Method for removing cells

US9434936B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9434936-B2
Application numberUS-201113638795-A
CountryUS
Kind codeB2
Filing dateMar 28, 2011
Priority dateApr 2, 2010
Publication dateSep 6, 2016
Grant dateSep 6, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for separating cells which includes: adhering cells to the surface of a cell culture substrate containing a photo-acid generator that generates an acidic substance upon irradiation with active energy rays, and irradiating only a partial region of the cell culture substrate with the active energy rays to selectively remove the cells within the partial region, thereby separating the cells within the partial region and cells in other regions.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for removing target cells from a cell culture substrate, the method comprising: providing a cell culture substrate including a substrate and a layer containing a photo-acid generator formed on a surface of the substrate: adhering cells to the surface of the layer containing the photo-acid generator which generates an acidic substance upon irradiation with light, generating the acidic substance by irradiating only a region of the substrate containing the photo-acid generator layer beneath target cells to be removed, and removing the target cells from the region of the irradiated substrate by the action of the acidic substance generated from the irradiated layer containing the photo-acid generator beneath the target cells. 2. The method for removing target cells according to claim 1 , wherein the removal is conducted by killing the target cells by the action of the acidic substance generated from the irradiated layer containing the photo-add generator beneath the removal target cells. 3. The method for removing cells according to claim 1 , wherein the substrate comprises a polyvinylpyridine-based resin. 4. The method for removing target cells according to claim 1 , wherein a layer containing an adhesion inhibitor is formed on only a partial region of the surface of the layer containing the photo-acid generator, and the layer containing the photo-acid generator, which has the target cells adhered thereto in a region in which the layer containing an adhesion inhibitor is not formed, is irradiated with light. 5. The method for removing cells according to claim 1 , wherein prior to irradiation with the light, a portion of the cells are labeled, and a region to be irradiated with light is determined based on positioning information for the labeled cells. 6. The method for removing cells according to claim 1 , wherein the photo-acid generator is at least one member selected from the group consisting of a naphthaleneimide-based sulfonic acid derivative, a thioxanthone-based sulfonic acid derivative, 1,8-naphthalenedicarboxylic acid imidomethylsulfonate, 1,8-naphthalenedicarboxylic acid imidotosylsulfonate, and sulfonium salts or iodonium salts having an anion which is tetrafluoroborate (BF 4 − ) or hexafluorophosphate (PF 6 − ). 7. The method for removing cells according to claim 1 , wherein the photo-acid generator is at least one member selected from the group consisting of a compound represented by formula (1) and a compound represented by formula (2) shown below: 8. The method for removing cells according to claim 1 , wherein the photo-acid generator includes a compound which generates an acidic substance by irradiation with the light, and the acidic substance is a polymeric compound. 9. The method for removing cells according to claim 8 , wherein the photo-acid generator is at least one member select from the group consisting of a compound represented by formula (3a), a compound represented by formula (3b), a compound represented by formula (3c) and a compound represent by formula (3d): wherein for the compound represented by formula 3(a): R 1 is Me and R 2 is OMe; for the compound represented by 3(b): R 1 is H and R 2 is OMe; for the compound represented by 3(c): R 1 is H and R 2 is NH-iPr; and for the compound represented by 3(d): R 1 is H and R 2 is NH-iPr; wherein x and y are integers of 1 or greater. 10. The method for removing cells according to claim 1 , wherein the light has a wavelength of 200 to 600 nm. 11. The method for removing cells according to claim 1 , wherein a light source of the light is an ultraviolet lamp or a visible light lamp. 12. The method for removing target cells according to claim 1 , wherein the step of removing the target cells is by washing the irradiated substrate with a culture medium or a buffer solution thereby detaching the target cells.

Assignees

Inventors

Classifications

  • Material Coatings (immunocoatings C12M25/00) · CPC title

  • Plates; Walls; Drawers; Multilayer plates · CPC title

  • Means for introduction, transport, positioning, extraction, harvesting, peeling or sampling of biological material in or from the apparatus (chemical or physical laboratory apparatus in general B01L, devices for taking cell samples A61B10/0045, withdrawing or distributing predetermined quantities of fluid B01L99/00) · CPC title

  • Separating microorganisms from their culture media · CPC title

  • C12N13/00Primary

    Treatment of microorganisms or enzymes with electrical or wave energy, e.g. magnetism, sonic waves · CPC title

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What does patent US9434936B2 cover?
A method for separating cells which includes: adhering cells to the surface of a cell culture substrate containing a photo-acid generator that generates an acidic substance upon irradiation with active energy rays, and irradiating only a partial region of the cell culture substrate with the active energy rays to selectively remove the cells within the partial region, thereby separating the cell…
Who is the assignee on this patent?
Sumaru Kimio, Takagi Toshiyuki, Kikuchi Kyoko, and 4 more
What technology area does this patent fall under?
Primary CPC classification C12N13/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 06 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).