β-Ga2O3-based single crystal substrate

US9431489B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9431489-B2
Application numberUS-201514634407-A
CountryUS
Kind codeB2
Filing dateFeb 27, 2015
Priority dateJun 30, 2014
Publication dateAug 30, 2016
Grant dateAug 30, 2016

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Abstract

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A β-Ga 2 O 3 -based single crystal substrate includes an average dislocation density of less than 7.31×10 4 cm −2 . The average dislocation density may be not more than 6.14×10 4 cm −2 . The substrate may further include a main surface including a plane orientation of (−201), (101) or (001). The substrate may be free from any twinned crystal.

First claim

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What is claimed is: 1. A β-Ga 2 O 3 -based single crystal substrate including a main surface parallel to a b-axis, the β-Ga 2 O 3 -based single crystal substrate comprising: an average dislocation density on the main surface of not less than 7.52×10 3 cm −2 and less than 7.31×10 4 cm −2 , wherein the substrate is free from any twinned crystal, and wherein the substrate has a diameter of not less than 2 inches. 2. The β-Ga 2 O 3 -based single crystal substrate according to claim 1 , wherein the average dislocation density is not more than 6.14×10 4 cm −2 . 3. The β-Ga 2 O 3 -based single crystal substrate according to claim 2 , wherein a plane orientation of the main surface is (−201), (101) or (001). 4. The β-Ga 2 O 3 -based single crystal substrate according to claim 1 , wherein a plane orientation of the main surface is (−201), (101) or (001). 5. A β-Ga 2 O 3 -based single crystal substrate including a main surface parallel to a b-axis, the β-Ga 2 O 3 -based single crystal substrate comprising: an average dislocation density on the main surface of not less than 7.52×10 3 cm −2 and less than 6.14×10 4 cm −2 , wherein the substrate further comprises a region free from any twinning plane, and wherein the region comprises a maximum width of not less than 2 inches in a direction perpendicular to an intersection line between a twinning plane and the main surface. 6. The β-Ga 2 O 3 -based single crystal substrate according to claim 5 , wherein a plane orientation of the main surface is (−201), (101), or (001). 7. A β-Ga 2 O 3 -based single crystal substrate including a main surface parallel to a b-axis, the β-Ga 2 O 3 -based single crystal substrate comprising: an average dislocation density on the main surface of not less than 6.14×10 4 cm −2 and less than 7.31×10 4 cm −2 , wherein the substrate further comprises a region free from any twinning plane, and wherein the region comprises a maximum width of not less than 2 inches in a direction perpendicular to an intersection line between a twinning plane and a main surface. 8. The β-Ga 2 O 3 -based single crystal substrate according to claim 7 , wherein a plane orientation of the main surface is (−201), (101) or (001).

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What does patent US9431489B2 cover?
A β-Ga 2 O 3 -based single crystal substrate includes an average dislocation density of less than 7.31×10 4 cm −2 . The average dislocation density may be not more than 6.14×10 4 cm −2 . The substrate may further include a main surface including a plane orientation of (−201), (101) or (001). The substrate may be free from any twinned crystal.
Who is the assignee on this patent?
Tamura Seisakusho Kk, Koha Co Ltd
What technology area does this patent fall under?
Primary CPC classification C30B29/16. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 30 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).