Plasma enhanced thermal evaporator

US9450135B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9450135-B2
Application numberUS-201414294644-A
CountryUS
Kind codeB2
Filing dateJun 3, 2014
Priority dateApr 20, 2009
Publication dateSep 20, 2016
Grant dateSep 20, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention generally provides a method for forming a photovoltaic device including evaporating a source material to form a large molecule processing gas and flowing the large molecule processing gas through a gas distribution showerhead and into a processing area of a processing chamber having a substrate therein. The method includes generating a small molecule processing gas, and reacting the small molecule processing gas with a film already deposited on a substrate surface to form a semiconductor film. Additionally, apparatuses that may use the methods are also provided to enable continuous inline CIGS type solar cell formation.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for forming a photovoltaic device, comprising: evaporating a source material to form a large molecule processing gas; flowing the large molecule processing gas through a gas distribution showerhead and into a processing area of a processing chamber having a substrate therein; electrically biasing the gas distribution showerhead to increase energy level of the large molecule processing gas within the processing area without igniting a plasma; after electrically biasing the gas distribution showerhead, igniting a plasma from the large molecule processing gas, the plasma having a power level; generating a small molecule processing gas with the plasma; and reacting the small molecule processing gas with a film already deposited on a substrate surface to form a semiconductor film. 2. The method of claim 1 , wherein the source material comprises selenium. 3. The method of claim 2 , wherein the large molecule processing gas of selenium comprises selenium clusters having five or more selenium atoms. 4. The method of claim 2 , wherein the small molecule processing gas of selenium comprises selenium clusters having four or less selenium atoms. 5. The method of claim 4 , wherein the film already deposited on the substrate surface comprises copper, indium, and gallium. 6. The method of claim 5 , wherein the semiconductor film has a structure represented by the formula CuIn x Ga (1-x) Se 2 where 0<x<1. 7. A method for forming a photovoltaic device, comprising: evaporating a source material to form a large molecule processing gas; flowing the large molecule processing gas through a gas distribution showerhead and into a processing area of a processing chamber having a substrate disposed therein; applying a power level to the gas distribution showerhead to generate a small molecule processing gas from the large molecule processing gas without igniting a plasma; and reacting the small molecule processing gas with a film already deposited on a substrate surface to form a semiconductor film. 8. The method of claim 7 , wherein the source material comprises selenium. 9. The method of claim 8 , wherein the large molecule processing gas of selenium comprises selenium clusters having five or more selenium atoms. 10. The method of claim 8 , wherein the small molecule processing gas of selenium comprises selenium clusters having four or less selenium atoms. 11. The method of claim 10 , wherein the film already deposited on the substrate surface comprises copper, indium, and gallium. 12. The method of claim 11 , wherein the semiconductor film has a structure represented by the formula CuIn x Ga (1-x) Se 2 where 0<x<1.

Assignees

Inventors

Classifications

  • H10F71/00Primary

    Manufacture or treatment of devices covered by this subclass (patterning processes to connect thin photovoltaic cells in integrated devices, or assemblies of multiple devices, having photovoltaic cells H10F19/33; manufacture or treatment of encapsulations or containers for integrated devices, or assemblies of multiple devices, having photovoltaic cells H10F19/80; manufacture or treatment of integrated devices, or assemblies of multiple devices, comprising at least one element in which radiation controls the flow of current H10F39/00) · CPC title

  • the films including Group I-III-VI materials, e.g. CIS or CIGS · CPC title

  • H01L31/18Primary

    Electricity · mapped topic

  • Manufacturing or production processes characterised by the final manufactured product · CPC title

  • Shower nozzles · CPC title

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What does patent US9450135B2 cover?
The present invention generally provides a method for forming a photovoltaic device including evaporating a source material to form a large molecule processing gas and flowing the large molecule processing gas through a gas distribution showerhead and into a processing area of a processing chamber having a substrate therein. The method includes generating a small molecule processing gas, and re…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H10F71/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Sep 20 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).