Plasma lighting system with a metallic material in the bulb

US9431233B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9431233-B2
Application numberUS-201414335705-A
CountryUS
Kind codeB2
Filing dateJul 18, 2014
Priority dateJan 14, 2014
Publication dateAug 30, 2016
Grant dateAug 30, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A plasma lighting system includes a magnetron configured to generate microwaves, and a bulb in which a dose for generation of light using the microwaves and at least one metallic material for generation of thermal electrons are received. The metallic material reduces an electric field intensity required for electric discharge by discharging thermal electrons. In this way, the plasma lighting system reduces the time it takes to turn the light back on after the light is turned off.

First claim

Opening claim text (preview).

What is claimed is: 1. A plasma lighting system comprising: a magnetron configured to generate microwaves; and a bulb configured to emit light, the bulb including: a dose located in the bulb for generation of light under the influence of the microwaves; and at least one metallic material located in the bulb to reduce an electric field intensity required for electric discharge by discharging thermal electrons, wherein the metallic material is surrounded by an insulation capsule formed of ceramic and sealed in a vacuum state within the insulation capsule to prevent the metallic material and the dose from reacting. 2. The system according to claim 1 , wherein the metallic material includes at least one selected from the group consisting of tungsten (W), tantalum (Ta), molybdenum (Mo), rhenium (Re), lanthanum hexaboride (LaB 6 ), and cerium hexaboride (CeB 6 ). 3. The system according to claim 1 , wherein the dose includes a main dose including sulfur and an additive dose including a metal halide, and wherein the additive dose includes at least one of compounds of a metal selected from the group consisting of scandium (Sc), sodium (Na), titanium (Ti), indium (In), dysprosium (Dy), holmium (Ho), thulium (Tm), potassium (K), calcium (Ca), tin (Sn), antimony (Sb), strontium (Sr) and aluminum (Al) and a halogen selected from the group consisting of chlorine (Cl), bromine (Br), iodine (I) and astatine (At). 4. The system according to claim 1 , wherein the metallic material discharges thermal electrons when the dose in the bulb is in a vapor state. 5. A plasma lighting system comprising: a magnetron configured to generate microwaves; a bulb configured to emit light, the bulb including: a dose located in the bulb for generation of light under the influence of the microwaves; an inert gas; and at least one metallic material located in the bulb to reduce an electric field intensity for electric discharge by discharging thermal electrons; a waveguide configured to guide the microwaves generated by the magnetron into the bulb; and a resonator surrounding the bulb, wherein the metallic material is surrounded by an insulation capsule formed of ceramic and sealed in a vacuum state within the insulation capsule to prevent the metallic material and the dose from reacting. 6. The system according to claim 5 , wherein the dose includes sulfur, and wherein the inert gas includes argon (Ar). 7. The system according to claim 5 , wherein the metallic material includes at least one selected from the group consisting of tungsten (W), tantalum (Ta), molybdenum (Mo), rhenium (Re), lanthanum hexaboride (LaB 6 ) and cerium hexaboride (CeB 6 ). 8. The system according to claim 5 , wherein the metallic material discharges thermal electrons when the dose in the bulb is in a vapor state. 9. A plasma lighting system comprising: a magnetron configured to generate microwaves; a bulb configured to emit light, the bulb including: a dose located in the bulb for generation of light under the influence of the microwaves; an inert gas; and at least one metallic material located in the bulb to reduce an electric field intensity required for electric discharge by discharging thermal electrons; a waveguide configured to guide the microwaves generated by the magnetron into the bulb; and a controller configured to control the magnetron, wherein the metallic material is surrounded by an insulation capsule formed of ceramic and sealed in a vacuum state within the insulation capsule to prevent the metallic material and the dose from reacting. 10. The system according to claim 9 , wherein the dose includes sulfur, and wherein the inert gas includes argon (Ar). 11. The system according to claim 10 , wherein the metallic material discharges thermal electrons when the plasma lighting system is again in a light-on condition after a light-off condition. 12. The system according to claim 11 , wherein a time until a light-on condition after a light-off condition is 5 minutes or less. 13. The system according to claim 11 , wherein the sulfur is in a vapor state when the plasma lighting system is again in a light-on condition. 14. The system according to claim 9 , wherein the metallic material includes at least one selected from the group consisting of tungsten (W), tantalum (Ta), molybdenum (Mo), rhenium (Re), lanthanum hexaboride (LaB 6 ) and cerium hexaboride (CeB 6 ).

Assignees

Inventors

Classifications

  • Igniting arrangements, e.g. promoting ionisation for starting · CPC title

  • H01J65/044Primary

    the field being produced by a separate microwave unit · CPC title

Patent family

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Frequently asked questions

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What does patent US9431233B2 cover?
A plasma lighting system includes a magnetron configured to generate microwaves, and a bulb in which a dose for generation of light using the microwaves and at least one metallic material for generation of thermal electrons are received. The metallic material reduces an electric field intensity required for electric discharge by discharging thermal electrons. In this way, the plasma lighting sy…
Who is the assignee on this patent?
Lg Electronics Inc
What technology area does this patent fall under?
Primary CPC classification H01J65/044. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 30 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).