Method and apparatus for generating radiation

US9442380B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9442380-B2
Application numberUS-201314439476-A
CountryUS
Kind codeB2
Filing dateOct 3, 2013
Priority dateOct 31, 2012
Publication dateSep 13, 2016
Grant dateSep 13, 2016

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

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A radiation source (e.g., LPP—laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one stream has a fuel particle in the plasma formation region at any time, and so that when a fuel particle from one stream is generating plasma and EUV radiation at the plasma generation region, other fuel particles are sufficiently spaced so as to be substantially unaffected by the plasma. The arrangement permits potential doubling of the radiation intensity achievable for a particular fuel particle size.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of generating radiation for a lithography apparatus, the method comprising: directing a first stream of fuel particles along a first trajectory to cross a path of an excitation beam within a plasma formation region; directing a second stream of fuel particles along a second trajectory to cross the path of the excitation beam within the plasma formation region; and wherein the fuel particles are excited by the excitation beam to form a plasma to generate radiation within the plasma formation region, wherein the first and second trajectories are spaced apart within the plasma formation region and the fuel particles of the first and second streams are timed to cross the excitation beam, such that when a fuel particle from one stream is crossing the path of the excitation beam and generating a plasma, an adjacent particle from the other stream is spaced sufficiently far from the generated plasma to be substantially unaffected by the generated plasma. 2. The method of claim 1 wherein the first and second streams have the same particle frequency and particle separation distance d, measured along the respective trajectory, but are mutually phased such that only one fuel particle is within the plasma formation region at any time. 3. The method of claim 2 wherein when a fuel particle from the first stream is at its central position along its trajectory within the plasma formation region, a next adjacent fuel particle from the second stream, due to enter the plasma formation region, is from 0.2 d to 0.8 d from its respective central position along its trajectory within the plasma formation region. 4. The method of claim 3 wherein when a fuel particle from the first stream is at its central position along its trajectory within the plasma formation region, a next adjacent fuel particle from the second stream, due to enter the plasma formation region, is about 0.5 d from its respective central position along its trajectory within the plasma formation region. 5. The method of claim 1 wherein the fuel particles are droplets of molten metal. 6. The method of claim 1 wherein the first and second trajectories are arranged to converge at a single fuel particle catcher. 7. The method of claim 1 wherein the first and second trajectories are substantially mutually parallel. 8. The method of claim 1 wherein one or more further streams of fuel particles are directed along one or more respective further trajectories to cross the path of the excitation beam within the plasma formation region for excitation to form a plasma to generate radiation within the plasma formation region, wherein the first trajectory, second trajectory and the one or more further trajectories are spaced apart within the plasma formation region, and wherein the streams of fuel particles are timed to cross the path of the excitation beam such that when a fuel particle from one stream is crossing the path of the excitation beam and generating a plasma, an adjacent particle from each other stream is spaced sufficiently far from the generated plasma to be substantially unaffected by the generated plasma. 9. The method of claim 1 comprising adjusting a velocity and/or timing of the fuel particles in at least one said stream, wherein the velocity of the fuel particles is adjusted by varying the magnitude of the voltage applied to a piezoelectric element in a fuel particle generator. 10. The method of claim 1 comprising adjusting a velocity and/or timing of the fuel particles in at least one said stream, wherein the timing of the fuel particles is adjusted by varying the phase of a signal applied to a piezoelectric element in a fuel particle generator. 11. A lithographic method, comprising: generating radiation according to the method of claim 1 ; and using the generated radiation to apply a pattern to a substrate. 12. A radiation source, comprising: an excitation beam source arranged to direct an excitation beam along a path to a plasma generation region; a first fuel stream generator arranged to direct a first stream of fuel particles along a first trajectory to cross the path of the excitation beam within the plasma formation region; a second fuel stream generator arranged to direct a second stream of fuel particles along a second trajectory to cross the path of the excitation beam within the plasma formation region; and wherein said fuel particles are excited to form a plasma to generate radiation within the plasma formation region, wherein the fuel stream generators are positioned such that the first and second trajectories are spaced apart within the plasma formation region, and wherein the radiation source further comprises a synchronizing controller arranged to time crossing of the path of the excitation beam by fuel particles from said first and second streams of fuel particles, such that when a fuel particle from one stream is crossing the path of the excitation beam and generating a plasma, an adjacent particle from the other stream is spaced sufficiently far from said generated plasma to be substantially unaffected by said generated plasma. 13. The radiation source of claim 12 , further comprising a radiation collector for collecting said radiation, generated by said generated plasma, wherein the plasma generation region surrounds a first focal point of the collector mirror, and wherein the collector mirror is arranged to focus the generated radiation at a second focal point, the first focal point being closer to the collector mirror than the second focal point, wherein the first trajectory is positioned to cross the plasma generation region between the first focal point and the collector mirror, and wherein the second trajectory is positioned to cross the plasma generation region between the first focal point and second focal point. 14. A lithographic projection apparatus comprising the radiation source of claim 12 . 15. A method of generating a fuel droplet stream comprising: driving a continuous stream of fuel under pressure through an outlet nozzle and applying a vibration to said outlet nozzle to generate a stream of fuel droplets, and varying the velocity of the droplets in the stream by varying the amplitude of the vibration applied to the outlet nozzle.

Assignees

Inventors

Classifications

  • by plasma extreme ultraviolet [EUV] sources · CPC title

  • Supply of the plasma generating material · CPC title

  • the plasma being generated from a material in a liquid or gas state · CPC title

  • Electricity · mapped topic

  • involving an energy-carrying beam in the process of plasma generation · CPC title

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What does patent US9442380B2 cover?
A radiation source (e.g., LPP—laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one s…
Who is the assignee on this patent?
Asml Netherlands Bv
What technology area does this patent fall under?
Primary CPC classification G03F7/70033. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Sep 13 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).