Laser annealing apparatus and a method for manufacturing a display apparatus using the laser annealing apparatus

Patent metadata

Field	Value
Publication number	US-9460922-B1
Application number	US-201514937068-A
Country	US
Kind code	B1
Filing date	Nov 10, 2015
Priority date	May 26, 2015
Publication date	Oct 4, 2016
Grant date	Oct 4, 2016

Abstract

A method of manufacturing a display apparatus includes forming an amorphous silicon layer on a substrate, splitting a first laser beam emitted from a first laser source into a first master beam in a first polarization state and a second master beam in a second polarization state, changing the first polarization state of the first master beam to the second polarization state to output a third master beam having the second polarization state and corresponding to the first master beam having the second polarization state, combining the second master beam with the third master beam to output a merged laser beam, and irradiating the amorphous silicon layer with the merged laser beam to form a polysilicon layer.

First claim

What is claimed is:

1. A method of manufacturing a display apparatus, the method comprising:
forming an amorphous silicon layer on a substrate;
splitting a first laser beam emitted from a first laser source into a first master beam in a first polarization state and a second master beam in a second polarization state;
changing the first polarization state of the first master beam to the second polarization state to output a third master beam having the second polarization state and corresponding to the first master beam having the second polarization state;
combining the second master beam with the third master beam to output a merged laser beam, wherein the second master beam and the third master beam have a same polarization state as each other; and
irradiating the amorphous silicon layer with the merged laser beam to form a polysilicon layer.

2. The method of claim 1 , wherein the splitting of the first laser beam is performed using a polarization beam splitter.

3. The method of claim 1 , wherein the changing of the first polarization state of the first master beam to the second polarization state is performed using a half-wave plate.

4. The method of claim 1 , further comprising:
splitting a second laser beam emitted from a second laser source into a first slave beam in the first polarization state and a second slave beam in the second polarization state; and
changing the first polarization state of the first slave beam to the second polarization state to output a third slave beam having the second polarization state and corresponding to the first slave beam having the second polarization state,
wherein the combining of the second master beam with the third master beam comprises combining the second master beam with the third master beam, the second slave beam, and the third slave beam.

5. The method of claim 4 , wherein, the splitting of the second laser beam is performed using a polarization beam splitter.

6. The method of claim 4 , wherein the changing of the first polarization state of the first slave beam to the second polarization is performed using a half-wave plate.

7. A method of manufacturing a display apparatus, the method comprising:
forming an amorphous silicon layer on a substrate;
splitting a first laser beam emitted from a first laser source into a first master beam in a first polarization state and a second master beam in a second polarization state;
changing the first polarization state of the first master beam to a third polarization state to output a third master beam having the third polarization state and corresponding to the first master beam having the third polarization state;
changing the second polarization state of the second master beam to the third polarization state to output a fourth master beam having the third polarization state and corresponding to the second master beam having the third polarization state; and
combining the third master beam with the fourth master beam, wherein the third master beam and the fourth master beam have a same polarization state as each other.

8. The method of claim 7 , wherein the splitting of the first laser beam is performed using a polarization beam splitter.

9. The method of claim 7 , wherein the changing of the first polarization state of the first master beam to the third polarization state is performed using a first polarization controller comprising a half-wave plate, and
wherein the changing of the second polarization state of the second master beam to the third polarization state is performed using a second polarization controller comprising a half-wave plate, and
wherein a fast axis of the first polarization controller and a fast axis of the second polarization controller form an angle of 45 degrees.

10. The method of claim 7 , further comprising:
splitting a second laser beam emitted from a second laser source into a first slave beam in the first polarization state and a second slave beam in the second polarization state;
changing the first polarization state of the first slave beam to the third polarization state to output a third slave beam corresponding to the first slave beam having the third polarization state; and
changing the second polarization state of the second slave beam to the third polarization state to output a fourth slave beam having the third polarization state and corresponding to the second slave beam having the third polarization state,
wherein the combining of the third master beam with the fourth master beam comprises combining the third master beam with the fourth master beam, the third slave beam, and the fourth slave beam.

11. The method of claim 10 , wherein the splitting of the second laser beam is performed using a polarization beam splitter.

12. The method of claim 10 , wherein the changing of the first polarization state of the first master beam to the third polarization state is performed using a first polarization controller comprising a half-wave plate,
wherein the changing of the second polarization state of the second master beam to the third polarization state is performed using a second polarization controller comprising a half-wave plate,
wherein the changing of the first polarization state of the first slave beam to the third polarization state is performed using a third polarization controller comprising a half-wave plate,
wherein the changing of the second polarization state of the second slave beam to the third polarization state is performed using a fourth polarization controller comprising a half-wave plate,
wherein a fast axis of the first polarization controller and a fast axis of the second polarization controller form an angle of 45 degrees, and
wherein a fast polarization axis of the third polarization controller and a fast polarization axis of the fourth polarization controller form an angle of 45 degrees.

Assignees

• Samsung Display Co Ltd

Inventors

• Ahn Sanghoon
• Choo Byoungkwon
• Cheong Byoungho
• Na Jeongkyun
• Lee Seung Hwan
• Cho Joowoan
• Cho Hyunjin
• Prudnikov Oleg

Classifications

• H10P34/42

  with electromagnetic radiation, e.g. laser annealing (laser cutting H10P54/20) · CPC title

• H10P14/3808 Primary

  using laser beams · CPC title

• H10P72/0436 Primary

  mainly by radiation · CPC title

• G02B27/286

  for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another (G02B5/3083 takes precedence; light guide coupling means utilising polarising elements G02B6/34) · CPC title

• G02B27/283

  used for beam splitting or combining · CPC title