Titanium metal production apparatus and production method for titanium metal

Patent metadata

Field	Value
Publication number	US-9435007-B2
Application number	US-201113988625-A
Country	US
Kind code	B2
Filing date	Nov 16, 2011
Priority date	Nov 22, 2010
Publication date	Sep 6, 2016
Grant date	Sep 6, 2016

Abstract

A titanium metal production apparatus is provided with (a) a first flow channel that supplies magnesium in a state of gas, (b) a second flow channel that supplies titanium tetrachloride in a state of gas, (c) a gas mixing section in which the magnesium and titanium tetrachloride in a state of gas are mixed and the temperature is controlled to be 1600° C. or more, (d) a titanium metal deposition section in which particles for deposition are arranged so as to be movable, the temperature is in the range of 715 to 1500° C., and the absolute pressure is 50 kPa to 500 kPa, and (e) a mixed gas discharge section which is in communication with the titanium metal deposition section.

First claim

The invention claimed is:

1. An apparatus for producing titanium metal, comprising:
(a) a first flow channel for supplying gaseous magnesium;
(b) a second flow channel for supplying gaseous titanium tetrachloride;
(c) a gas mixing section in communication with the first flow channel and the second flow channel, wherein the gaseous magnesium is mixed with the gaseous titanium tetrachloride in the gas mixing section, and a temperature within the gas mixing section is controlled at not lower than 1600° C.;
(d) a titanium metal deposition section in communication with the gas mixing section, wherein the titanium metal deposition section is at a temperature of 715 to 1500° C. and under an absolute pressure of 50 to 500 kPa, and wherein particles for deposition are movably disposed in the titanium metal deposition section; and
(e) a mixed gas discharge section in communication with the titanium metal deposition section,
wherein the particles are supplied from an upper portion of the titanium metal deposition section, and the gas mixing section is communicatively connected to a side of the titanium metal deposition section.

2. The apparatus according to claim 1 , wherein the absolute pressure in the titanium metal deposition section is 90 to 200 kPa.

3. The apparatus according to claim 1 , wherein at least one of the first flow channel, the second flow channel, the gas mixing section, and the titanium metal deposition section comprises a graphite wall.

4. The apparatus according to claim 3 , wherein the apparatus includes an induction coil around at least a part of the graphite wall to heat the graphite wall.

5. The apparatus according to claim 1 , wherein the titanium metal deposition section is in a temperature range from 900 to 1400° C.

6. The apparatus according to claim 1 , wherein the particles are made of titanium or a titanium alloy.

7. The apparatus according claim 1 , wherein the titanium metal deposition section further comprises a gas blower hole for blowing a gas in order to adjust retaining time of the particles in the titanium metal deposition section.

8. The apparatus according to claim 1 , further comprising a particles preheating section for heating the particles at a temperature of 300 to 1000° C. before the particles are supplied.

9. A process for producing titanium metal, comprising steps of:
(a) supplying gaseous magnesium and gaseous titanium tetrachloride in a mixing space having a temperature of not lower than 1600° C. to form a mixed gas;
(b) introducing the mixed gas in a titanium metal deposition space, wherein the titanium metal deposition space is in a temperature range from 715 to 1500° C. and under an absolute pressure of 50 to 500 kPa, and wherein particles for deposition are movably disposed in the titanium metal deposition space;
(c) causing titanium metal deposited and grown on the particles; and
(d) discharging the mixed gas after the step (c);
wherein the step (b) comprises introducing the mixed gas from a side of the titanium metal deposition space, and supplying the particles from an upper portion of the titanium metal deposition space to allow the particles to fall toward a lower portion of the titanium metal deposition space; and
wherein the process for producing titanium metal is carried out using the apparatus of claim 1 .

10. The process according to claim 9 , wherein the step (b) further comprises blowing a gas toward the particles for adjusting retaining time of the particles.

11. The process according to claim 9 , wherein the step (b) further comprises preheating the particles at a temperature of 300 to 1000° C. prior to supplying the particles.

Assignees

• Han Gang
• Shoji Tatsuya
• Uesaka Shujiroh
• Fukumaru Mariko
• Boulos Maher I
• Guo Jiayin
• Jurewicz Jerzy
• Hitachi Metals Ltd
• Tekna Plasma Systems Inc

Inventors

• Han Gang
• Shoji Tatsuya
• Uesaka Shujiroh
• Fukumaru Mariko
• Boulos Maher I
• Guo Jiayin
• Jurewicz Jerzy

Classifications

• C22B34/1272 Primary

  reduction of titanium halides, e.g. Kroll process · CPC title

• B22F9/26

  using gaseous reductors · CPC title

• F27D99/00

  Subject matter not provided for in other groups of this subclass · CPC title

• C22B34/129 Primary

  obtaining metallic titanium from titanium compounds by dissociation, e.g. thermic dissociation of titanium tetraiodide, or by electrolysis or with the use of an electric arc · CPC title