Ceramic electronic device, powder material, paste material, and manufacturing method of ceramic electronic device
US-12073996-B2 · Aug 27, 2024 · US
US9447485B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9447485-B2 |
| Application number | US-201013395778-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 14, 2010 |
| Priority date | Sep 14, 2009 |
| Publication date | Sep 20, 2016 |
| Grant date | Sep 20, 2016 |
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The present invention provides a structural material having excellent hardness (strength) characteristics. The present invention provides an Ni 3 (Si, Ti)-based intermetallic compound characterized by containing from 25 to 500 ppm by weight of B with respect to a weight of an intermetallic compound having a composition of 100% by atom in total consisting of from 10.0 to 12.0% by atom of Si, 1.5% by atom or more but less than 7.5% by atom of Ti, more than 2.0% by atom but 8.0% by atom or less of Ta and a balance made up of Ni excepting impurities, and by having a microstructure composed of an L1 2 phase or a microstructure composed of an L1 2 phase and a second phase dispersion containing Ni and Ta.
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The invention claimed is: 1. An Ni 3 (Si, Ti)-based intermetallic compound characterized by consisting of from 10.0 to 12.0% by atom of Si, 1.5% by atom or more but less than 6.5% by atom of Ti, more than 2.0% by atom but 8.0% by atom or less of Ta, a balance made up of Ni excepting impurities, and from 25 to 500 ppm by weight of B with respect to a weight of an intermetallic compound having a composition of 100% by atom in total consisting of the respective amounts of Si, Ti, Ta and Ni, and by having a microstructure composed of an L1 2 phase or a microstructure composed of an L1 2 phase and a second phase dispersion containing Ni and Ta. 2. The Ni 3 (Si, Ti)-based intermetallic compound according to claim 1 , having a Vickers' hardness of from 410 to 520 in a range of temperature from room temperature to 800° C. 3. The Ni 3 (Si, Ti)-based intermetallic compound according to claim 1 , consisting of from 10.0 to 12.0% by atom of Si, from 1.5 to 5.5% by atom of Ti, from 4.0 to 8.0% by atom of Ta, a balance made up of Ni excepting impurities, and from 25 to 100 ppm by weight of B with respect to a weight of an intermetallic compound having a composition of 100% by atom in total consisting of the respective amounts of Si, Ti, Ta and Ni. 4. The Ni 3 (Si, Ti)-based intermetallic compound according to claim 1 , consisting of from 10.0 to 12.0% by atom of Si, 2.5 to 5.5% by atom of Ti, 4.0 to 7.0% by atom of Ta, a balance made up of Ni excepting impurities, and from 25 to 100 ppm by weight of B with respect to a weight of an intermetallic compound having a composition of 100% by atom in total consisting of the respective amounts of Si, Ti, Ta and Ni. 5. An Ni 3 (Si, Ti)-based intermetallic compound characterized by consisting of from 10.0 to 12.0% by atom of Si, 2.5 to 6.5% by atom of Ti, 3.0 to 7.0% by atom of Ta, a balance made up of Ni excepting impurities, and from 25 to 100 ppm by weight of B with respect to a weight of an intermetallic compound having a composition of 100% by atom in total consisting of the respective amounts of Si, Ti, Ta and Ni, and by having a microstructure composed of an L1 2 phase or a microstructure composed of an L1 2 phase and a second phase dispersion containing Ni and Ta. 6. The Ni 3 (Si, Ti)-based intermetallic compound according to claim 5 , consisting of from 10.0 to 12.0% by atom of Si, from 9.0 to 11.5% by atom in total of Ti and Ta, a balance made up of Ni excepting impurities, and from 25 to 100 ppm by weight of B with respect to a weight of an intermetallic compound having a composition of 100% by atom in total consisting of the respective amounts of Si, Ti, Ta and Ni. 7. The Ni 