Coil structure for generating plasma and semiconductor equipment
US-2024339296-A1 · Oct 10, 2024 · US
US9468083B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9468083-B2 |
| Application number | US-201213663871-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 30, 2012 |
| Priority date | Oct 30, 2012 |
| Publication date | Oct 11, 2016 |
| Grant date | Oct 11, 2016 |
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A plasma generation device assembly includes a base includes an interior portion and a top surface defining a plurality of apertures that extend through the top surface. The plasma generation device assembly also includes a plasma generation device and a plurality of coupling members. The plasma generation device is positioned on the top surface and is configured to emit ablative plasma when the plasma generation device is activated. The plurality of coupling members extends through the plurality of apertures and is configured to couple the plasma generation device to the top surface.
Opening claim text (preview).
What is claimed is: 1. A plasma generation device assembly for use in an arc mitigation device having a containment chamber, said plasma generation device assembly comprising: a base comprising an interior portion and a top surface defining a plurality of apertures that extend through said top surface; a plasma generation device configured to emit ablative plasma when said plasma generation device is activated, said plasma generation device comprising a plurality of arms formed from an ablative material; and a plurality of coupling members extending through the plurality of apertures and configured to couple said plasma generation device to said top surface. 2. A plasma generation device assembly in accordance with claim 1 , wherein said plurality of coupling members are configured to seal the apertures such that gases proximate said plasma generation device are prevented from flowing through the apertures into said interior portion. 3. A plasma generation device assembly in accordance with claim 1 , wherein said base comprises a cap and a pedestal, said cap is sealingly coupled to said pedestal such that gases proximate said plasma generation device are prevented from flowing into said pedestal when said cap is coupled to said pedestal. 4. A plasma generation device assembly in accordance with claim 3 , further comprising a plurality of plasma generation device conductors coupled to said plasma generation device by said coupling members. 5. A plasma generation device assembly in accordance with claim 4 , wherein said plurality of plasma generation device conductors extends through said pedestal. 6. A plasma generation device assembly in accordance with claim 1 , wherein at least one slot is formed within said plasma generation device to enable said plasma generation device to discharge ablative plasma through the at least one slot. 7. A plasma generation device assembly in accordance with claim 3 , wherein said plasma generation device is configured to be raised and lowered with respect to said base and configured to be replaced without removing said cap. 8. A plasma generation device assembly in accordance with claim 7 , wherein said plurality of coupling members are formed to enable said plasma generation device to be raised and lowered with respect to said base. 9. An arc mitigation device for use in discharging energy from an electrical event, said arc mitigation device comprising: a containment chamber; a plurality of electrodes positioned within said containment chamber; and a plasma generation device assembly positioned within said containment chamber, said plasma generation device assembly comprising: a base comprising an interior portion and a top surface defining a plurality of apertures that extend through said top surface; a plasma generation device configured to emit ablative plasma such that an electrical arc is enabled to be formed between at least two of said plurality of electrodes to divert energy from the electrical event, wherein at least one slot is formed within said plasma generation device to enable said plasma generation device to discharge ablative plasma through the at least one slot; and a plurality of coupling members extending through the plurality of apertures and configured to couple said plasma generation device to said top surface. 10. An arc mitigation device in accordance with claim 9 , wherein said plurality of coupling members are configured to seal the apertures such that gases proximate said plasma generation device are prevented from flowing through the apertures into said interior portion. 11. An arc mitigation device in accordance with claim 9 , wherein said plasma generation device comprises a plurality of arms formed from an ablative material. 12. An arc mitigation device in accordance with claim 9 , wherein said base comprises a cap and a pedestal, said cap is sealingly coupled to said pedestal such that gases proximate said plasma generation device are prevented from flowing into said pedestal when said cap is coupled to said pedestal. 13. An arc mitigation device in accordance with claim 12 , further comprising a plurality of plasma generation device conductors coupled to said plasma generation device by said coupling members. 14. An arc mitigation device in accordance with claim 13 , wherein said plurality of plasma generation device conductors extends through said pedestal. 15. An arc mitigation device in accordance with claim 9 , wherein said plasma generation device is configured to be raised and lowered with respect to said base. 16. An arc mitigation device in accordance with claim 15 , wherein said plurality of coupling members are threaded to enable said plasma generation device to be raised and lowered with respect to said cap. 17. A method of assembling a plasma generation device assembly for use in an arc mitigation device having a containment chamber, said method comprising: positioning a plasma generation device on a top surface of a base including an interior portion, a pedestal, and a cap, wherein the top surface is defined by the cap, and the top surface defines a plurality of apertures extending through the top surface, wherein the plasma generation device includes a plurality of terminals and is configured to emit ablative plasma when the plasma generation device is activated; sealingly coupling the plasma generation device to the top surface of the cap using a plurality of coupling members such that the plurality of coupling members extends through the plurality of apertures; coupling a plurality of plasma generation device conductors to the plurality of terminals; and sealingly coupling the cap to the pedestal such that gases proximate the plasma generation device are prevented from entering the pedestal. 18. A method in accordance with claim 17 , further comprising coupling the plurality of plasma generation device conductors to a trigger circuit to enable the plasma generation device to be activated by the trigger circuit, wherein the plasma generation device is configured to discharge ablative plasma when the plasma generation device is activated.
Conductor or circuit manufacturing · CPC title
using exploding wires or spark gaps (H05H1/26 takes precedence) · CPC title
using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/26 takes precedence) · CPC title
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