Plasma processing method and apparatus

Patent metadata

Field	Value
Publication number	US-9431263-B2
Application number	US-201514719797-A
Country	US
Kind code	B2
Filing date	May 22, 2015
Priority date	May 26, 2014
Publication date	Aug 30, 2016
Grant date	Aug 30, 2016

Abstract

A plasma processing method to a substrate includes a first step of mounting a transfer carrier holding the substrate on a stage which is cooled and provided within a processing chamber; a second step of relatively moving the stage and a cover provided above the stage to cover a holding sheet and an annular frame of the transfer carrier with the substrate exposed from a window part formed at the cover, a third step of carrying out plasma processing on the substrate, a fourth step of cooling the cover, and a fifth step of unloading the transfer carrier holding the substrate from the processing chamber.

First claim

What is claimed is:

1. A plasma processing method of carrying out plasma processing within a processing chamber on a substrate which is held by a transfer carrier constituted of an annular frame and a holding sheet, the method comprising:
a first step of mounting the transfer carrier holding the substrate on a stage which is cooled and provided within the processing chamber;
a second step of changing a distance between the stage and a cover provided above the stage to cover the holding sheet and the frame of the transfer carrier by the cover in a state of exposing the substrate from a window part formed at the cover;
a third step of carrying out plasma processing on the substrate held by the transfer carrier;
a fourth step of cooling the cover; and
a fifth step of unloading the transfer carrier holding the substrate from the processing chamber,
wherein in the fourth step, heat transfer gas is introduced to the processing chamber to cool the cover while the heat transfer gas is exhausted by a pressure reducing mechanism.

2. The plasma processing method according to claim 1 , wherein
in the third step, the transfer carrier is electrostatically attracted to the stage, and
between the third step and the fifth step, destaticizing processing of discharging a destaticizing gas for eliminating electric charges of the transfer carrier is carried out after stopping the electrostatic attraction of the transfer carrier to the stage.

3. The plasma processing method according to claim 1 , wherein
the fourth step is carried out in a state that a distance between the cover and the stage is made larger in the fourth step than the distance between the cover and the stage in the second step.

4. The plasma processing method according to claim 1 , wherein in the fourth step, a pressure within the processing chamber during introducing the heat transfer gas is higher than a pressure during the plasma processing.

5. The plasma processing method according to claim 1 , wherein in the fourth step, an inert gas is used as the heat transfer gas.

6. The plasma processing method according to claim 2 , further comprising:
a changing step of changing the distance between the cover and the stage larger than the distance between the cover and the stage in the third step, wherein
after the third step is terminated, the changing step, the fourth step, stopping of the electrostatic attraction of the transfer carrier to the stage by stopping application of a DC voltage to electrostatic chucking electrodes from a DC power source, destaticizing processing of discharging the destaticizing gas for eliminating electric charges of the transfer carrier and the fifth step, are carried out in this order.

7. The plasma processing method according to claim 2 , further comprising:
a changing step of changing the distance between the cover and the stage larger than the distance between the cover and the stage in the third step, wherein
after the third step is terminated, the fourth step, the changing step, stopping of the electrostatic attraction of the transfer carrier to the stage by stopping application of a DC voltage to electrostatic chucking electrodes from a DC power source, destaticizing processing of discharging the destaticizing gas for eliminating electric charges of the transfer carrier and the fifth step, are carried out in this order.

8. The plasma processing method according to claim 2 , further comprising:
a changing step of changing the distance between the cover and the stage larger than the distance between the cover and the stage in the third step, wherein
after the third step is terminated, the fourth step, stopping of the electrostatic attraction of the transfer carrier to the stage by stopping application of a DC voltage to electrostatic chucking electrodes from a DC power source, destaticizing processing of discharging the destaticizing gas for eliminating electric charges of the transfer carrier, the changing step and the fifth step, are carried out in this order.

Assignees

• Panasonic Ip Man Co Ltd

Inventors

• Harikai Atsushi
• Matsubara Noriyuki
• Hiroshima Mitsuru

Classifications

• H10P72/722

  Details of electrostatic chucks · CPC title

• H10P72/0421

  for drying etching · CPC title

• H10P72/72

  using electrostatic chucks · CPC title

• H10P50/691

  for Group V materials or Group III-V materials · CPC title

• H10P50/242 Primary

  of Group IV materials · CPC title