3 (Si, Ti)-based intermetallic compound according to claim 5 , having a Vickers' hardness of from 410 to 520 measured under a load of 300 g. 8. The Ni 3 (Si, Ti)-based intermetallic compound according to claim 1 , wherein a maximum content of Ta of the Ni 3 (Si, Ti)-based intermetallic compound is 6.0% by atom. 9. The Ni 3 (Si, Ti)-based intermetallic compound according to claim 1 , consisting of from 19.0 to 21.5% by atom in total of Si, Ti and Ta, a balance made up of Ni excepting impurities, and from 25 to 500 ppm by weight of B with respect to a weight of an intermetallic compound having a composition of 100% by atom in total consisting of the respective amounts of Si, Ti, Ta and Ni. 10. The Ni 3 (Si, Ti)-based intermetallic compound according to claim 2 , consisting of from 10.0 to 12.0% by atom of Si, from 1.5 to 5.5% by atom of Ti, from 4.0 to 8.0% by atom of Ta, a balance made up of Ni excepting impurities, and from 25 to 100 ppm by weight of B with respect to a weight of an intermetallic compound having a composition of 100% by atom in total consisting of the respective amounts of Si, Ti, Ta and Ni. 11. The Ni 3 (Si, Ti)-based intermetallic compound according to claim 2 , consisting of from 10.0 to 12.0% by atom of Si, 2.5 to 5.5% by atom of Ti, 4.0 to 7.0% by atom of Ta, a balance made up of Ni excepting impurities, and from 25 to 100 ppm by weight of B with respect to a weight of an intermetallic compound having a composition of 100% by atom in total consisting of the respective amounts of Si, Ti, Ta and Ni. 12. The Ni 3 (Si, Ti)-based intermetallic compound according to claim 3 , consisting of 10.0 to 12.0% by atom of Si, 2.5 to 5.5% by atom of Ti, 4.0 to 7.0% by atom of Ta, a balance made up of Ni excepting impurities, and from 25 to 100 ppm by weight of B with respect to a weight of an intermetallic compound having a composition of 100% by atom in total consisting of the respective amounts of Si, Ti, Ta and Ni. 13. The Ni 3 (Si, Ti)-based intermetallic compound according to claim 6 , having a Vickers' hardness of from 410 to 520 measured under a load of 300 g. 14. The Ni 3 (Si, Ti)-based intermetallic compound according to claim 2 , wherein a maximum content of Ta of the Ni 3 (Si, Ti)-based intermetallic compound is 6.0% by atom. 15. The Ni 3 (Si, Ti)-based intermetallic compound according to claim 3 , wherein a maximum content of Ta of the Ni 3 (Si, Ti)-based intermetallic compound is 6.0% by atom. 16. The Ni 3 (Si, Ti)-based intermetallic compound according to claim 4 , wherein a maximum content of Ta of the Ni 3 (Si, Ti)-based intermetallic compound is 6.0% by atom. 17. The Ni 3 (Si, Ti)-based intermetallic compound according to claim 5 , wherein a maximum content of Ta of the Ni 3 (Si, Ti)-based intermetallic compound is 6.0% by atom. 18. The Ni 3 (Si, Ti)-based intermetallic compound according to claim 6 , wherein a maximum content of Ta of the Ni 3 (Si, Ti)-based intermetallic compound is 6.0% by atom. 19. The Ni 3 (Si, Ti)-based intermetallic compound according to claim 7 , wherein a maximum content of Ta of the Ni 3 (Si, Ti)-based intermetallic compound is 6.0% by atom. 20. The Ni 3 (Si, Ti)-based intermetallic compound according to claim 2 , consisting of from 19.0 to 21.5% by atom in total of Si, Ti and Ta, a balance made up of Ni excepting impurities, and from 25 to 500 ppm by weight of B with respect to a weight of an intermetallic compound having a composition of 100% by atom in total consisting of the respective amounts of Si, Ti, Ta and Ni.
based on nickel · CPC title
Making non-ferrous alloys (by electrothermic methods C22B4/00; by electrolysis C25C1/24, C25C3/36) · CPC title
of copper or alloys based thereon · CPC title
Metal or alloys, e.g. alloy coatings (H01M4/669 take precedence) · CPC title
of nickel or cobalt or alloys based thereon · CPC title
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