Semiconductor device having circular light-blocking layer

US9449991B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9449991-B2
Application numberUS-201414527915-A
CountryUS
Kind codeB2
Filing dateOct 30, 2014
Priority dateJul 2, 2010
Publication dateSep 20, 2016
Grant dateSep 20, 2016

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An object is to provide a semiconductor device including an oxide semiconductor, which has stable electrical characteristics and improved reliability. In a transistor including an oxide semiconductor film, insulating films each including a material containing a Group 13 element and oxygen are formed in contact with the oxide semiconductor film, whereby the interfaces with the oxide semiconductor film can be kept in a favorable state. Further, the insulating films each include a region where the proportion of oxygen is higher than that in the stoichiometric composition, so that oxygen is supplied to the oxide semiconductor film; thus, oxygen defects in the oxide semiconductor film can be reduced. Furthermore, the insulating films in contact with the oxide semiconductor film each have a stacked structure so that films each containing aluminum are provided over and under the oxide semiconductor film, whereby entry of water into the oxide semiconductor film can be prevented.

First claim

Opening claim text (preview).

The invention claimed is: 1. A semiconductor device comprising: a first metal oxide film over a substrate; a second metal oxide film over the first metal oxide film; an oxide semiconductor film over the second metal oxide film; a source electrode and a drain electrode electrically connected to the oxide semiconductor film; a third metal oxide film over the oxide semiconductor film, the source electrode and the drain electrode; a fourth metal oxide film over the third metal oxide film; a light-blocking layer over the fourth metal oxide film; an interlayer film over the light-blocking layer; a pixel electrode over and in contact with the interlayer film; and a conductive layer over and in contact with the interlayer film, and overlapping the oxide semiconductor film and the light-blocking layer, wherein the light-blocking layer has a circular shape when viewed from a top of the semiconductor device. 2. The semiconductor device according to claim 1 , further comprising a gate electrode below the first metal oxide film. 3. The semiconductor device according to claim 1 , wherein the first metal oxide film, the second metal oxide film, the third metal oxide film, and the fourth metal oxide film each contain a Group 13 element and oxygen. 4. The semiconductor device according to claim 1 , wherein the light-blocking layer includes a resin material mixed with a pigment material, a carbon black, and a titanium black. 5. The semiconductor device according to claim 1 , wherein the light-blocking layer has a curved surface when viewed from a cross-section of the semiconductor device. 6. The semiconductor device according to claim 1 , wherein the semiconductor device is one selected from the group consisting of a laptop personal computer, a portable information terminal, an electronic book reader, a mobile phone, a digital video camera, and a television set. 7. A semiconductor device comprising: a first metal oxide film over a substrate; a second metal oxide film over the first metal oxide film; an oxide semiconductor film over the second metal oxide film; a source electrode and a drain electrode electrically connected to the oxide semiconductor film; a third metal oxide film over the oxide semiconductor film, the source electrode and the drain electrode; a fourth metal oxide film over the third metal oxide film; a light-blocking layer over the fourth metal oxide film; an interlayer film over the light-blocking layer; a pixel electrode over and in contact with the interlayer film; and a conductive layer over and in contact with the interlayer film, and overlapping the oxide semiconductor film and the light-blocking layer, wherein the light-blocking layer has a circular shape when viewed from a top of the semiconductor device, and wherein the conductive layer functions as a gate electrode. 8. The semiconductor device according to claim 7 , further comprising a gate electrode below the first metal oxide film. 9. The semiconductor device according to claim 7 , wherein the first metal oxide film, the second metal oxide film, the third metal oxide film, and the fourth metal oxide film each contain a Group 13 element and oxygen. 10. The semiconductor device according to claim 7 , wherein the light-blocking layer includes a resin material mixed with a pigment material, a carbon black, and a titanium black. 11. The semiconductor device according to claim 7 , wherein the light-blocking layer has a curved surface when viewed from a cross-section of the semiconductor device. 12. The semiconductor device according to claim 7 , wherein the semiconductor device is one selected from the group consisting of a laptop personal computer, a portable information terminal, an electronic book reader, a mobile phone, a digital video camera, and a television set.

Assignees

Inventors

Classifications

  • characterised by the gate electrodes · CPC title

  • having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device · CPC title

  • characterised by the insulator, e.g. by the gate insulator · CPC title

  • Conductor-insulator-semiconductor electrodes · CPC title

  • H10D86/60Primary

    wherein the TFTs are in active matrices · CPC title

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Frequently asked questions

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What does patent US9449991B2 cover?
An object is to provide a semiconductor device including an oxide semiconductor, which has stable electrical characteristics and improved reliability. In a transistor including an oxide semiconductor film, insulating films each including a material containing a Group 13 element and oxygen are formed in contact with the oxide semiconductor film, whereby the interfaces with the oxide semiconducto…
Who is the assignee on this patent?
Semiconductor Energy Lab
What technology area does this patent fall under?
Primary CPC classification H10D30/6704. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Sep 20 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).