High performance tools exhibiting reduced crater wear in particular by dry machining operations

Patent metadata

Field	Value
Publication number	US-9464347-B2
Application number	US-201314394483-A
Country	US
Kind code	B2
Filing date	Apr 15, 2013
Priority date	Apr 16, 2012
Publication date	Oct 11, 2016
Grant date	Oct 11, 2016

Abstract

The present invention relates to a coating system comprising at least one multi-layered film formed of alternated A- and B-nanolayers deposited one on each other characterized in that the A-nanolayers contain essentially aluminum chromium boron nitride and the B-nanolayers contain essentially aluminum chromium nitride.

First claim

What is claimed is:

1. Coating system deposited on a surface of a substrate comprising at least one multi-layered film formed of alternated A- and B-nanolayers deposited one on each other, wherein the A-nanolayers consist of aluminium chromium boron nitride and the B-nanolayers contain aluminium chromium nitride but not contain boron
characterized in that the A-nanolayers have a region with highest boron content and a region with lower boron content, wherein the region having lower boron content is the region which is adjacent to the B-nanolayers.

2. Coating system according to claim 1 characterized in that the coating system exhibits a thermal conductivity coefficient lower than 3.0 W/m·K.

3. Coating system according to claim 1 characterized in that the sum of the thickness of an A-nanolayer and the thickness of a B-nanolayer deposited one on each other in the multi-layered film is not greater than 200 nm.

4. Coating system according to claim 1 characterized in that the ratio of the thickness of a B-nanolayer to the thickness of an A-nanolayer deposited one on each other in the multi-layered film is not greater than 2.

5. Coating system according to claim 4 , wherein the ratio of the thickness of a B-nanolayer to the thickness of an A-nanolayer deposited one on each other in the multi-layered film is about 1.

6. Coating system according to claim 1 characterized in that the coating system comprises a base layer deposited between the substrate surface and the multi-layered film, preferably the element composition of the base layer is essentially defined by the formula (Al w Cr 1-w )N wherein:
w is the concentration of Al in atomic percent if only the elements Al and Cr are considered for the calculation, with
w=50-80 at %.

7. Coating system according to claim 6 characterized in that the coating system comprises a multilayer-structured film deposited on the base layer, wherein the multilayer-structured film is formed by C- and D-layers deposited alternate one on each other, wherein the C-layers are AlCrN-layers don't containing boron, and the D-layers are multi-layered films formed of alternated A- and B-nanolayers.

8. Coating system according to claim 1 characterized by having a constant ratio of aluminium content to chromium content at least along the thickness of the multi-layered film or at least if given along the thickness of the base layer.

9. Coated substrate with a coating system according to claim 1 characterized in that the substrate comprises a nitrogen-enriched diffusion zone at the interface with the coating system.

10. Coating system deposited on a surface of a substrate comprising at least one multi-layered film formed of alternated A- and B-nanolayers deposited one on each other, wherein the A-nanolayers consist of aluminium chromium boron nitride and the B-nanolayers contain aluminium chromium nitride but not contain boron characterized in that
the element composition of the A-nanolayers or if given in the region of the A-nanolayers having highest boron content is essentially defined by the formula (Al x Cr 1-x-z B z )N wherein:
x and z are respectively the concentration of Al and the concentration of B in atomic percent if only the elements Al, Cr and B are considered for the calculation, with
x=50-80 at-% and z=3-30 at-% and x+z≦90 at-%, and/or

the element composition of the B-nanolayers is essentially defined by the formula (Al y Cr 1-y )N wherein:
y is the concentration of Al in atomic percent if only the elements Al and Cr are considered for the calculation, with
y=50-80 at-%.

11. Coating system according to claim 10 wherein x=50-70 at-% and z=10-20 at-% and x+z≦80 at-% and y=60-70 at-%.

12. Coating system deposited on a surface of a substrate comprising at least one multi-layered film formed of alternated A- and B-nanolayers deposited one on each other, wherein the A-nanolayers consist of aluminium chromium boron nitride and the B-nanolayers contain aluminium chromium nitride but not contain boron, wherein the coating system comprises a base layer deposited between the substrate surface and the multi-layered film characterized in that the coating system comprises a multilayer-structured film deposited on the base layer, wherein the multilayer-structured film is formed by C- and D-layers deposited alternate one on each other, wherein the C-layers are AlCrN-layers don't containing boron, and the D-layers are multi-layered films formed of alternated A- and B-nanolayers.

13. Method for coating a surface of a substrate with a coating system according to claim 1 characterized in that at least the multi-layered film is deposited by means of physical vapour deposition techniques of at least one target containing aluminium chromium and boron for forming the A-nanolayers and at least one target containing aluminium and chromium for producing the B-nanolayers in a nitrogen containing atmosphere, and at least by depositing the B-containing layers a negative bias voltage at the substrate is applied.

14. Method according to claim 13 characterized in that the target for forming the A-nanolayers has an element composition in atomic percentage given by the formula (Al i Cr 1-i ) 1-j B j and the at least one target for forming the B-nanolayers has an element composition in atomic percentage given by the formula (Al i Cr 1-i ), where:
i is preferably not lower than 50 at.-% and not greater than 80 at.-%,
j is preferably not lower than 2 at.-% and not greater than 30 at.-%.

15. Method according to claim 14 , wherein i is 70 at.-%.

16. Method according to claim 13 for coating a surface of a substrate with a coating system comprising at least one multi-layered film formed of alternated A- and B-nanolayers deposited one on each other, wherein the A-nanolayers consist of aluminium chromium boron nitride and the B-nanolayers contain aluminium chromium nitride but not contain boron, wherein the A-nanolayers have a region with highest boron content and a region with lower boron content, wherein the region having lower boron content is the region which is adjacent to the B-nanolayers, and wherein a base layer deposited between the substrate surface and the multi-layered film
characterized in that the base layer is deposited by means of a physical vapour deposition technique.

17. Method according to claim 16 , wherein an element composition of the base layer is essentially defined by the formula (Al w Cr 1-w )N wherein:
w is the concentration of Al in atomic percent if only the elements Al and Cr are considered for the calculation, with w=50-80 at-%.

18. Method according to claim 16 , wherein the physical vapour deposition technique comprises a reactive cathodic arc ion plating techniques and applying a negative bias voltage at the substrate during at least a part of the deposition time.

19. Method according to claim 16 characterized in that a negative bias voltage applied during the deposition of the base layer is varied during deposition and increased from a lowest value U Bias _ lowest up to a highest value U Bias _ highest .

20. Method according to claim 19 wherein the lowest value U Bias _ lowest is not greater than 4 times the highest U Bias _ highest in absolute value.

21. Method according to claim 13 for producing a coated substrate comprising at least one multi-layered film formed of alternated A- and B-nanolayers deposited one on each other, wherein the A-nanolayers consist of aluminium chromium boron nitride and the B-nanolayers contain aluminium chromiu

Assignees

• Oerlikon Trading Ag
• Oerlikon Surface Solutions Ag Pfaffikon

Inventors

• Arnd Mirjam
• Lechthaler Markus
• Stein Sebastian
• Eriksson Anders Olof

Classifications

• Y10T428/2495

  Thickness [relative or absolute] · CPC title

• Y10T428/265

  1 mil or less · CPC title

• C23C14/0647

  Boron nitride · CPC title

• C23C14/3492

  Variation of parameters during sputtering · CPC title

• C23C14/35

  by application of a magnetic field, e.g. magnetron sputtering {(C23C14/3457 takes precedence)} · CPC title