Resin composition containing ethylene-vinyl alcohol copolymer

US9453094B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9453094-B2
Application numberUS-201514842955-A
CountryUS
Kind codeB2
Filing dateSep 2, 2015
Priority dateMar 28, 2012
Publication dateSep 27, 2016
Grant dateSep 27, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention provides a resin composition containing (A) an ethylene-vinyl alcohol copolymer and (B) an unsaturated aldehyde (B), in which the content of the unsaturated aldehyde (B) with respect to the resin composition containing the ethylene-vinyl alcohol copolymer is 0.01 ppm or more and 100 ppm or less. The unsaturated aldehyde (B) is preferably crotonaldehyde, 2,4-hexadienal, 2,4,6-octatrienal or a combination thereof. In addition, it is preferred that the resin composition further contains a boron compound, and the content of the boron compound is 100 ppm or more and 5,000 ppm or less. Also, it is preferred that the resin composition further contains a conjugated polyene compound, and the content of the conjugated polyene compound is 0.01 ppm or more and 1,000 ppm or less.

First claim

Opening claim text (preview).

The invention claimed is: 1. A resin composition, comprising: (A) an ethylene-vinyl alcohol copolymer; and (B) an unsaturated aldehyde, wherein: a content of the ethylene-vinyl alcohol copolymer (A) with respect to the resin composition is 95% by mass or more; and a content of the unsaturated aldehyde (B) with respect to the resin composition is 0.01 ppm or more and 100 ppm or less. 2. The resin composition according to claim 1 , wherein the unsaturated aldehyde (B) is (B-1) an unsaturated aliphatic aldehyde. 3. The resin composition according to claim 1 , wherein the unsaturated aldehyde (B) is crotonaldehyde, 2,4-hexadienal, 2,4,6-octatrienal or a combination thereof. 4. The resin composition according to claim 1 , further comprising a boron compound, wherein a content of the boron compound is 100 ppm or more and 5,000 ppm or less. 5. The resin composition according to claim 1 , further comprising a conjugated polyene compound, wherein a content of the conjugated polyene compound is 0.01 ppm or more and 1,000 ppm or less. 6. The resin composition according to claim 5 , wherein the conjugated polyene compound is sorbic acid, a sorbic acid salt or a combination thereof. 7. The resin composition according to claim 1 , further comprising acetic acid, an acetic acid salt, or both, wherein a content of acetic acid, the acetic acid salt, or both, is 50 ppm or more and 1,000 ppm or less. 8. The resin composition according to claim 1 , further comprising a phosphorus compound, wherein a content of the phosphorus compound is 1 ppm or more and 200 ppm or less. 9. A multilayered structure, comprising at least one or more layers each comprising the resin composition according to claim 1 .

Assignees

Inventors

Classifications

  • C08K5/09Primary

    Carboxylic acids; Metal salts thereof; Anhydrides thereof · CPC title

  • C08F216/06Primary

    Polyvinyl alcohol {; Vinyl alcohol} · CPC title

  • Aldehydes; Ketones · CPC title

  • Phosphorus-containing compounds · CPC title

  • Boron-containing compounds · CPC title

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What does patent US9453094B2 cover?
The present invention provides a resin composition containing (A) an ethylene-vinyl alcohol copolymer and (B) an unsaturated aldehyde (B), in which the content of the unsaturated aldehyde (B) with respect to the resin composition containing the ethylene-vinyl alcohol copolymer is 0.01 ppm or more and 100 ppm or less. The unsaturated aldehyde (B) is preferably crotonaldehyde, 2,4-hexadienal, 2,4…
Who is the assignee on this patent?
Kuraray Co
What technology area does this patent fall under?
Primary CPC classification C08K5/09. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 27 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).