Support module for lithography system

Patent metadata

Field	Value
Publication number	US-9447839-B2
Application number	US-201214344903-A
Country	US
Kind code	B2
Filing date	Sep 17, 2012
Priority date	Sep 15, 2011
Publication date	Sep 20, 2016
Grant date	Sep 20, 2016

Abstract

The invention relates to a support structure and support module, for instance for use in a lithography system, comprising a frame and a support for supporting a load, wherein said support is moveable relative to said frame, said support structure further comprising a force compensation spring assembly connecting said support to said frame for at least partially supporting said support and/or said load, wherein said force compensation spring assembly comprises a first spring having a negative stiffness characteristic over a predefined range of motion of said spring, and a second spring having a positive stiffness.

First claim

The invention claimed is:

1. Support module ( 400 ; 500 ) for supporting a load, said module comprising
a support ( 420 ; 520 ) for supporting said load,
three support structures, said support structures each comprising:
a frame comprising a center section and two leg-sections arranged on either side of said center section and extending substantially perpendicular to said center section,
a force compensation spring assembly connecting said support to said frame for at least partially supporting said support and/or said load,

wherein said force compensation spring assembly comprises
a first spring having a negative stiffness characteristic over a predefined range of motion of said spring, and
a second spring having a positive stiffness,
wherein said three support structures are arranged with said frames of each of said three support structures being substantially rigidly attached to each other, and wherein said support is connected to each of said three force compensation spring assemblies to be moveable relative to said frames,
wherein said module further comprises:
a base ( 430 ; 530 ; 630 ); and
a flexible mount comprising flexible struts ( 431 , 432 , 433 ; 531 , 532 , 533 ; 631 , 632 ) which extend substantially normal to said base, wherein said flexible mount connects said base to each of said frames and is adapted for allowing movement of said frame relative to said base in a plane parallel to said base ( 430 ; 530 ; 630 );
wherein said leg sections ( 581 a , 581 b ; 681 a , 681 b ) of said frames comprise an accommodation space ( 671 a , 671 b ) for at least partially accommodating a strut ( 531 , 532 ; 631 , 632 ) of said flexible struts therein along a part of the length of said leg-sections, wherein said strut is substantially free to flex in said accommodation space.

2. Support module according to claim 1 , wherein said frames together define a triangular prism-shaped volume, wherein said force compensation spring assemblies are arranged substantially at different outer sides of said triangular prism-shaped volume and have substantially parallel directions of compression/extension substantially along center lines (C 1 ,C 2 ,C 3 ) of said sides.

3. Support module according to claim 1 , wherein, in each frame of a support structure of said three support structures, said first spring is connected on either side to a respective leg-section and spaced apart from said center section, and wherein said second spring is connected to said center section and spaced apart from said leg-sections.

4. Support module according to claim 1 , wherein each second spring of each said support structure is arranged between two of said flexible struts ( 531 , 532 , 533 ; 631 , 632 , 633 ), each strut having a first distal end ( 531 a , 532 a , 533 a ; 631 a , 632 a , 633 a ) and an opposite second distal end ( 531 b , 532 b , 533 b ; 631 b , 632 b , 633 b ), such that each second spring is arranged between a plane intersecting the first distal ends of said two flexible struts and a plane intersecting said second distal ends of said two flexible struts.

5. Support module according to claim 1 , wherein said first springs each comprise one or more bi-stable buckling beams having a negative stiffness between two stable states.

6. Support module according to claim 1 , wherein said second springs each comprise one or more leaf springs.

7. Support module according to claim 6 , wherein said leaf-springs of each second spring are arranged in a diamond shaped configuration.

8. Support module according to claim 7 , wherein each second spring comprises four corner sections ( 405 , 406 , 409 a , 409 b ; 505 , 506 , 509 a , 509 b ; 604 , 606 , 609 a , 609 b ) connecting said leaf springs such that said leaf springs in diagonally opposite quadrants of said diamond shape are arranged for remaining substantially parallel during expansion or compression of said second spring.

9. Support module according to claim 1 , wherein in each support structure said first spring and said second spring are attached to each other at a center point of said first spring.

10. Support module according to claim 1 , wherein said support structures are monolithic support structures and/or wherein said module is formed as a monolithic structure.

11. Support module according to claim 1 , wherein said first spring and said second spring of each support structure are arranged for moving in a common plane, along a common substantially straight line (C 1 ,C 2 ,C 3 ).

12. Lithography system ( 1 ) comprising a support module ( 400 ; 500 ) according to claim 1 , wherein said load comprises a target to be patterned in said lithography system.

13. Lithography system according to claim 12 , further comprising a vacuum chamber ( 2 ), wherein said support module ( 400 ; 500 ) or said support structure is disposed within said vacuum chamber.

14. Lithography system according to claim 12 , further comprising an optical column ( 10 ) adapted for projecting one or more beams onto a target, wherein said support module or said support structure is adapted for supporting said target substantially aligned with said optical column.

15. Lithography system according to claim 12 , further comprising a positioning system ( 13 , 20 ) adapted for positioning said support module or said support structure within said lithography system.

16. Lithography system according to claim 12 , wherein said lithography system comprises actuators for positioning the support of said support module relative to the frame of said support module.

17. Lithography system ( 1 ) according to claim 12 , further comprising a plurality of motors ( 25 , 26 ) adapted for positioning said support relative to said frame.

18. Support structure comprising:
a frame comprising a center section and two leg-sections arranged on either side of said center section and extending substantially perpendicular to said center section, and
a support for supporting a load, wherein said support is moveable relative to said frame, said support structure further comprising a force compensation spring assembly connecting said support to said frame for at least partially supporting said support and/or said load, by at least partially supporting the weight of said support and/or said load,
wherein said force compensation spring assembly comprises:
a first spring having a negative stiffness characteristic over a predefined range of motion of said spring, and
a second spring having a positive stiffness, and
wherein said support structure further comprises:
a base; and
a flexible mount comprising two flexible struts which extend substantially normal to said base, wherein said flexible mount connects said base to said frame and is adapted for allowing movement of said frame relative to said base in a plane parallel to said base, and
wherein said leg sections of said frame comprise an accommodation space for at least partially accommodating a strut of said flexible struts therein along a part of the length of said leg-sections, wherein said strut is substantially free to flex in said accommodation space.

19. Support structure according to claim 18 , wherein each of said two flexible struts has a first distal end and an opposite distal second end, and wherein said second spring is at least partially arranged between a plane intersecting said first distal ends and a plane intersecting said second distal ends.

20. Support structure according to claim 18 , wherein sa

Assignees

• Mapper Lithography Ip Bv

Inventors

• Dunning Alje Geert

Classifications

• F16F3/023

  composed only of leaf springs · CPC title

• F16F3/026

  to give a zero-spring rate characteristic · CPC title

• F16F15/073 Primary

  using only leaf springs · CPC title

• F16F2228/063

  Negative stiffness · CPC title