Method of manufacturing an electrical resonator
US-9209776-B2 · Dec 8, 2015 · US
US9450167B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9450167-B2 |
| Application number | US-201314040469-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 27, 2013 |
| Priority date | Mar 28, 2013 |
| Publication date | Sep 20, 2016 |
| Grant date | Sep 20, 2016 |
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An acoustic resonator comprises: an acoustic resonator device comprises: a composite first electrode disposed over a substrate, the composite first electrode comprising: a first electrically conductive layer provided over the substrate; a first interlayer disposed on the first electrical conductive layer; a buried temperature compensation layer disposed over the first interlayer; a second interlayer disposed over the temperature compensation layer; a second electrically conductive layer disposed over the second interlayer, a piezoelectric layer disposed over the composite first electrode; and a second electrode disposed over the piezoelectric layer.
Opening claim text (preview).
The invention claimed is: 1. An acoustic resonator device comprising: a composite first electrode disposed over a substrate, the composite first electrode comprising: a first electrically conductive layer provided over the substrate; a first interlayer disposed on the first electrically conductive layer; a buried temperature compensation layer disposed over the first interlayer; a second interlayer disposed over the temperature compensation layer, and a second electrically conductive layer disposed over the second interlayer; a piezoelectric layer disposed over the composite first electrode, the piezoelectric layer having a negative temperature coefficient; and a second electrode disposed over the piezoelectric layer. 2. An acoustic resonator device as claimed in claim 1 , wherein the piezoelectric layer has a negative temperature coefficient and at least one of the first electrically conductive layer, the second electrically conductive layer and the second electrode has a positive temperature coefficient that offsets at least a portion of the negative temperature coefficient of the piezoelectric layer. 3. An acoustic resonator device as claimed in claim 1 , wherein at least one of the first and second interlayers has a positive temperature coefficient. 4. An acoustic resonator as claimed in claim 1 , wherein the second interlayer comprises a seed layer that fosters growth of highly textured piezoelectric material. 5. An acoustic resonator device as claimed in claim 1 , wherein the first interlayer is an etch-stop layer. 6. An acoustic resonator as claimed in claim 1 , wherein the first interlayer comprises a same material as the piezoelectric layer. 7. An acoustic resonator as claimed in claim 6 , wherein the material comprises aluminum nitride (AlN). 8. An acoustic resonator as claimed in claim 1 , wherein the second interlayer comprises a same material as the piezoelectric layer, or a material having a hexagonal crystal structure, or composition of interlayer from same piezoelectric layer (AlN) and hexagonal crystal structure materials. 9. An acoustic resonator as claimed in claim 8 , wherein the piezoelectric layer comprises aluminum nitride (AlN). 10. An acoustic resonator as claimed in claim 8 , wherein the material has a thickness in the range of approximately 10 1 Å to approximately 10 3 Å. 11. An acoustic resonator as claimed in claim 8 , wherein the material has a thickness in the range of approximately 60 Å to approximately 150 Å. 12. An acoustic resonator device as claimed in claim 5 , wherein the first interlayer comprises one of: Aluminum (Al), Silicon Carbide (SiC), Titanium Tungsten (TiW), or titanium oxynitride (TiO x N y ). 13. An acoustic resonator device comprising: a composite first electrode disposed over a substrate, the composite first electrode comprising: a first electrically conductive layer provided over the substrate; an interlayer disposed on the first electrical conductive layer; a buried temperature compensation layer disposed over the interlayer; and a second electrically conductive layer disposed over the buried temperature compensation layer; a piezoelectric layer disposed over the composite first electrode; and a second electrode disposed over the piezoelectric layer. 14. An acoustic resonator device as claimed in claim 13 , wherein the piezoelectric layer has a negative temperature coefficient and at least one of the first electrically conductive layer, the second electrically conductive layer and the second electrode has a positive temperature coefficient that offsets at least a portion of the negative temperature coefficient of the piezoelectric layer. 15. An acoustic resonator device as claimed in claim 13 , wherein the interlayer has a positive temperature coefficient. 16. An acoustic resonator as claimed in claim 13 , wherein the interlayer comprises a same material as the piezoelectric layer. 17. An acoustic resonator as claimed in claim 13 , wherein the material comprises aluminum nitride (AlN). 18. An acoustic resonator as claimed in claim 16 , wherein the material has a thickness in the range of approximately 10 1 Å to approximately 10 3 Å. 19. An acoustic resonator comprising: a first electrode disposed over a substrate; a piezoelectric layer disposed over the first electrode; and a composite second electrode comprising disposed over the piezoelectric layer, the second electrode comprising: a first electrically conductive layer provided over the piezoelectric layer; a second electrically conductive layer disposed over the first electrically conductive layer; a buried temperature compensating layer provided between the first and second electrically conductive layers; and an interlayer disposed beneath the buried temperature compensating layer and over the first electrically conductive layer. 20. An acoustic resonator as claimed in claim 19 , wherein the piezoelectric layer has a negative temperature coefficient and at least one of the first electrically conductive layer, the second electrically conductive layer and the second electrode has a positive temperature coefficient that offsets at least a portion of the negative temperature coefficient of the piezoelectric layer. 21. An acoustic resonator as claimed in claim 19 , wherein the interlayer is an etch-stop layer. 22. An acoustic resonator as claimed in claim 21 , wherein the interlayer comprises one of: Aluminum Nitride (AlN), Aluminum (Al), Silicon Carbide (SiC), Titanium Tungsten (TiW), or titanium oxynitride (TiO x N y ).
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