Method of patterning self-organizing material, patterned substrate of self-organizing material and method of producing the same, and photomask using patterned substrate of self-organizing material

Patent metadata

Field	Value
Publication number	US-9429845-B2
Application number	US-201313898105-A
Country	US
Kind code	B2
Filing date	May 20, 2013
Priority date	Sep 30, 2004
Publication date	Aug 30, 2016
Grant date	Aug 30, 2016

Abstract

A method for performing micro fabrication includes using, as a photomask, a self-organizing material-patterned substrate which is soluble in an organic solvent. A method for emitting light includes emitting the light in a pattern of a nucleic acid which is a self-organizing material immobilized on a self-organizing material-patterned substrate. An immobilization layer containing a binding material capable of binding to a self-organizing material is formed on a substrate. Then this immobilization layer is patterned by transferring a protrusion and recess pattern formed in a mold thereto by the imprint process. The self-organizing material is supplied onto the side having the protrusion and recess pattern of the immobilization layer transferred thereto. Thus, the self-organizing material is immobilized according to the protrusion and recess pattern of the immobilization layer owning to the self-organizing ability of the material per se and the binding ability of the binding material contained in the immobilization layer.

First claim

The invention claimed is:

1. A method for performing micro fabrication, comprising:
forming, on a substrate soluble in an organic solvent,
an immobilization layer containing a binding material having an ability of binding with a self-organizing material having a self-organizing ability;
transferring a protrusion and recess pattern of a mold to the immobilization layer by thermocycle nanoimprinting lithography or optical nanoimprinting lithography;
supplying the self-organizing material to a surface of the immobilization layer on which the protrusion and recess pattern has been transferred, and
immobilizing the self-organizing material in a recess portion of the protrusion and recess pattern of the immobilization layer, so as to obtain a self-organizing material-patterned substrate soluble in an organic solvent; and
performing, by radiating light, reduced projection of a pattern of the self-organizing material-patterned substrate used as a photomask on a photoresist applied on a silicon substrate, and transferring or reprinting the pattern of the photomask on the photoresist, so as to perform micro fabrication,
the self-organizing material being a nucleic acid, and
the immobilization layer, to which the protrusion and recess pattern of the mold has been transferred, containing the binding material at a bottom surface and a side surface of the recess portion formed by the thermocycle nanoimprinting lithography or the optical nanoimprinting lithography.

2. The method as set forth in claim 1 , wherein the binding material is poly-L-lysine.

3. The method as set forth in claim 1 , wherein the binding material is aminosilane.

Assignees

• Ohtake Toshihito
• Nakamatsu Ken-Ichiro
• Matsui Shinji
• Tabata Hitoshi
• Kawai Tomoji
• Japan Science & Tech Agency

Inventors

• Ohtake Toshihito
• Nakamatsu Ken-Ichiro
• Matsui Shinji
• Tabata Hitoshi
• Kawai Tomoji

Classifications

• G01N21/553

  and using surface plasmons (fluorescence excitation G01N21/648; enhanced Raman G01N21/658) · CPC title

• G01N21/554

  detecting the surface plasmon resonance of nanostructured metals, e.g. localised surface plasmon resonance · CPC title

• G03F7/20 Primary

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

• H01L2251/105

  Electricity · mapped topic

• B82Y10/00 Primary

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title