Systems and methods for determining the suitability of RF sources in ultraviolet systems
US-10002752-B2 · Jun 19, 2018 · US
US9431233B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9431233-B2 |
| Application number | US-201414335705-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 18, 2014 |
| Priority date | Jan 14, 2014 |
| Publication date | Aug 30, 2016 |
| Grant date | Aug 30, 2016 |
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A plasma lighting system includes a magnetron configured to generate microwaves, and a bulb in which a dose for generation of light using the microwaves and at least one metallic material for generation of thermal electrons are received. The metallic material reduces an electric field intensity required for electric discharge by discharging thermal electrons. In this way, the plasma lighting system reduces the time it takes to turn the light back on after the light is turned off.
Opening claim text (preview).
What is claimed is: 1. A plasma lighting system comprising: a magnetron configured to generate microwaves; and a bulb configured to emit light, the bulb including: a dose located in the bulb for generation of light under the influence of the microwaves; and at least one metallic material located in the bulb to reduce an electric field intensity required for electric discharge by discharging thermal electrons, wherein the metallic material is surrounded by an insulation capsule formed of ceramic and sealed in a vacuum state within the insulation capsule to prevent the metallic material and the dose from reacting. 2. The system according to claim 1 , wherein the metallic material includes at least one selected from the group consisting of tungsten (W), tantalum (Ta), molybdenum (Mo), rhenium (Re), lanthanum hexaboride (LaB 6 ), and cerium hexaboride (CeB 6 ). 3. The system according to claim 1 , wherein the dose includes a main dose including sulfur and an additive dose including a metal halide, and wherein the additive dose includes at least one of compounds of a metal selected from the group consisting of scandium (Sc), sodium (Na), titanium (Ti), indium (In), dysprosium (Dy), holmium (Ho), thulium (Tm), potassium (K), calcium (Ca), tin (Sn), antimony (Sb), strontium (Sr) and aluminum (Al) and a halogen selected from the group consisting of chlorine (Cl), bromine (Br), iodine (I) and astatine (At). 4. The system according to claim 1 , wherein the metallic material discharges thermal electrons when the dose in the bulb is in a vapor state. 5. A plasma lighting system comprising: a magnetron configured to generate microwaves; a bulb configured to emit light, the bulb including: a dose located in the bulb for generation of light under the influence of the microwaves; an inert gas; and at least one metallic material located in the bulb to reduce an electric field intensity for electric discharge by discharging thermal electrons; a waveguide configured to guide the microwaves generated by the magnetron into the bulb; and a resonator surrounding the bulb, wherein the metallic material is surrounded by an insulation capsule formed of ceramic and sealed in a vacuum state within the insulation capsule to prevent the metallic material and the dose from reacting. 6. The system according to claim 5 , wherein the dose includes sulfur, and wherein the inert gas includes argon (Ar). 7. The system according to claim 5 , wherein the metallic material includes at least one selected from the group consisting of tungsten (W), tantalum (Ta), molybdenum (Mo), rhenium (Re), lanthanum hexaboride (LaB 6 ) and cerium hexaboride (CeB 6 ). 8. The system according to claim 5 , wherein the metallic material discharges thermal electrons when the dose in the bulb is in a vapor state. 9. A plasma lighting system comprising: a magnetron configured to generate microwaves; a bulb configured to emit light, the bulb including: a dose located in the bulb for generation of light under the influence of the microwaves; an inert gas; and at least one metallic material located in the bulb to reduce an electric field intensity required for electric discharge by discharging thermal electrons; a waveguide configured to guide the microwaves generated by the magnetron into the bulb; and a controller configured to control the magnetron, wherein the metallic material is surrounded by an insulation capsule formed of ceramic and sealed in a vacuum state within the insulation capsule to prevent the metallic material and the dose from reacting. 10. The system according to claim 9 , wherein the dose includes sulfur, and wherein the inert gas includes argon (Ar). 11. The system according to claim 10 , wherein the metallic material discharges thermal electrons when the plasma lighting system is again in a light-on condition after a light-off condition. 12. The system according to claim 11 , wherein a time until a light-on condition after a light-off condition is 5 minutes or less. 13. The system according to claim 11 , wherein the sulfur is in a vapor state when the plasma lighting system is again in a light-on condition. 14. The system according to claim 9 , wherein the metallic material includes at least one selected from the group consisting of tungsten (W), tantalum (Ta), molybdenum (Mo), rhenium (Re), lanthanum hexaboride (LaB 6 ) and cerium hexaboride (CeB 6 ).
Igniting arrangements, e.g. promoting ionisation for starting · CPC title
the field being produced by a separate microwave unit · CPC title
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