Catoptric objectives and systems using catoptric objectives

Patent metadata

Field	Value
Publication number	US-9465300-B2
Application number	US-201213438428-A
Country	US
Kind code	B2
Filing date	Apr 3, 2012
Priority date	Sep 13, 2005
Publication date	Oct 11, 2016
Grant date	Oct 11, 2016

Abstract

In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength λ from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about λ or more at one or more locations of the rotationally-asymmetric surface.

First claim

What is claimed is:

1. A system, comprising:
a plurality of reflective elements arranged to image radiation from an object field in an object plane to an image field in an image plane,
wherein:
the image plane is non-parallel to the object plane;
the image field has a first dimension and a second dimension perpendicular to the first dimension;
the first dimension of the image field is about one millimeter or more;
the second dimension of the image field is about one millimeter or more;
a path of the radiation through the system is characterized by chief rays that are parallel to each other to within 0.05° at the object plane; and
each reflective element in the system which is configured to direct the radiation from the object field to the image field has a curved reflective surface.

2. The system of claim 1 , wherein the optical system has a rectangular field at the image plane.

3. The system of claim 1 , wherein the system has an image-side numerical aperture of about 0.2 or more.

4. The system of claim 1 , wherein the system is a catoptric system.

5. The system of claim 4 , wherein the system has an image-side numerical aperture of about 0.2 or more.

6. The system of claim 1 , wherein:
the system has an exit pupil and
none of the plurality of reflective elements is configured to cause an obscuration of the exit pupil.

7. The system of claim 1 , wherein the plurality of reflective elements includes no more than two reflective elements that have a positive chief ray angle magnification.

8. The system of claim 1 , wherein the plurality of reflective elements define a meridional plane and the reflective elements are symmetric with respect to the meridional plane.

9. The system of claim 1 , wherein the chief rays intersect the object plane at an angle non-parallel to the object plane normal.

10. The system of claim 1 , wherein the chief rays diverge from each other at the object plane.

11. The system of claim 1 , wherein, for a meridional section of the system, the chief rays have a maximum angle of incidence on a surface of each of the reflective elements of less than 20°.

12. The system of claim 1 , wherein the object plane is positioned between the plurality of reflective elements and an entrance pupil of the system.

13. The system of claim 1 , wherein the plurality of reflective elements is telecentric at the image plane.

14. The system of claim 1 , wherein the system is configured to reflect the imaged radiation from an object positioned at the object plane.

15. The system of claim 1 , wherein for a meridional section of the system, a chief ray of a central field point has a maximum angle of incidence on a surface of each of the reflective elements of θ degrees, the system has an image side numeral aperture, NA, of more than 0.3, and the ratio θ/NA is less than 68.

16. The system of claim 1 , wherein the system has a demagnification of 4×.

17. The system of claim 1 , wherein the plurality of reflective elements comprises a first mirror and a second mirror, the first and second mirrors having a minimum distance from the object plane of d 1 and d 2 , respectively, where d 1 /d 2 is about two or more.

18. The system of claim 1 , wherein the plurality of reflective elements includes a first reflective element in the path of the radiation from the object plane to the image plane, where the first reflective element has positive optical power.

19. The system of claim 1 , wherein the system is a microlithography system.

20. The system of claim 1 , wherein the system is a microlithography projection optical system.

21. A system, comprising:
a first subsystem configured to illuminate an object field in an object plane; and
a second subsystem, the second subsystem comprising a plurality of reflective elements arranged to image radiation from the object field to an image field in an image plane,
wherein:
the image plane is non-parallel to the object plane;
the image field has a first dimension and a second dimension perpendicular to the first dimension;
the first dimension of the image field is about one millimeter or more;
the second dimension of the image field is about one millimeter or more;
a path of the radiation through the system is characterized by chief rays that are parallel to each other to within 0.05° at the object plane; and
each reflective element in the second subsystem which is configured to direct the radiation from the object field to the image field has a curved reflective surface.

22. The system of claim 21 , further comprising a radiation source configured to provide the radiation at λ to the object plane.

23. The system of claim 22 , wherein λ is about 20 nm or less.

24. The system of claim 21 , wherein the system is a microlithography system.

25. The system of claim 21 , wherein the system is a microlithography projection optical system.

26. A method of operating a system which comprises a first subsystem and a second subsystem, the method comprising:
using the first subsystem to illuminate an object field in an object plane; and
using the second subsystem to image radiation from the object plane into an image plane in an image field,
wherein:
the image plane is non-parallel to the object plane;
the image field has a first dimension and a second dimension perpendicular to the first dimension;
the first dimension of the image field is about one millimeter or more;
the second dimension of the image field is about one millimeter or more;
a path of the radiation through the system is characterized by chief rays that are parallel to each other to within 0.05° at the object plane; and
each reflective element in the second subsystem directs the radiation from the object field to the image field has a curved reflective surface.

27. The system of claim 26 , wherein the system is a microlithography system.

28. The system of claim 26 , wherein the system is a microlithography projection optical system.

29. A system, comprising:
a plurality of reflective elements arranged to image radiation from an object plane to an image plane,
wherein:
the image plane is non-parallel to the object plane;
the plurality of reflective elements comprises four or more reflective elements;
a path of the radiation through the system is characterized by chief rays that are parallel to each other to within 0.05° at the object plane; and
each reflective element in the system which is configured to direct the radiation from the object field to the image field has a curved reflective surface.

30. The system of claim 29 , wherein the system is a microlithography system.

31. The system of claim 29 , wherein the system is a microlithography projection optical system.

32. A system, comprising:
a plurality of reflective elements arranged to image radiation from an object plane to an image plane,
wherein:
the image plane is non-parallel to the object plane;
the system has an exit pupil;
none of the plurality of reflective elements is configured to cause an obscuration of the exit pupil at the image plane;
a path of the radiation through the system is characterized by chief rays that are parallel to each other to within 0.05° at the object plane; and
each reflective element in the system which is configured to direct the radiation from the

Assignees

• Mann Hans-Juergen
• Ulrich Wilhelm
• Pretorius Marco
• Zeiss Carl Smt Gmbh

Inventors

• Mann Hans-Juergen
• Ulrich Wilhelm
• Pretorius Marco

Classifications

• G03F7/70308

  Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift · CPC title

• G02B17/0663

  off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements · CPC title

• G02B17/0621

  off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements · CPC title

• G02B17/08

  Catadioptric systems {(used in non-imaging applications G02B19/00)} · CPC title

• G02B13/0065

  having a beam-folding prism or mirror · CPC title