Electromechanical effect in metal oxides

US9450172B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9450172-B2
Application numberUS-201113877662-A
CountryUS
Kind codeB2
Filing dateOct 5, 2011
Priority dateOct 5, 2010
Publication dateSep 20, 2016
Grant dateSep 20, 2016

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

This invention provides an electromechanical device comprising an active material comprising a metal oxide such as Ce0.8Gd0.2O1.9 wherein the elastic modulus of metal oxide can be modulated by applying external electric field. The Ce0.8Gd0.2O1.9 layer in a substrate\electrode\Ce0.8Gd0.2O1.9\electrode structure or conductive substrate\Ce0.8Gd0.2O1.9\electrode structure develops a stress upon applying an electric field. This invention provides methods for tailoring the elastic modulus of materials using an electric field for the generation of an electromechanical response.

First claim

Opening claim text (preview).

What is claimed is: 1. An electromechanical device comprising a ceria (cerium oxide) based material wherein said ceria-based material is doped by a metal ion and represented by the following formula Ce X M Y O (2-δ) wherein M is a metal ion having a valency of less than four: wherein 0<x<1, 0≦y<1, and 0≦δ<1, and has a centrosymmetric structure and has oxygen vacancies, wherein said ceria-based material is electrostrictive such that upon application of an electric field said ceria-based material generates displacement, stress or a combination thereof. 2. The device of claim 1 , wherein said metal ion is a lanthanide. 3. The device of claim 2 , wherein said metal ion is Gd. 4. The device of claim 3 , wherein said ceria-based material is Ce x Gd y O z wherein said x ranges between 0.95 and 0.63, said y ranges between 0.05 and 0.37 and said z ranges between 2 and (y/2). 5. The device of claim 4 , wherein said Ce x Gd y O z is Ce 0.8 Gd 0.2 O 1.9 . 6. The device of claim 1 , wherein said electric field is constant (DC) electric field, alternating (AC) electric field or combination thereof. 7. The device of claim 1 , wherein said ceria-based material is strain-free. 8. The device of claim 1 , wherein the in-plane strain of said ceria-based material ranges between 0.1%-0.4%. 9. The device of claim 1 , wherein said ceria-based material is poled. 10. The device of claim 1 , wherein said device further comprises conductive contacts. 11. The device of claim 10 , wherein said conductive contacts comprising Cr, Al, Ag, Ti, or combination thereof. 12. The device of claim 11 , wherein the thickness of said conductive contacts ranges between 50 nm and 150 nm. 13. The device of claim 1 , wherein said device is supported by a substrate. 14. The device of claim 1 , wherein said substrate comprising glass. 15. The device of claim 14 , wherein the thickness of said glass ranges between 50 micrometers and 500 micrometers. 16. The device of claim 1 , wherein the thickness of said ceria based material ranges between 0.35 and 1.0 micrometers. 17. A sensor comprising the device of claim 1 . 18. An actuator comprising the device of claim 1 . 19. The device of claim 1 , wherein said ceria-based material is a bulk material or a thin film.

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What does patent US9450172B2 cover?
This invention provides an electromechanical device comprising an active material comprising a metal oxide such as Ce0.8Gd0.2O1.9 wherein the elastic modulus of metal oxide can be modulated by applying external electric field. The Ce0.8Gd0.2O1.9 layer in a substrate\electrode\Ce0.8Gd0.2O1.9\electrode structure or conductive substrate\Ce0.8Gd0.2O1.9\electrode structure develops a stress upon app…
Who is the assignee on this patent?
Lubomirsky Igor, Korobko Roman, Kossoy Anna, and 2 more
What technology area does this patent fall under?
Primary CPC classification H01L41/187. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Sep 20 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).