Substrate processing apparatus
US-2015375273-A1 · Dec 31, 2015 · US
System and method for dispensing photoresist
US9446331B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9446331-B2 |
| Application number | US-201313925896-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 25, 2013 |
| Priority date | Mar 15, 2013 |
| Publication date | Sep 20, 2016 |
| Grant date | Sep 20, 2016 |
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Abstract
Official abstract text for this publication.
A system comprises: a filter for removing at least one of a contaminant or gas bubbles from a liquid photoresist to provide a filtered photoresist at an outlet of the filter. The filter has a filter vent. A trap has an inlet coupled to receive the filtered photoresist from the filter, for removing a remaining contaminant or gas bubbles from the filtered photoresist. One or more valves and one or more conduits are connected to the filter and the trap. The one or more valves are operable to reverse a direction of flow of the filtered photoresist, so that the photoresist flows from the inlet of the trap, through the outlet of the filter, to the filter vent.
First claim
Opening claim text (preview).
What is claimed is: 1. A system comprising: a filter for removing at least one of a contaminant or gas bubbles from a liquid photoresist to provide a filtered photoresist at an outlet of the filter, the filter having a filter vent; a trap having an inlet coupled to receive the filtered photoresist from the filter, for removing a remaining contaminant or gas bubbles from the filtered photoresist; one or more valves and one or more conduits connected to the filter and the trap,…
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Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Operations & Transport · mapped topic
Operations & Transport · mapped topic
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Frequently asked questions
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- What does patent US9446331B2 cover?
- A system comprises: a filter for removing at least one of a contaminant or gas bubbles from a liquid photoresist to provide a filtered photoresist at an outlet of the filter. The filter has a filter vent. A trap has an inlet coupled to receive the filtered photoresist from the filter, for removing a remaining contaminant or gas bubbles from the filtered photoresist. One or more valves and one o…
- Who is the assignee on this patent?
- Taiwan Semiconductor Mfg Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification B01D19/0031. Mapped technology areas include Operations & Transport.
- When was this patent published?
- Publication date Tue Sep 20 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).