Two-piece LCD projection device with light filter function and projection method thereof
US-12140854-B1 · Nov 12, 2024 · US
US9435921B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9435921-B2 |
| Application number | US-201313958190-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 2, 2013 |
| Priority date | Aug 2, 2013 |
| Publication date | Sep 6, 2016 |
| Grant date | Sep 6, 2016 |
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A novel blazed grating spectral filter disclosed herein includes a multilayer stack of materials that is formed on a wedge-shaped substrate wherein the upper surface of the substrate is oriented at an angle relative the bottom surface of the substrate and wherein the angle corresponds to the blaze angle of the blazed grating filter. Various methods of forming such a filter are also disclosed such as, for example, performing a planarization process in a CMP tool to define the wedge-shaped substrate, thereafter forming the multilayer stack of materials above the upper planarized surface of the substrate and etching recesses into the multilayer stack.
Opening claim text (preview).
What is claimed: 1. A blazed grating filter, comprising: a substrate, said substrate having a substantially planar upper surface positioned in a first plane and a substantially planar bottom surface positioned in a second plane, wherein said first plane is oriented at an angle relative to said second plane and wherein said angle corresponds to a blaze angle of said blazed grating filter; a multilayer stack comprised of a plurality of multilayer pairs positioned above said upper surface of said substrate, wherein an uppermost surface of said multilayer stack is positioned in a third plane that is substantially parallel with said second plane; a plurality of recesses positioned in an upper portion of said multilayer stack; and at least one capping layer positioned above at least said uppermost surface of said multilayer stack and above at least a bottom surface of each of said recesses. 2. The filter of claim 1 , wherein each of said recesses has a depth that falls within the range of about 5-300 nm. 3. The filter of claim 1 , wherein said at least one capping layer is comprised of ruthenium or silicon dioxide. 4. The filter of claim 1 , wherein said third plane containing said uppermost surface of said multilayer stack is positioned at substantially said angle relative to said first plane containing said upper surface of said substrate. 5. The filter of claim 1 , wherein said filter is adapted to filter EUV radiation. 6. The filter of claim 1 , wherein said blaze angle falls within the range of 0.1-30 degrees. 7. The filter of claim 1 , wherein said filter comprises at least 1000 of said multi-layer pairs. 8. The filter of claim 1 , wherein said at least one capping layer comprises a first capping layer and second capping layer, said first capping layer being positioned above said uppermost surface of said multilayer stack, each of said plurality of recesses extending through said first capping layer and into said upper portion of said multilayer stack, and said second capping layer being positioned above an upper surface of said first capping layer and above said bottom surface of each of said plurality of recesses. 9. The filter of claim 8 , wherein said first capping layer is positioned above said uppermost surface of said multilayer stack, wherein each of said plurality of recesses extends through said first capping layer and into said upper portion of said multilayer stack, and wherein said second capping layer is positioned above an upper surface of said first capping layer and above said bottom surface of each of said plurality of recesses. 10. The filter of claim 1 , wherein said at least one capping layer comprises a first capping layer and second capping layer. 11. The filter of claim 1 , wherein an entire upper surface of said substrate is a substantially planar surface that is positioned in said first plane and wherein an entire bottom surface of said substrate is a substantially planar surface that is positioned in said second plane. 12. The filter of claim 1 , wherein each pair of said plurality of multilayer pairs comprises a first layer positioned above a second layer. 13. The filter of claim 12 , wherein a third layer is positioned between said first and second layers of each pair of said plurality of multilayer pairs. 14. The filter of claim 12 , wherein said first layer comprises one of molybdenum and lanthanum and said second layer comprises one of silicon and boron. 15. A blazed grating filter, comprising: a substrate, said substrate having a substantially planar upper surface positioned in a first plane and a substantially planar bottom surface positioned in a second plane, wherein said first plane is oriented at an angle relative to said second plane and wherein said angle corresponds to a blaze angle of said blazed grating filter; a multilayer stack comprised of a plurality of multilayer pairs positioned above said upper surface of said substrate, wherein an uppermost surface of said multilayer stack is positioned in a third plane, wherein said third plane is substantially parallel with said second plane and oriented at substantially said angle relative to said first plane; a plurality of recesses positioned in an upper portion of said multilayer stack; and at least one capping layer positioned above at least said uppermost surface of said multilayer stack and above at least a bottom surface of each of said recesses. 16. The filter of claim 15 , wherein a bottom surface of each of said plurality of recesses is positioned in a fourth plane and said fourth plane is substantially parallel with said second plane. 17. The filter of claim 15 , wherein each of said recesses has a depth that falls within the range of about 5-300 nm. 18. The filter of claim 15 , wherein said filter is adapted to filter EUV radiation. 19. The filter of claim 15 , wherein an entire upper surface of said substrate is a substantially planar surface that is positioned in said first plane and wherein an entire bottom surface of said substrate is a substantially planar surface that is positioned in said second plane. 20. The filter of claim 15 , wherein each pair of said plurality of multilayer pairs comprises a first layer positioned above a second layer, said first layer comprising one of molybdenum and lanthanum and said second layer comprising one of silicon and boron. 21. The filter of claim 20 , wherein a third layer is positioned between said first and second layers of each pair of said plurality of multilayer pairs. 22. A blazed grating filter, comprising: a substrate, wherein an entirety of said substrate has a substantially planar upper surface positioned in a first plane and a substantially planar bottom surface positioned in a second plane that is oriented at an angle relative to said first plane, said angle corresponding to a blaze angle of said blazed grating filter; a multilayer stack comprising a plurality of multilayer pairs positioned above said upper surface of said substrate, wherein an uppermost surface of said multilayer stack is positioned in a third plane that is substantially parallel to said second plane; a first capping layer positioned above said uppermost surface of said multilayer stack; a plurality of recesses positioned in an upper portion of said multilayer stack, each of said plurality of recesses extending through said first capping layer and into said upper portion of said multilayer stack; and a second capping layer positioned above a bottom surface of each of said plurality of recesses, wherein said second capping layer extends continuously over and covers said uppermost surface of said multilayer stack, sidewall surfaces of each of said plurality of recesses, and said bottom surface of each of said plurality of recesses.
Filters (polarising elements G02B5/30) · CPC title
by surface treatment, e.g. by irradiation · CPC title
having holographic or diffractive elements (diffraction gratings per se G02B5/18; holographic elements per se G02B5/32; generating the spectrum using diffraction elements G01J3/18) · CPC title
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