Illumination system of a microlithographic projection exposure apparatus

Patent metadata

Field	Value
Publication number	US-9454085-B2
Application number	US-201514743017-A
Country	US
Kind code	B2
Filing date	Jun 18, 2015
Priority date	May 6, 2010
Publication date	Sep 27, 2016
Grant date	Sep 27, 2016

Abstract

An illumination system of a microlithographic projection exposure apparatus includes a spatial light modulator which varies an intensity distribution in a pupil surface. The modulator includes an array of mirrors that reflect impinging projection light into directions that depend on control signals applied to the mirrors. A prism, which directs the projection light towards the spatial light modulator, has a double pass surface on which the projection light impinges twice, namely a first time when leaving the prism and before it is reflected by the mirrors, and a second time when entering the prism and after it has been reflected by the mirrors. A pupil perturbation suppressing mechanism is provided that reduces reflections of projection light when it impinges the first time on the double pass surface, and/or prevents that light portions being a result of such reflections contribute to the intensity distribution in the pupil surface.

First claim

What is claimed is:

1. An illumination system, comprising:
a spatial light modulator configured to vary an intensity distribution;
a beam folding unit configured to direct the light toward the spatial light modulator, the beam folding unit comprising an optical element having a surface on which the light impinges a first time and a second time, the first time being when the light leaves the optical element and before the light is reflected from the spatial light modulator, the second time being when the light enters the optical element after the light has been reflected by the spatial light modulator; and
a perturbation suppressing mechanism configured to: a) reduce reflections of the light when the light impinges on the surface the first time; and/or b) prevent reflections of the light when the light impinges on the surface the first time from contributing to the intensity distribution,
wherein the illumination system is a microlithographic illumination system.

2. The illumination system of claim 1 , wherein the perturbation suppressing mechanism comprises an anti-reflective coating supported by the surface.

3. The illumination system of claim 2 , wherein the perturbation suppressing mechanism comprises diffractive structures supported by the surface.

4. The illumination system of claim 1 , wherein the perturbation suppressing mechanism comprises diffractive structures supported by the surface.

5. The illumination system of claim 4 , wherein the perturbation suppressing mechanism comprises a mechanism configured to ensure that an angle of incidence of the light when the light impinges the first time on the surface is the Brewster angle.

6. The illumination system of claim 3 , wherein the perturbation suppressing mechanism comprises a mechanism configured to ensure that an angle of incidence of the light when the light impinges the first time on the surface is the Brewster angle.

7. The illumination system of claim 2 , wherein the perturbation suppressing mechanism comprises a mechanism configured to ensure that an angle of incidence of the light when the light impinges the first time on the surface is the Brewster angle.

8. The illumination system of claim 1 , wherein the perturbation suppressing mechanism comprises a mechanism configured to ensure that an angle of incidence of the light when the light impinges the first time on the surface is the Brewster angle.

9. The illumination system of claim 8 , wherein at least 80% of the light is in a p-polarization state when it impinges the first time on the surface.

10. The illumination system of claim 9 , further comprising a polarizing unit configured to transform the light when it impinges on the polarizing unit from an initial state to a p-polarization state.

11. The illumination system of claim 8 , further comprising a polarizing unit configured to transform the light when it impinges on the polarizing unit from an initial state to a p-polarization state.

12. The illumination system of claim 11 , wherein the polarizing unit comprises:
a half-wave plate;
a quarter-wave plate; and
at least two birefringent plates having a non-uniform thickness.

13. The illumination system of claim 1 , wherein the perturbation suppression mechanism comprises a liquid between the surface and the spatial light modulator.

14. The illumination system of claim 13 , wherein the liquid fills a space between the surface and the spatial light modulator.

15. The illumination system of claim 1 , wherein the optical element comprises a first reflective surface and a second reflective surface, and the perturbation suppression mechanism comprises a mechanism configured to ensure that the surface forms different angles with the first and second reflective surfaces so that the light portions resulting from reflections at the surface do not contribute to the irradiance distribution.

16. The illumination system of claim 1 , wherein the perturbation suppression mechanism comprises a mechanism configured to ensure that the surface is a distance from the spatial light modulator so that areas on the surface on which the light impinges the first time are completely separated from areas on the surface on which the light impinges the second time.

17. The illumination system of claim 1 , wherein the perturbation suppression mechanism comprises an obscurator insertable into a path of the light behind the optical element so that the obscurator obstructs light portions resulting from reflections at the surface so that the reflections do not contribute to the irradiance distribution.

18. The illumination system of claim 17 , wherein the obscurator comprises a light intensity sensor configured to detect the intensity of light impinging on the obscurator.

19. The illumination system of claim 1 , further comprising a light source.

20. The illumination system of claim 1 , wherein the directions of the light reflected by spatial light modulator depend on control signals applied to the spatial light modulator.

21. The illumination system of claim 1 , wherein the spatial light modulator comprises an array of reflective elements configured to reflect impinging light into variable directions.

22. The illumination system of claim 1 , wherein the illumination system has a pupil surface, and the spatial light modulator is configured to vary the irradiance distribution in the pupil surface.

23. The illumination system of claim 1 , wherein the optical element is a prism.

24. An apparatus, comprising:
an illumination system, comprising:
a spatial light modulator configured to vary an intensity distribution;
a beam folding unit configured to direct the light toward the spatial light modulator, the beam folding unit comprising an optical element having a surface on which the light impinges a first time and a second time, the first time being when the light leaves the optical element and before the light is reflected from the spatial light modulator, the second time being when the light enters the optical element after the light has been reflected by the spatial light modulator; and
a perturbation suppressing mechanism configured to: a) reduce reflections of the light when the light impinges on the surface the first time; and/or b) prevent reflections of the light when the light impinges on the surface the first time from contributing to the intensity distribution; and

a projection objective,
wherein the apparatus is a microlithographic projection exposure apparatus.

25. A method of using a microlithographic projection exposure apparatus comprising an illumination system and a projection objective, the method comprising:
using the illumination system to illuminate with light a mask having features; and
using the projection objective to project at least some of the features of the mask onto a photoresist,
wherein the illumination system comprises:
a spatial light modulator configured to vary an intensity distribution;
a beam folding unit configured to direct the light toward the spatial light modulator, the beam folding unit comprising an optical element having a surface on which the light impinges a first time and a second time, the first time being when the light leaves the optical element and before the light is reflected from the spatial light modulator, the second time being when the light enters the optical element after the light has been reflected by the spatial light modulator; and

a perturbation suppressing

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Deguenther Markus
• Fiolka Damian
• Ziegler Gerhard-Wilhelm

Classifications

• G03F7/70941

  Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss · CPC title

• G03F7/70116

  Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets · CPC title

• G02B17/0892 Primary

  specially adapted for the UV · CPC title

• G03F7/70191 Primary

  Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like · CPC title

• G03F7/70025 Primary

  by lasers · CPC title