ion source, the spacer arranged to be held in use at a second potential V2 with respect to the mounting element, which is less than the first potential V1, wherein the ion source is supported upon the spacer.

Assignees

Inventors

Classifications

  • H01J49/10Primary

    Ion sources; Ion guns · CPC title

  • Static spectrometers · CPC title

  • field ionisation, e.g. corona discharge (atmospheric pressure corona discharge per se H01T19/00) · CPC title

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What does patent US9472389B2 cover?
An ion source assembly for a static mass spectrometer, comprises: a mounting element for locating the assembly within the static mass spectrometer; an ion source for generating ions to be analyzed in the static mass spectrometer, the ion source being spaced from the mounting element and arranged to be held in use at a first relatively high potential V 1 with respect to the mounting element; an…
Who is the assignee on this patent?
Thermo Fisher Scient (Bremen) Gmbh
What technology area does this patent fall under?
Primary CPC classification H01J49/10. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 18 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).